公开(公告)号：WO2022012888A1

公开(公告)日：2022-01-20

申请号：PCT/EP2021/067268

申请日：2021-06-24

Applicant: ASML NETHERLANDS B.V.

Inventor： LEI, Hairong ,  FANG, Wei

IPC: G06T5/00 ,  G06K9/40 ,  G06T5/20

Abstract: Described herein is a method for training a denoising model. The method includes obtaining a first set of simulated images based on design patterns. The simulated images may be clean and can be added with noise to generate noisy simulated images. The simulated clean and noisy images are used as training data to generate a denoising model.

公开(公告)号：WO2022012844A1

公开(公告)日：2022-01-20

申请号：PCT/EP2021/066369

申请日：2021-06-17

Applicant: ASML NETHERLANDS B.V.

Inventor： SCHNEIDERS, Mauritius, Gerardus, Elisabeth ,  VAN BERKEL, Koos ,  JIN, Wenjie

IPC: G03F7/20

Abstract: A method for calculating a spatial map associated with a component, the spatial map indicating spatial variations of thermal expansion parameters in the component, the method comprising: providing or determining a temperature distribution in the component as a function of time; calculating the spatial map associated with the component using the provided or determined temperature distribution in the component and optical measurements of a radiation beam that has interacted directly or indirectly with the component, the optical measurements being time synchronized with the provided or determined temperature distribution in the component.

公开(公告)号：WO2022008462A1

公开(公告)日：2022-01-13

申请号：PCT/EP2021/068548

申请日：2021-07-05

Applicant: ASML NETHERLANDS B.V.

Inventor： WIELAND, Marco, Jan-Jaco ,  NIHTIANOV, Stoyan ,  VEENSTRA, Roy, Ramon ,  JIANG, Hui

IPC: H01L27/144 ,  H01L27/146 ,  H01L31/115 ,  H01J37/12 ,  H01J37/153 ,  H01J37/244 ,  H01J37/28 ,  H01J37/317

Abstract: There is provided a detector substrate (or detector array) for use in a charged particle multi-beam assessment tool to detect charged particles from a sample. The detector substrate defines an array of apertures for the beam paths of respective charged particle beams of a multi-beam. The detector substrate comprises: a sensor unit array. A sensor unit of the sensor unit array is adjacent a corresponding aperture of the aperture array. The sensor unit is configured to capture charged particles from the sample. The detector array comprises an amplification circuit associated with each sensor unit in the sensor unit array and proximate to the corresponding aperture in the aperture array. The amplification circuit comprising a Trans Impedance Amplifier and/or an analogue to digital converter.

公开(公告)号：WO2022008145A1

公开(公告)日：2022-01-13

申请号：PCT/EP2021/065212

申请日：2021-06-08

Applicant: ASML NETHERLANDS B.V.

Inventor： HAGHI, Poorya ,  MCGROGAN, Sean W. ,  JACQUES, Robert N. ,  RIGGS, Daniel, Jason ,  MATTHES, Liane, Manuela

IPC: H05G2/00

Abstract: Systems, apparatuses, and methods are provided for steering aligning a laser beam and a fuel target. An example method can include generating, at a first rate, first sensing data indicative of a first overlap between a fuel target and a laser beam. The example method can further include generating, at a second rate, second sensing data indicative of a second overlap between the fuel target and the laser beam. The method can further include generating, at a third rate, and based on the first sensing data and the second sensing data, a steering control signal configured to steer the laser beam or the fuel target. In some aspects, the second rate can be different from the first rate, and the third rate can be about equal to the first rate. In other aspects, the first rate and the second rate can be about equal to the third rate.

公开(公告)号：WO2022002599A1

公开(公告)日：2022-01-06

申请号：PCT/EP2021/066324

申请日：2021-06-17

Applicant: ASML NETHERLANDS B.V.

Inventor： JIANG, Aiqin ,  RAGHUNATHAN, Sudharshanan ,  FREEMAN, Jill, Elizabeth ,  WANG, Fuming ,  YAN, Fei

IPC: G03F7/20 ,  G03F7/705 ,  G03F7/70625

Abstract: Described herein is a method for determining a process window of a patterning process based on a failure rate. The method includes (a) obtaining a plurality of features printed on a substrate, (b) grouping, based on a metric, the features into a plurality of groups, and (c) generating, based on measurement data associated with a group of features, a base failure rate model for the group of features, wherein the base failure rate model identifies the process window related to the failure rate of the group of features. The method further includes generating, using the base failure rate model, a feature-specific failure rate model for a specific feature, wherein the feature-specific failure rate model identifies a feature-specific process window such that an estimated failure rate of the specific feature is below a specified threshold.

公开(公告)号：WO2022002560A1

公开(公告)日：2022-01-06

申请号：PCT/EP2021/065676

申请日：2021-06-10

Applicant: ASML NETHERLANDS B.V.

Inventor： SIMMONS, Rodney, D ,  KAMBHAMPATI, Murali, Krishna ,  MITRY, Mark, Joseph ,  URONE, Dustin, Michael ,  LI, Shuqi ,  DONKER, Rilpho, Ludovicus ,  MCKENZIE, Paul, Alexander

IPC: G03F7/20 ,  G02B7/00 ,  H05G2/00 ,  G02B7/007 ,  G03F7/70033 ,  G03F7/70841 ,  G03F7/7085 ,  H05G2/005 ,  H05G2/008

Abstract: Systems, apparatuses, and methods are provided for optical metrology in an extreme ultraviolet (EUV) radiation system. An example system can include a metrology system and a window. An example metrology system can be configured to be disposed in a first environment and to perform one or more measurements of a region in a second environment along an optical axis of the metrology system. An example window can be configured to be disposed intersecting the optical axis and to isolate the metrology system from the second environment. The example window can be further configured to limit a transverse displacement from the optical axis to less than about ± 50 microns from a nominal transverse displacement from the optical axis at a primary focus of a radiation collector.

公开(公告)号：WO2022002519A1

公开(公告)日：2022-01-06

申请号：PCT/EP2021/064753

申请日：2021-06-02

Applicant: ASML NETHERLANDS B.V.

Inventor： DOLK, Victor, Sebastiaan ,  VAN BERKEL, Koos ,  SCHNEIDERS, Mauritius, Gerardus, Elisabeth

IPC: G03F7/20 ,  G03F7/705 ,  G03F7/7085 ,  G03F7/70891

Abstract: The invention provides a method for thermo-mechanical control of a heat sensitive element (Ml) subject to a heat load, comprising: -providing a non-linear thermo-mechanical model of the heat sensitive element describing a dynamical relationship between characteristics of the heat load and deformation of the heat sensitive element; -calculating a control signal on the basis of an optimization calculation of the non-linear model, -providing an actuation signal to a heater (HE), wherein the actuation signal is at least partially based on the control signal, -heating the heat sensitive element by the heater on the basis of the actuation signal.

公开(公告)号：WO2022002497A1

公开(公告)日：2022-01-06

申请号：PCT/EP2021/064239

申请日：2021-05-27

Applicant: ASML NETHERLANDS B.V.

Inventor： JANSEN, Maarten, Jozef ,  IKKINK, Teunis, Jan

IPC: G01B9/02 ,  G03F7/20 ,  G03F9/00 ,  G01B9/02003 ,  G01B9/02007 ,  G01B9/02083 ,  G03F7/70775 ,  G03F9/7049

Abstract: The invention provides a a method to determine one or more signal parameters of each signal of interest in a plurality of signals of interest received at a single detector of a heterodyne interferometer, said method comprising the following steps: a. for each signal or interest, calculating a cleaned-up signal by estimating signal contributions of the other signals of interest and subtracting these estimated signal contributions from the plurality of signals of interest; and b. for each signal of interest, determining one or more signal parameters from the respective cleaned-up signal.

公开(公告)号：WO2021254810A1

公开(公告)日：2021-12-23

申请号：PCT/EP2021/065197

申请日：2021-06-07

Applicant: ASML NETHERLANDS B.V. ,  ASML HOLDING N.V.

Inventor： HUISMAN, Simon, Reinald ,  MALYK, Sergey ,  LIN, Yuxiang ,  SLOTBOOM, Daan, Maurits

IPC: G03F7/20 ,  G03F9/00 ,  G03F7/705 ,  G03F7/70616 ,  G03F9/7088

Abstract: A system includes an illumination system, an optical element, a switching element and a detector. The illumination system includes a broadband light source that generates a beam of radiation. The dispersive optical element receives the beam of radiation and generates a plurality of light beams having a narrower bandwidth than the broadband light source. The optical switch receives the plurality of light beams and transmits each one of the plurality of light beams to a respective one of a plurality of alignment sensor of a sensor array. The detector receives radiation returning from the sensor array and to generate a measurement signal based on the received radiation.

公开(公告)号：WO2021249768A1

公开(公告)日：2021-12-16

申请号：PCT/EP2021/063942

申请日：2021-05-25

Applicant: ASML NETHERLANDS B.V. ,  ASML HOLDING N.V.

Inventor： DE GROOT, Antonius, Franciscus, Johannes ,  AKBAS, Mehmet, Ali ,  CIFTCI SANDIKCI, Aysegul ,  DENG, Jerry, Jianguo ,  NEKLYUDOVA, Mariya ,  MAYER, Ryan ,  GUPTA, Sonia ,  STENEKEN, Ryan, Charles ,  VAN DE WINKEL, Jimmy, Matheus, Wilhelmus ,  OLEXOVITCH, Christopher M. ,  PERRY, Michael

IPC: G03F7/20 ,  H01L21/687 ,  G03F7/707 ,  G03F7/7095 ,  H01L21/6875 ,  H01L21/68757

Abstract: Described herein is a method of producing a substrate holder for use in a lithographic apparatus, the substrate holder comprising a plurality of burls projecting from the substrate holder and each burl having a distal end surface configured to engage with a substrate. The method including applying, via a plasma enhanced chemical vapor deposition, a coating of a wear-resistant material at the distal end surface of one or more burls of the plurality of burls. The applying of the coating includes adjusting radio frequency (RF) power of RF electrodes in a range 100 to 1000 W for creating plasma; and exposing, in a chamber, the one or more plurality of burls to a precursor gas at a gas flow rate between 20 to 300 seem, the pre-cursor gas being Flexane.