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    PARTICLE TRAP FOR A PLASMA SOURCE
    2.
    发明申请
    PARTICLE TRAP FOR A PLASMA SOURCE 审中-公开
    用于等离子体源的颗粒捕获

    公开(公告)号：WO2009158249A2

    公开(公告)日：2009-12-30

    申请号：PCT/US2009/047631

    申请日：2009-06-17

    申请人： MKS INSTRUMENTS, INC. ,  SHAJII, Ali ,  CHEN, Xing ,  COWE, Andrew ,  BURTNER, David ,  ENTLEY, William, Robert ,  SHAO, Shouqian

    发明人： SHAJII, Ali ,  CHEN, Xing ,  COWE, Andrew ,  BURTNER, David ,  ENTLEY, William, Robert ,  SHAO, Shouqian

    IPC分类号： H01J37/32

    CPC分类号： H01J37/32357 ,  H01J37/32871 ,  Y10S55/15 ,  Y10T29/4935

    摘要： A particle trap for a remote plasma source includes a body structure having an inlet for coupling to a chamber of a remote plasma source and an outlet for coupling to a process chamber inlet. The particle trap for a remote plasma source also includes a gas channel formed in the body structure and in fluid communication with the body structure inlet and the body structure outlet. The gas channel can define a path through the body structure that causes particles in a gas passing from a first portion of the channel to strike a wall that defines a second portion of the gas channel at an angle relative to a surface of the wall. A coolant member can be in thermal communication with the gas channel.

    摘要翻译： 用于远程等离子体源的颗粒捕集器包括具有用于耦合到远程等离子体源的室的入口和用于耦合到处理室入口的出口的主体结构。 用于远程等离子体源的颗粒捕获器还包括形成在主体结构中并与主体结构入口和主体结构出口流体连通的气体通道。 气体通道可以限定穿过主体结构的路径，其使得从通道的第一部分通过的气体中的颗粒撞击限定气体通道的第二部分的壁，该壁相对于壁的表面成一定角度。 冷却剂构件可以与气体通道热连通。

    TOROIDAL LOW-FIELD REACTIVE GAS AND PLASMA SOURCE HAVING A DIELECTRIC VACUUM VESSEL
    3.
    发明申请
    TOROIDAL LOW-FIELD REACTIVE GAS AND PLASMA SOURCE HAVING A DIELECTRIC VACUUM VESSEL 审中-公开
    具有电介质真空容器的TOROIDAL低场反应气体和等离子体源

    公开(公告)号：WO2004095499A3

    公开(公告)日：2005-02-10

    申请号：PCT/US2004011183

    申请日：2004-04-12

    申请人： APPLIED SCIENCE & TECHNOLOGY I ,  HOLBER WILLIAM M ,  CHEN XING ,  COWE ANDREW B ,  BESEN MATTHEW M ,  COLLINS JR RONALD W ,  TRULLI SUSAN C ,  SHAO SHOUQIAN

    发明人： HOLBER WILLIAM M ,  CHEN XING ,  COWE ANDREW B ,  BESEN MATTHEW M ,  COLLINS JR RONALD W ,  TRULLI SUSAN C ,  SHAO SHOUQIAN

    IPC分类号： H01J37/32

    CPC分类号： H01J37/32357 ,  H01J37/32009 ,  H01J37/32091 ,  H01J37/321 ,  H01J37/32449 ,  H01J37/32467 ,  H01J37/32522

    摘要： Plasma ignition and cooling apparatus and methods for plasma systems are described. An apparatus (300) includes a vessel (310) and at least one ignition electrode (330) adjacent to the vessel. A total length of a dimension (D) of the at least one ignition electrode is greater than 10% of a length of the vessel's channel. The apparatus can include a dielectric toroidal vessel, a heat sink having multiple segments urged toward the vessel by a spring-loaded mechanism, and a thermal interface between the vessel and the heat sink. A method can include providing a gas having a flow rate and a pressure and directing a portion of the flow rate of the gas into a vessel channel. The gas is ignited in the channel while the remaining portion of the flow rate is directed away from the channel.

    摘要翻译： 描述了等离子体点火和冷却装置和等离子体系统的方法。 装置（300）包括容器（310）和与容器相邻的至少一个点火电极（330）。 所述至少一个点火电极的尺寸（D）的总长度大于所述容器通道的长度的10％。 该装置可以包括介质环形容器，具有通过弹簧加载机构朝向容器推动的多个部分的散热器以及容器和散热器之间的热界面。 一种方法可以包括提供具有流速和压力的气体并将气体的一部分流量引导到容器通道中。 气体在通道中被点燃，而流量的剩余部分被引导离开通道。

    PARTICLE REDUCTION THROUGH GAS AND PLASMA SOURCE CONTROL
    4.
    发明申请
    PARTICLE REDUCTION THROUGH GAS AND PLASMA SOURCE CONTROL 审中-公开
    通过气体和等离子体源控制减少颗粒

    公开(公告)号：WO2008154222A1

    公开(公告)日：2008-12-18

    申请号：PCT/US2008/065651

    申请日：2008-06-03

    申请人： MKS INSTRUMENTS, INC. ,  ENTLEY, William, Robert ,  CHEN, Xing ,  SHAJII, Ali ,  BAKHTARI, Kaveh ,  COWE, Andrew

    发明人： ENTLEY, William, Robert ,  CHEN, Xing ,  SHAJII, Ali ,  BAKHTARI, Kaveh ,  COWE, Andrew

    IPC分类号： H01J37/32

    CPC分类号： H01J37/3299 ,  H01J37/32357 ,  H01J37/3244 ,  H01J37/32449

    摘要： A system for producing excited gases for introduction to a. semiconductor processing chamber. The system includes a plasma source (104) for generating a plasma. The plasma source includes a plasma chamber (156) and a gas inlet (126) for receiving process gases from a gas source (116). A gas flow rate controller (108) is coupled to the gas inlet for controlling an inlet flow rate of the process gases from the gas source to the plasma chamber via the gas inlet. The system includes a control loop for detecting a transition from a first process gas. to a second process gas and for adjusting the inlet flow rate of the second process gas from about 0 seem to about 10,000 seem over a period of time greater than about 300 milliseconds to maintain transient heat flux loads applied by the plasma to an inner surface of the plasma chamber below a vaporization temperature of the plasma chamber.

    摘要翻译： 用于生产用于引入a的激发气体的系统。 半导体处理室。 该系统包括用于产生等离子体的等离子体源（104）。 等离子体源包括用于从气体源（116）接收工艺气体的等离子体室（156）和气体入口（126）。 气体流量控制器（108）耦合到气体入口，用于经由气体入口控制从气体源到等离子体室的处理气体的入口流量。 该系统包括用于检测来自第一处理气体的转变的控制回路。 到第二工艺气体并且用于在大于约300毫秒的时间段内将第二工艺气体的入口流量从约0sccm调节至约10,000sccm，以将由等离子体施加的瞬态热通量负载保持在 等离子体室低于等离子体室的汽化温度。

    PARTICLE TRAP FOR A PLASMA SOURCE
    6.
    发明申请
    PARTICLE TRAP FOR A PLASMA SOURCE 审中-公开
    用于等离子体源的颗粒捕获

    公开(公告)号：WO2009158249A3

    公开(公告)日：2014-09-25

    申请号：PCT/US2009047631

    申请日：2009-06-17

    申请人： MKS INSTR INC ,  SHAJII ALI ,  CHEN XING ,  COWE ANDREW ,  BURTNER DAVID ,  ENTLEY WILLIAM ROBERT ,  SHAO SHOUQIAN

    发明人： SHAJII ALI ,  CHEN XING ,  COWE ANDREW ,  BURTNER DAVID ,  ENTLEY WILLIAM ROBERT ,  SHAO SHOUQIAN

    IPC分类号： H01J37/32

    CPC分类号： H01J37/32357 ,  H01J37/32871 ,  Y10S55/15 ,  Y10T29/4935

    摘要： A particle trap for a remote plasma source includes a body structure having an inlet for coupling to a chamber of a remote plasma source and an outlet for coupling to a process chamber inlet. The particle trap for a remote plasma source also includes a gas channel formed in the body structure and in fluid communication with the body structure inlet and the body structure outlet. The gas channel can define a path through the body structure that causes particles in a gas passing from a first portion of the channel to strike a wall that defines a second portion of the gas channel at an angle relative to a surface of the wall. A coolant member can be in thermal communication with the gas channel.

    摘要翻译： 用于远程等离子体源的颗粒捕集器包括具有用于耦合到远程等离子体源的室的入口和用于耦合到处理室入口的出口的主体结构。 用于远程等离子体源的颗粒捕获器还包括形成在主体结构中并与主体结构入口和主体结构出口流体连通的气体通道。 气体通道可以限定穿过主体结构的路径，其使得从通道的第一部分通过的气体中的颗粒撞击限定气体通道的第二部分的壁，该壁相对于壁的表面成一定角度。 冷却剂构件可以与气体通道热连通。