Abstract:
Monolithic optical structures include a plurality of layer with each layer having an isolated optical pathway confined within a portion of the layer. The monolithic optical structure can be used as an optical fiber preform. Alternatively or additionally, the monolithic optical structure can include integrated optical circuits within one or more layers of the structure. Monolithic optical structures can be formed by performing multiple passes of a substrate through a flowing particle stream. The deposited particles form an optical material following consolidation. Flexible optical fibers include a plurality of independent light channels extending along the length of the optical fiber. The fibers can be pulled from an appropriate preform.
Abstract:
According to a known method for producing a tube consisting of doped quartz glass, the starting components are fed to a deposition burner, particles containing SiO2 and GeO2 are formed, and are deposited on a mandrel rotating about its longitudinal axis, forming a porous layer of soot. Based on said method, the aim of the invention is to ensure that the doping agent is distributed over the tube wall in a radially homogeneous manner. In order to achieve this, an outer compression area (3) having a higher density is generated in the outer area of the layer of soot, and surrounds an inner area (2) of the layer of soot, said inner area having a lower density. A tubular semifinished product consisting of porous quartz glass containing GeO2, which can be subjected to dehydration treatment without significantly changing the predefined distribution of doping agent over the tube wall, is characterised in that the area of the outer wall of the tube is provided with an outer compression area (3) having a higher density and surrounding an inner area (2) having a smaller density.
Abstract:
According to known methods of producing an SiO>2 2 2 2 particles from depositing on the inner walls (9), a directed auxiliary gas flow (10; 20) having a defined direction of flow is generated within the reaction chamber (1), said direction of flow including an angle with the inner wall (9) in the range of 0 DEG to 90 DEG .
Abstract:
The invention relates to a measurement method and device to be used in connection with a manufacturing process of a planar glass coating, in which manufacturing process for example a thermal reactor (10), such as a flame or plasma is used to produce aerosol particles (13) from reactants (12), which said aerosol particles (13) are guided on the surface of a substrate (14), thus forming a coating layer. According to the invention, the electric charge conveyed on the substrate (14) by the aerosol particles (13) entering the substrate is measured by means of a current measurement means (17) during the process to monitor the coating process. The current measurement means (17) is arranged to communicate with a process control unit (18) to adjust the process conditions according to predetermined threshold value. In an embodiment of the invention, the measurement is based on the electric charge attained intrinsically by the aerosol particles (13) during their formation. If necessary, it is also possible to use a separate charger (23), for example a so-called corona charger to charge the aerosol particles (13).
Abstract:
According to a known method for producing a SiO2 blank, SiO2 particles are formed in a plurality of deposition burners arranged in series, a burner flame being associated to each burner, and said particles are then deposited on a deposition surface of a carrier rotating about its longitudinal axis. The series of deposition burners moves back and forth according to a pre-determined displacement sequence along the blank being formed, and between inflection points at which the displacement direction is reversed. The burner flame forms a projection surface in a projection on a plane parallel to its main propagation direction, the lateral boundary lines of said projection surface forming an opening angle with the mean propagation direction. In order to provide a simple method for producing a porous blank, based on the above, and by which means a homogeneous quartz glass body is obtained, the opening angle ( alpha ) is set to a value of between 3 DEG and 15 DEG and the distance (D) between the deposition burner (2) and the deposition surface (10) is set between 170 mm and 240 mm.
Abstract:
Bei einem bekannten Verfahren zur Herstellung eines Quarzglasrohrs werden SiO 2 -Partikel auf einem länglichen, um seine Längsachse rotierenden Träger unter Bildung eines porösen Rohlings mit zylindrischer Innerbohrung abgeschieden, und der Rohling anschliessend in vertikaler Ausrichtung in einem Ofen hängend unter Einsatz einer Aufhängung, die an einer im oberen Bereich der Innenbohrung des Rohlings vorgesehenen Verengung angreift, verglast. Um hiervon ausgehend ein Verfahren anzugeben, bei dem auch schwere Rohlinge ohne komplizierte Haltevorrichtungen sicher und weitgehend ohne eine Gefahr von Verunreinigungen der Innenbohrung gehalten werden können, wird erfindungsgemäss vorgeschlagen, dass die Verengung (6b) durch Formung der Innenbohrung (7) beim Abscheiden der SiO 2 -Partikel erzeugt wird, und dass zum Verglasen eine sich auf die Verengung (6b) abstützende und ansonsten kontaktfrei in die zylindrische Innenbohrung (7) ragende Aufhängung (8; 9; 10) eingesetzt wird.
Abstract:
The invention relates to a holding device (1) for a porous blank (2), comprising a deformable receiver (4) which carefully transmits the required holding force without provoking damaging stress peaks. To this end, the receiver (4) is fitted with a chamber (5) which can be filled with a liquid. A flexible membrane (6) of the receiver (4) lies on a large surface against an end section (3) of the porous blank (2), thus fixing said porous blank (2) in a positive manner. The porous blank (2) maintains the position thus determined, without any modification, even when a carrier rod (13) which is centrally enclosed in the porous blank (2) for production purposes is removed. The inventive holding device (1) can also be used for further production steps, in other handling or transport devices.
Abstract:
Using MCVD or some other deposition process one or more glass layers are deposited on the inside of a glass tube (20). Rather than performing a conventional preform collapse step, the glass tube is instead expanded by blow moulding it into a facetted mould (40). The mould is a two-piece graphite mould of square internal cross-section. Blow moulding is performed by sealing the tube (20) at one end and pressuring it internally by supplying gas into its other end. The formed structure, referred to as a blank (60) herein, is then removed from the mould. The flat panels (62) of the blank are then cut out to form planar waveguide substrates with integral waveguiding layers. As well as planar waveguides, the method may also find application for preparing substrates for display.
Abstract:
In a furnace (10) for producing high purity fused silica glass boules, the refractory in the area of the burner holes reaches such elevated temperatures that cause impurities to leach out and the dissociation of the refractory, causing contamination of the silica glass. In order to reduce the temperature of the burner hole refractory, a porous insert or liner (16) having an outer housing portion (17) is positioned within the burner hole (14) in the furnace crown (12), and a suitable gas is supplied thereto. The insert has a closed-end flow passage (18) therewithin, having an inlet end (20) connected to a sources of gas under pressure. The gas diffuses through the porous liner and not only cools the liner and refractory, but also forms a boundary layer (22) along an inside surface (24) of the insert that prevents particle buildup. A burner (26) is sealed to the insert (16) with seals (28). The cooling of the insert and surrounding burner hole refractory prevents contamination of the silica glass from the refractory.