METHOD FOR PRODUCING A TUBE CONSISTING OF DOPED QUARTZ GLASS, TUBULAR PRODUCTS, AND THE USE OF THE SAME
    22.
    发明申请
    METHOD FOR PRODUCING A TUBE CONSISTING OF DOPED QUARTZ GLASS, TUBULAR PRODUCTS, AND THE USE OF THE SAME 审中-公开
    用于生产掺杂的二氧化硅玻璃的配管方法,ROHRFORMIGE产品及其用途

    公开(公告)号:WO0230839A3

    公开(公告)日:2002-12-12

    申请号:PCT/EP0111594

    申请日:2001-10-08

    Abstract: According to a known method for producing a tube consisting of doped quartz glass, the starting components are fed to a deposition burner, particles containing SiO2 and GeO2 are formed, and are deposited on a mandrel rotating about its longitudinal axis, forming a porous layer of soot. Based on said method, the aim of the invention is to ensure that the doping agent is distributed over the tube wall in a radially homogeneous manner. In order to achieve this, an outer compression area (3) having a higher density is generated in the outer area of the layer of soot, and surrounds an inner area (2) of the layer of soot, said inner area having a lower density. A tubular semifinished product consisting of porous quartz glass containing GeO2, which can be subjected to dehydration treatment without significantly changing the predefined distribution of doping agent over the tube wall, is characterised in that the area of the outer wall of the tube is provided with an outer compression area (3) having a higher density and surrounding an inner area (2) having a smaller density.

    Abstract translation: 在制造掺杂的二氧化硅玻璃的管的一个公知的方法,起始组分被馈送到形成SiO 2和GeO 2的含有粒子的沉积,以及沉积在围绕其纵向轴线以形成多孔烟灰层的旋转心轴上。 为了开始确保其掺杂剂在管道壁的径向均匀分布,根据本发明中提出,外压缩区(3)更高的密度在周边较低密度的烟灰层(2)的内部区域中的烟灰层的外侧区域产生。 制成的多孔的管状半成品,含有GeO 2的石英玻璃,其可进行脱水处理,如果没有掺杂剂预分布基本上在管壁根据本发明的特征在于,在外部压缩区的管外壁的面积发生变化,其特征在于(3)较高密度的 提供了一种具有围绕较低密度的内侧区域(2)。

    METHOD OF PRODUCING AN SIO>2< BLANK
    23.
    发明申请
    METHOD OF PRODUCING AN SIO>2< BLANK 审中-公开
    用于生产的SiO> 2

    公开(公告)号:WO02072487A3

    公开(公告)日:2002-11-07

    申请号:PCT/EP0202434

    申请日:2002-03-06

    CPC classification number: C03B19/1407 C03B37/01406 C03B37/0144

    Abstract: According to known methods of producing an SiO>2 2 2 2 particles from depositing on the inner walls (9), a directed auxiliary gas flow (10; 20) having a defined direction of flow is generated within the reaction chamber (1), said direction of flow including an angle with the inner wall (9) in the range of 0 DEG to 90 DEG .

    Abstract translation: 在用于制造SiO 2的空白公知的方法是从一个由火焰水解二氧化硅原料含有硅的在反应室2个颗粒(1)形成,其中在一个旋转的支撑的部分(5),以形成SiO 2的坯件(6)沉积在层中 和通过从反应室(1)的工艺气体流(7)的装置损失部分被排出。 为了防止在SiO 2坯件通过所述反应室来修改已知的方法做的内壁上沉积物很大程度上避免的任何不利影响,本发明提出的是,为了避免内的SiO的沉积物上的内壁<2>颗粒(9) 定向辅助气流(10,20)在所述反应室(1)的预定的流动方向,其特征在于,与所述的内壁(9)的流动方向包围在零度和90度范围内的角度被生成。

    A METHOD AND A DEVICE FOR MEASUREMENT IN A PROCESS FOR MANUFACTURING A PLANAR GLASS COATING
    24.
    发明申请
    A METHOD AND A DEVICE FOR MEASUREMENT IN A PROCESS FOR MANUFACTURING A PLANAR GLASS COATING 审中-公开
    用于制造平面玻璃涂层的方法中的测量方法和装置

    公开(公告)号:WO2002059050A1

    公开(公告)日:2002-08-01

    申请号:PCT/FI2002/000012

    申请日:2002-01-08

    CPC classification number: G02B6/132 C03B19/1423 C03B2207/34 C03B2207/46

    Abstract: The invention relates to a measurement method and device to be used in connection with a manufacturing process of a planar glass coating, in which manufacturing process for example a thermal reactor (10), such as a flame or plasma is used to produce aerosol particles (13) from reactants (12), which said aerosol particles (13) are guided on the surface of a substrate (14), thus forming a coating layer. According to the invention, the electric charge conveyed on the substrate (14) by the aerosol particles (13) entering the substrate is measured by means of a current measurement means (17) during the process to monitor the coating process. The current measurement means (17) is arranged to communicate with a process control unit (18) to adjust the process conditions according to predetermined threshold value. In an embodiment of the invention, the measurement is based on the electric charge attained intrinsically by the aerosol particles (13) during their formation. If necessary, it is also possible to use a separate charger (23), for example a so-called corona charger to charge the aerosol particles (13).

    Abstract translation: 本发明涉及一种与平面玻璃涂层的制造工艺相结合使用的测量方法和装置,其中使用诸如火焰或等离子体的热反应器(10)的制造工艺来产生气溶胶颗粒( 13)从所述气溶胶颗粒(13)被引导到衬底(14)的表面上的反应物(12),从而形成涂层。 根据本发明,在监测涂布过程的过程中,通过电流测量装置(17)测量在进入衬底的气溶胶颗粒(13)在衬底(14)上传送的电荷。 电流测量装置(17)被布置成与过程控制单元(18)进行通信,以根据预定阈值调整过程状态。 在本发明的一个实施例中,测量是基于气溶胶颗粒(13)在其形成过程中本质上获得的电荷。 如果需要,还可以使用单独的充电器(23),例如所谓的电晕充电器来对气溶胶颗粒(13)充电。

    METHOD FOR PRODUCING A SIO>2< BLANK
    25.
    发明申请
    METHOD FOR PRODUCING A SIO>2< BLANK 审中-公开
    用于生产SIO> 2

    公开(公告)号:WO02057193A2

    公开(公告)日:2002-07-25

    申请号:PCT/EP2002/000478

    申请日:2002-01-18

    Abstract: According to a known method for producing a SiO2 blank, SiO2 particles are formed in a plurality of deposition burners arranged in series, a burner flame being associated to each burner, and said particles are then deposited on a deposition surface of a carrier rotating about its longitudinal axis. The series of deposition burners moves back and forth according to a pre-determined displacement sequence along the blank being formed, and between inflection points at which the displacement direction is reversed. The burner flame forms a projection surface in a projection on a plane parallel to its main propagation direction, the lateral boundary lines of said projection surface forming an opening angle with the mean propagation direction. In order to provide a simple method for producing a porous blank, based on the above, and by which means a homogeneous quartz glass body is obtained, the opening angle ( alpha ) is set to a value of between 3 DEG and 15 DEG and the distance (D) between the deposition burner (2) and the deposition surface (10) is set between 170 mm and 240 mm.

    Abstract translation: 在用于生产的已知方法的SiO> 2 2 <颗粒在几,布置成一系列沉积燃烧器,每个具有形成在燃烧器火焰相关联,并沉积在一个旋转的绕其纵轴载体沉积表面 其中,所述一系列的沉积形成的预定移动沿着成形在其它的运动反转方向往复运动,与拐点间坯件,其中在平行于在投影传播的它的主要方向上的每个情况下,燃烧器的火焰到一个平面上,投影屏幕,其 主传播方向的横向边界线包围的开口角度。 以指定此基础上,用于从获得均匀的石英玻璃体的多孔坯件的制备的简单方法,根据提出的发明,每个3 DEG和15°和沉积的距离(D)之间的开度角(阿尔法)的值的 (2)从沉积表面(10)可在170至240mm之间的范围内。

    VERFAHREN UND VORRICHTUNG ZUR HERSTELLUNG EINES HOHLZYLINDERS AUS QUARZGLAS UND DANACH HERGESTELLTE PRODUKTE

    公开(公告)号:WO2002051759A3

    公开(公告)日:2002-07-04

    申请号:PCT/EP2001/014997

    申请日:2001-12-18

    Abstract: Bei einem bekannten Verfahren zur Herstellung eines Quarzglasrohrs werden SiO 2 -Partikel auf einem länglichen, um seine Längsachse rotierenden Träger unter Bildung eines porösen Rohlings mit zylindrischer Innerbohrung abgeschieden, und der Rohling anschliessend in vertikaler Ausrichtung in einem Ofen hängend unter Einsatz einer Aufhängung, die an einer im oberen Bereich der Innenbohrung des Rohlings vorgesehenen Verengung angreift, verglast. Um hiervon ausgehend ein Verfahren anzugeben, bei dem auch schwere Rohlinge ohne komplizierte Haltevorrichtungen sicher und weitgehend ohne eine Gefahr von Verunreinigungen der Innenbohrung gehalten werden können, wird erfindungsgemäss vorgeschlagen, dass die Verengung (6b) durch Formung der Innenbohrung (7) beim Abscheiden der SiO 2 -Partikel erzeugt wird, und dass zum Verglasen eine sich auf die Verengung (6b) abstützende und ansonsten kontaktfrei in die zylindrische Innenbohrung (7) ragende Aufhängung (8; 9; 10) eingesetzt wird.

    HOLDING DEVICE FOR A POROUS BLANK CONSISTING OF SIO2 PARTICLES
    28.
    发明申请
    HOLDING DEVICE FOR A POROUS BLANK CONSISTING OF SIO2 PARTICLES 审中-公开
    固定装置用于多孔BRUTE由SiO2粒子

    公开(公告)号:WO02046115A1

    公开(公告)日:2002-06-13

    申请号:PCT/EP2001/012505

    申请日:2001-10-30

    CPC classification number: C03B37/01466 C03B19/1469

    Abstract: The invention relates to a holding device (1) for a porous blank (2), comprising a deformable receiver (4) which carefully transmits the required holding force without provoking damaging stress peaks. To this end, the receiver (4) is fitted with a chamber (5) which can be filled with a liquid. A flexible membrane (6) of the receiver (4) lies on a large surface against an end section (3) of the porous blank (2), thus fixing said porous blank (2) in a positive manner. The porous blank (2) maintains the position thus determined, without any modification, even when a carrier rod (13) which is centrally enclosed in the porous blank (2) for production purposes is removed. The inventive holding device (1) can also be used for further production steps, in other handling or transport devices.

    Abstract translation: 对于保持装置(1)一种多孔预成型(2)的可变形的支架(4)所要求的夹持力的一个平缓转移,而不会造成有害的张力峰出现被使用。 保持件(4)是用于设置有腔室(5),这是befüllba与流体此目的。 其特征在于柔性膜(6)被插入所述容器(4)在大面积上对一个端部(3)的多孔坯件(2),并导致在多孔坯件的非正定影(2)。 由此,多孔坯件(2)保持所设定的位置,即使在除去在多孔坯件(2)封闭的中央支撑杆(13)保持不变的制造的原因之后。 此外,保持装置(1)也可用于进行进一步的处理或输送机进一步的制造步骤。

    FABRICATION OF SUBSTRATES FOR PLANAR WAVEGUIDE DEVICES AND PLANARWAVEGUIDE DEVICES
    29.
    发明申请
    FABRICATION OF SUBSTRATES FOR PLANAR WAVEGUIDE DEVICES AND PLANARWAVEGUIDE DEVICES 审中-公开
    用于平面波导装置和平面波导装置的基板的制造

    公开(公告)号:WO02046113A1

    公开(公告)日:2002-06-13

    申请号:PCT/GB2001/005055

    申请日:2001-11-15

    Abstract: Using MCVD or some other deposition process one or more glass layers are deposited on the inside of a glass tube (20). Rather than performing a conventional preform collapse step, the glass tube is instead expanded by blow moulding it into a facetted mould (40). The mould is a two-piece graphite mould of square internal cross-section. Blow moulding is performed by sealing the tube (20) at one end and pressuring it internally by supplying gas into its other end. The formed structure, referred to as a blank (60) herein, is then removed from the mould. The flat panels (62) of the blank are then cut out to form planar waveguide substrates with integral waveguiding layers. As well as planar waveguides, the method may also find application for preparing substrates for display.

    Abstract translation: 使用MCVD或一些其它沉积工艺,一个或多个玻璃层沉积在玻璃管(20)的内部。 而不是执行常规的预成型件折叠步骤,而是通过将玻璃管吹塑成小面模具(40)来扩张玻璃管。 模具是方形内部横截面的两片式石墨模具。 通过在一端密封管(20)并通过将气体供给到另一端来对其进行加压来进行吹塑。 此后将被称为坯料(60)的成形结构从模具中取出。 然后将坯件的平板(62)切出以形成具有整体波导层的平面波导基板。 除了平面波导之外,该方法还可以应用于制备用于显示的基板。

    METHOD AND APPARATUS FOR REDUCING REFRACTORY CONTAMINATION IN FUSED SILICA PROCESSES
    30.
    发明申请
    METHOD AND APPARATUS FOR REDUCING REFRACTORY CONTAMINATION IN FUSED SILICA PROCESSES 审中-公开
    用于减少熔融二氧化硅工艺中的耐火污染的方法和装置

    公开(公告)号:WO02024586A1

    公开(公告)日:2002-03-28

    申请号:PCT/US2001/028481

    申请日:2001-09-12

    Abstract: In a furnace (10) for producing high purity fused silica glass boules, the refractory in the area of the burner holes reaches such elevated temperatures that cause impurities to leach out and the dissociation of the refractory, causing contamination of the silica glass. In order to reduce the temperature of the burner hole refractory, a porous insert or liner (16) having an outer housing portion (17) is positioned within the burner hole (14) in the furnace crown (12), and a suitable gas is supplied thereto. The insert has a closed-end flow passage (18) therewithin, having an inlet end (20) connected to a sources of gas under pressure. The gas diffuses through the porous liner and not only cools the liner and refractory, but also forms a boundary layer (22) along an inside surface (24) of the insert that prevents particle buildup. A burner (26) is sealed to the insert (16) with seals (28). The cooling of the insert and surrounding burner hole refractory prevents contamination of the silica glass from the refractory.

    Abstract translation: 在用于生产高纯度熔凝石英玻璃泡沫的炉(10)中,燃烧器孔区域中的耐火材料达到这样的升高的温度,这导致杂质浸出和耐火材料的解离,引起二氧化硅玻璃的污染。 为了降低燃烧器孔耐火材料的温度,具有外部壳体部分(17)的多孔插入件或衬套(16)位于炉子顶部(12)内的燃烧器孔(14)内,合适的气体是 提供给它。 插入件具有其中的封闭端流动通道(18),其具有连接到压力下的气体源的入口端(20)。 气体通过多孔衬里扩散,不仅冷却衬套和耐火材料,而且还沿着防止颗粒积聚的插入件的内表面(24)形成边界层(22)。 燃烧器(26)用密封件(28)密封到插入件(16)上。 插入件和周围燃烧器孔耐火材料的冷却防止二氧化硅玻璃从耐火材料中的污染。

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