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    DOWNHOLE STRAIN SENSOR
    53.
    发明申请
    DOWNHOLE STRAIN SENSOR 审中-公开

    公开(公告)号：WO2019232521A1

    公开(公告)日：2019-12-05

    申请号：PCT/US2019/035178

    申请日：2019-06-03

    Applicant: BOARD OF REGENTS, UNIVERSITY OF TEXAS SYSTEM

    Inventor： RUSSELL, Rod ,  SHARMA, Mukul

    IPC: E21B47/01 ,  F17D5/08

    Abstract: A device for measuring strain on the exterior of a pipe includes a body comprising a top portion and a bottom portion; one or more elastically deformable members coupled between the top portion and the bottom portion, wherein each of the one or more elastically deformable members have an outer contact surface and an inner non-contact surface. One or more sensors are disposed on the inner non-contact surface of one or more of the elastically deformable members. The sensors, during use, provide data that can be used to determine changes in strain on the exterior of the pipe. In another embodiment, one or more sensors are embedded in, or attached to, a casing disposed in a wellbore. In an embodiment, a method includes pressurizing or depressurizing the wellbore with a fluid and measuring the strain induced in the casing (or in an open wellbore) in response to this change in wellbore pressure.

    ELECTRODIALYTIC CAPILLARY SUPPRESSOR FOR SUPPRESSED CONDUCTOMETRIC ION CHROMATOGRAPHY
    55.
    发明申请
    ELECTRODIALYTIC CAPILLARY SUPPRESSOR FOR SUPPRESSED CONDUCTOMETRIC ION CHROMATOGRAPHY 审中-公开
    抑制电导离子色谱法的电动毛细管抑制剂

    公开(公告)号：WO2018048737A1

    公开(公告)日：2018-03-15

    申请号：PCT/US2017/049827

    申请日：2017-09-01

    Applicant: BOARD OF REGENTS, UNIVERSITY OF TEXAS SYSTEM

    Inventor： DASGUPTA, Purnendu, K. ,  HUANG, Weixiong

    IPC: B01D61/46 ,  B01D61/42 ,  B01D61/44 ,  C25B7/00 ,  C25B15/02

    Abstract: An electrodialytic device for ion chromatography, including aspects functioning as an eluent suppressor device and aspects functioning as an eluent generator device. In general, the device includes a monolithic block of ionomeric polymer material having (1) a first channel with an inlet port, an outlet port, and an active length of exposed polymer material disposed therebetween, (2) a second channel having an inlet port, an outlet port, and an active length of exposed polymer material disposed therebetween, (3) a first and second at-least-partially exposed electrodes positioned in electrical communication with the second channel, with the second electrode disposed, at least in part, across the second channel from the first electrode. A current flowing between the electrodes will drive an electrodialytic migration of ions between the active lengths, from an eluent stream in the case of a suppression device or into an eluent stream in the case of a generator device.

    Abstract translation: 用于离子色谱的电渗析装置包括用作洗脱液抑制器装置的方面和用作洗脱液发生器装置的方面。 通常，该装置包括一种离聚物聚合物材料的整体块，其具有（1）第一通道，其具有入口端口，出口端口和设置在其间的暴露聚合物材料的有效长度，（2）第二通道，其具有入口端口 （3）至少部分地暴露的第一和第二电极，所述第一和第二至少部分暴露的电极被定位成与所述第二通道电连通，其中所述第二电极至少部分地设置在所述第一电极和所述第二电极之间， 穿过第一电极的第二通道。 在电极之间流动的电流将驱动离子在活性段之间的电渗析迁移，在抑制设备的情况下从洗脱液流到发生器设备的情况下到洗脱液流。

    MECHANISMS FOR CONSTRUCTING SPLINE SURFACES TO PROVIDE INTER-SURFACE CONTINUITY
    56.
    发明申请
    MECHANISMS FOR CONSTRUCTING SPLINE SURFACES TO PROVIDE INTER-SURFACE CONTINUITY 审中-公开
    用于构建样条曲面以提供表面间连续性的机制

    公开(公告)号：WO2017142953A1

    公开(公告)日：2017-08-24

    申请号：PCT/US2017/017985

    申请日：2017-02-15

    Applicant: BOARD OF REGENTS, UNIVERSITY OF TEXAS SYSTEM ,  UNIVERSITY OF UTAH RESEARCH FOUNDATION

    Inventor： URICK, Benjamin ,  HUGHES, Thomas J. R. ,  CRAWFORD, Richard H. ,  COHEN, Elaine ,  RIESENFELD, Richard F.

    IPC: G06F17/11 ,  G06F17/30 ,  G06F17/17

    CPC classification number: G06F17/50 ,  G06F17/175 ,  G06F17/5018 ,  G06F17/5095 ,  G06T17/30 ,  G06T19/20 ,  G06T2219/2021

    Abstract: A mechanism is disclosed for reconstructing trimmed surfaces whose underlying spline surfaces intersect in model space, so that the reconstructed version of each original trimmed surface is geometrically close to the original trimmed surface, and so that the boundary of each respective reconstructed version includes a model space trim curve that approximates the geometric intersection of the underlying spline surfaces. Thus, the reconstructed versions will meet in a continuous fashion along the model space curve. The mechanism may operate on already trimmed surfaces such as may be available in a boundary representation object model, or, on spline surfaces that are to be trimmed, e.g., as part of a Boolean operation in a computer-aided design system. The ability to create objects with surface-surface intersections that are free of gaps liberates a whole host of downstream industries to perform their respective applications without the burdensome labor of gap repair, and thus, multiplies the efficacy of those industries.

    Abstract translation: 公开了一种机制，用于重建其下面的样条曲面在模型空间中相交的修剪曲面，以使得每个原始修剪曲面的重构版本在几何上接近原始修剪曲面，并且使得 每个相应的重构版本都包括一个模型空间修剪曲线，该曲线近似于下面的样条曲面的几何相交。 因此，重建的版本将沿着模型空间曲线以连续的方式相遇。 该机构可以在已经修剪过的表面上操作，例如可以在边界表示对象模型中获得，或者在待修剪的样条表面上，例如作为计算机辅助设计系统中的布尔操作的一部分。 通过表面交叉创建物体的能力解放了许多下游行业，以执行其各自的应用，而无需修复间隙，从而使这些行业的功效倍增。

    PREPARATION OF BROMOMETHYLATED DERIVATIVES VIA PROTECTION WITH TRIHALOACETIC ANHYDRIDE
    59.
    发明申请
    PREPARATION OF BROMOMETHYLATED DERIVATIVES VIA PROTECTION WITH TRIHALOACETIC ANHYDRIDE 审中-公开
    通过三羟甲基丙烷的保护制备溴代甲基衍生物

    公开(公告)号：WO2013049013A2

    公开(公告)日：2013-04-04

    申请号：PCT/US2012/057038

    申请日：2012-09-25

    Applicant: BOARD OF REGENTS, UNIVERSITY OF TEXAS SYSTEM ,  GUTIERREZ, Jose J.

    Inventor： GUTIERREZ, Jose J.

    CPC classification number: C07C217/84 ,  C07C233/25 ,  Y02P20/55

    Abstract: Discussed herein is the direct bromomethylation of aromatic compounds (e.g., aniline derivatives) via in situ protection with a trihaloacetyl protecting group. Also discussed is the radical bromination of trihaloacetyl protected dimethyl aromatic compounds (e.g., dimethyl anilines). The resulting products mono- and di-bromomethylated products may be used to form novel products.

    Abstract translation: 本文讨论的是通过三卤代乙酰保护基的原位保护直接溴甲基化芳族化合物（例如苯胺衍生物）。 还讨论了三卤代乙酰基保护的二甲基芳族化合物（例如二甲基苯胺）的自由基溴化。 所得产物单 - 和二 - 溴甲基化产物可用于形成新产品。

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