Abstract:
A porous soot sheet is formed using a roll-to-roll glass soot deposition and sintering process. The soot sheet formation involves depositing glass soot particles on a deposition surface to form a supported soot layer, removing the soot layer from the deposition surface to form a soot sheet, and heating a portion of the soot sheet to locally-sinter the glass soot particles and form a porous soot part having a sintered peripheral edge.
Abstract:
Der Erfindung liegt die Aufgabe zugrunde, ein Verfahren zur Herstellung eines Quarzglastiegels mit einer Innenschicht aus transparentem, blasenarmem und reinem Quarzglas mit langer Standzeit anzugeben. Diese Aufgabe gemäß der Erfindung durch ein Verfahren gelöst, das folgende Verfahrensschritte umfasst: (a) Bereitstellen eines eine Innenseite aufweisenden Tiegelbasiskörpers aus Quarzglas, (b) Erzeugen einer porösen SiO 2 -Sootschicht auf mindestens einer Teilfläche der Innenseite des Tiegelbasiskörpers durch Gasphasenabscheidung, Trocknen der porösen SiO 2 -Sootschicht zur Reduzierung des Hydroxylgruppengehalts und Sintern der Sootschicht zu der Innenschicht aus transparentem Quarzglas in einer wasserstoffarmen Atmosphäre, so dass sich in dem Quarzglas der Innenschicht ein Hydroxylgruppengehalt von weniger als 100 Gew.-ppm einstellt.
Abstract:
Bei einem bekannten Verfahren zur Herstellung eines Quarzglaszylinders wird durch Abscheiden von SiO 2 -Partikeln auf einer Zylindermantelfläche eines um seine Längsachse rotierenden Trägers, der eine Schicht aus Siliciumcarbid (SiC-Schicht) aufweist, ein poröses Sootrohr hergestellt, das zu dem Quarzglaszylinder gesintert wird. Um hiervon ausgehend einen Träger mit hoher Bruchfestigkeit anzugeben, der sich einerseits leicht entfernen lässt und von dem andererseits eine geringe Kontaminationsgefahr für den Sootkörper ausgeht, wird erfindungsgemäß vorgeschlagen, dass die SiC-Schicht vor dem Abscheiden der SiO 2 -Partikel bei hoher Temperatur in einer sauerstoffhaltigen Atmosphäre behandelt wird, derart, dass durch Oxidation eine SiO 2 -Schutzschicht mit einer Dicke von mindestens 0,1 μm erzeugt wird.
Abstract:
As a precursor to forming a glass sheet, a soot layer (154) is formed on a deposition surface (122) using a roll-to-roll glass soot deposition process. A soot layer-separating device (160) is configured to bring a stream of gas into contact with at least a portion of a free surface of the soot layer. The impinging gas stream affects local thermal expansion stresses at the soot layer/deposition surface interface, which separates the soot layer (154) from the deposition surface (122).
Abstract:
A glass sheet is formed using a roll-to-roll glass soot deposition and sintering process. The glass sheet formation involves forming a first glass soot layer (152) on a deposition surface (122) of a soot-receiving device (120), removing the first glass soot layer (152) from the deposition surface (122), and forming a second glass soot layer (162) on the unsupported first glass soot layer. The resulting composite glass soot sheet is heated to form a sintered glass sheet (156). The glass sheet can be a substantially homogeneous glass sheet or a composite glass sheet having layer-specific attributes.
Abstract:
An ultra-thin glass sheet is formed using a roll-to-roll glass soot deposition and sintering process. The sintering involves initially heating and sintering one or more central segments of a glass soot sheet, and progressively heating and sintering glass soot sheet segments that are located laterally or axially adjacent to previously-sintered segments such that, along respective width directions of the glass soot sheet, only a portion of the width is sintered at a given time interval during the heating. A suitable soot sheet-sintering device is shaped as a chevron having first and second legs (212) and (214) that are joined at an apex (216).
Abstract:
An apparatus and process for making glass soot sheet and sintered glass sheet. Glass soot particles are deposited on a curved deposition surface (103) of a rotating drum to form a soot sheet. The soot sheet is then released from the deposition surface. The soot sheet can tie sintered into a consolidated glass. The soot sheet and the sintered glass can be sufficiently long and flexible to be reeled into a roll (117).
Abstract:
A quartz glass member, wherein when the composition thereof is represented by SiOx, x takes a value of 1.85 to 1.95, the concentration of hydrogen molecules contained therein is 1 X 10 molecules/cm to 5 X 10 molecules/cm , and the value of (A-B) is 0.002 cm or less, where A represents the absorption coefficient observed immediately before the termination of irradiation when the irradiation of ArF excimer laser light is carried out in 1 X 10 pulses at one pulse energy density of 2 mJ/cm and B represents a second absorption coefficient observed 600 seconds after the stop of the above ArF excimer laser light irradiation. The use of the quartz glass member in optical systems for illumination and projection in a projection aligner allows the reduction of variation in the illuminance in an exposure region on a reticle plane or a wafer, which leads to a uniform exposure.
Abstract translation:石英玻璃构件,当其组成由SiO x表示时,x取1.85〜1.95的值,其中所含的氢分子的浓度为1×10 16分子/ cm 3〜5×10 18 >分子/ cm 3,(AB)的值为0.002cm -1以下,其中A表示在ArF准分子激光的照射下进行照射结束之前观察到的吸收系数 1×10 4脉冲,脉冲能量密度为2mJ / cm 2,B表示在停止上述ArF准分子激光照射后600秒观察到的第二吸收系数。 在投影对准器中用于照明和投影的光学系统中使用石英玻璃构件允许减少在掩模版平面或晶片上的曝光区域中的照度的变化,这导致均匀的曝光。
Abstract:
The invention includes methods of making lithography photomask blanks. The invention also includes lithography photomask blanks and preforms for producing lithography photomask. The method of making a lithography photomask blank includes providing a soot deposition surface, producing SiO2 soot particles and projecting the SiO2 soot particles toward the soot deposition surface. The method includes successively depositing layers of the SiO2 soot particle on the deposition surface to form a coherent SiO2 porous glass preform body comprised of successive layers of the SiO2 soot particles and dehydrating the coherent SiO2 glass preform body to remove OH from the preform body. The SiO2 is exposed to and reacted with a fluorine containing compound and consolidated into a nonporous silicon oxyfluoride glass body with parallel layers of striae. The method further includes forming the consolidated silicon oxyfluoride glass body into a photomask blank having a planar surface with the orientation of the striae layer parallel to the photomask blank planar surface.