公开(公告)号：WO2010098779A1

公开(公告)日：2010-09-02

申请号：PCT/US2009/040358

申请日：2009-04-13

申请人： MKS INSTRUMENTS, INC. ,  BENZERROUK, Souheil ,  NAGARKATTI, Siddharth, P. ,  COWE, Andrew ,  SHAJII, Ali ,  AMBROSINA, Jesse, E. ,  TRAN, Ken ,  CHEN, Xing

发明人： BENZERROUK, Souheil ,  NAGARKATTI, Siddharth, P. ,  COWE, Andrew ,  SHAJII, Ali ,  AMBROSINA, Jesse, E. ,  TRAN, Ken ,  CHEN, Xing

IPC分类号： H01J37/32

CPC分类号： H01J37/32009 ,  H01J37/321

摘要： Described are methods and apparatuses, including computer program products, for igniting and/or sustaining a plasma in a reactive gas generator. Power is provided from an ignition power supply to a plasma ignition circuit. A pre-ignition signal of the plasma ignition circuit is measured. The power provided to the plasma ignition circuit is adjusted based on the measured pre-ignition signal and an adjustable pre-ignition control signal. The adjustable pre-ignition control signal is adjusted after a period of time has elapsed.

摘要翻译： 描述了用于在反应性气体发生器中点燃和/或维持等离子体的方法和装置，包括计算机程序产品。 从点火电源向等离子体点火电路供电。 测量等离子体点火电路的预点火信号。 基于所测量的预先点火信号和可调节的预点火控制信号来调节提供给等离子体点火电路的功率。 经过一段时间后，调节可调节点火控制信号。

公开(公告)号：WO2009158249A2

公开(公告)日：2009-12-30

申请号：PCT/US2009/047631

申请日：2009-06-17

申请人： MKS INSTRUMENTS, INC. ,  SHAJII, Ali ,  CHEN, Xing ,  COWE, Andrew ,  BURTNER, David ,  ENTLEY, William, Robert ,  SHAO, Shouqian

发明人： SHAJII, Ali ,  CHEN, Xing ,  COWE, Andrew ,  BURTNER, David ,  ENTLEY, William, Robert ,  SHAO, Shouqian

IPC分类号： H01J37/32

CPC分类号： H01J37/32357 ,  H01J37/32871 ,  Y10S55/15 ,  Y10T29/4935

摘要： A particle trap for a remote plasma source includes a body structure having an inlet for coupling to a chamber of a remote plasma source and an outlet for coupling to a process chamber inlet. The particle trap for a remote plasma source also includes a gas channel formed in the body structure and in fluid communication with the body structure inlet and the body structure outlet. The gas channel can define a path through the body structure that causes particles in a gas passing from a first portion of the channel to strike a wall that defines a second portion of the gas channel at an angle relative to a surface of the wall. A coolant member can be in thermal communication with the gas channel.

摘要翻译： 用于远程等离子体源的颗粒捕集器包括具有用于耦合到远程等离子体源的室的入口和用于耦合到处理室入口的出口的主体结构。 用于远程等离子体源的颗粒捕获器还包括形成在主体结构中并与主体结构入口和主体结构出口流体连通的气体通道。 气体通道可以限定穿过主体结构的路径，其使得从通道的第一部分通过的气体中的颗粒撞击限定气体通道的第二部分的壁，该壁相对于壁的表面成一定角度。 冷却剂构件可以与气体通道热连通。

公开(公告)号：WO2005094404A2

公开(公告)日：2005-10-13

申请号：PCT/US2005002783

申请日：2005-02-01

申请人： MKS INSTR INC ,  SHAJII ALI ,  NAGARKATTI SIDDHARTH

发明人： SHAJII ALI ,  NAGARKATTI SIDDHARTH

IPC分类号： C23F1/00 ,  F17D3/00

CPC分类号： G05D7/0664 ,  C23C16/45561 ,  C23C16/52 ,  Y10T137/0363 ,  Y10T137/2524

摘要： A system for dividing a single flow into two or more secondary flows of desired ratios, including an inlet adapted to receive the single flow, at least two secondary flow lines connected to the inlet, an input device adapted to receive at least one desired ratio of flow, at least one in-situ process monitor providing measurements of products produced by each of the flows lines, and a controller connected to the input device and the in-situ process monitor. The controller is programmed to receive the desired ratio of flow through the input device, receive the product measurements from the in-situ process monitor, and calculate a corrected ratio of flow based upon the desired ratio of flow and the product measurements. If the product measurements are not equal, then the corrected ratio of flow will be different than the desired ratio of flow.

摘要翻译： 一种用于将单个流分成两个或更多个期望比例的二次流的系统，包括适于接收单个流的入口，连接到入口的至少两个二次流线，适于接收至少一个期望比例的输入装置 至少一个原位过程监视器，其提供由每个流水线产生的产品的测量值，以及连接到输入设备和原位过程监控器的控制器。 控制器被编程为接收通过输入设备的期望流量比，从原位过程监控器接收产品测量值，并且基于所需的流量比和产品测量值来计算校正的流量比。 如果产品测量值不相等，则校正后的流量比将不同于所需的流量比。

公开(公告)号：WO2012018367A3

公开(公告)日：2012-03-29

申请号：PCT/US2011001176

申请日：2011-06-30

申请人： LAM RES CORP ,  SHAJII ALI ,  GOTTSCHO RICHARD ,  BENZERROUK SOUHEIL ,  COWE ANDREW ,  NAGARKATTI SIDDHARTH P ,  ENTLEY WILLIAM R

发明人： SHAJII ALI ,  GOTTSCHO RICHARD ,  BENZERROUK SOUHEIL ,  COWE ANDREW ,  NAGARKATTI SIDDHARTH P ,  ENTLEY WILLIAM R

IPC分类号： H05B31/26

CPC分类号： H05H1/46 ,  H01J37/321 ,  H01J37/3211 ,  H01J37/32357 ,  H01J37/32422 ,  H01J37/3244 ,  H01J37/32449 ,  H01J37/3266 ,  H01J37/32669 ,  H01J37/32816 ,  H01J2237/334 ,  H05H2001/4652 ,  H05H2001/4682

摘要： A plasma source includes a ring plasma chamber, a primary winding around an exterior of the ring plasma chamber and multiple ferrites, wherein the ring plasma chamber passes through each of the ferrites. A system and method for generating a plasma are also described.

摘要翻译： 等离子体源包括环等离子体室，围绕环等离子体室的外部的初级绕组和多个铁氧体，其中环等离子体室穿过每个铁氧体。 还描述了用于产生等离子体的系统和方法。

公开(公告)号：WO2006055314A3

公开(公告)日：2006-08-10

申请号：PCT/US2005040280

申请日：2005-11-07

申请人： MKS INSTR INC ,  SHAJII ALI ,  MENEGHINI PAUL

发明人： SHAJII ALI ,  MENEGHINI PAUL

IPC分类号： G01F5/00 ,  G01F1/684 ,  G01F1/696 ,  G01F15/04

CPC分类号： G01F15/046 ,  G01F1/6847 ,  G01F1/6965 ,  G01F5/00

摘要： A mass flow rate sensor uses a Reynolds number correction function to compensate for errors in a bypass ratio of the sensor for all gases, based on the fact that all bypass errors are functions of Reynolds number. The sensor includes a sensor tube and a bypass tube dividing flow, wherein a bypass ratio of the sensor equals a total flow rate through the sensor divided by a flow rate through just the sensor tube. Heater elements heat an upstream portion and a downstream portion of the sensor tube, and a circuit is connected to the heater elements for producing a voltage based upon a difference in resistance between the heater elements. The voltage is calibrated based on known flow rates of a reference gas, and the flow rate through the sensor is based upon the calibrated voltage multiplied by a multi-gas correction function and a Reynolds number correction function.

摘要翻译： 基于所有旁路误差都是雷诺数的函数的事实，质量流率传感器使用雷诺数校正函数来补偿所有气体的传感器的旁路比中的误差。 传感器包括传感器管和分流管的旁路管，其中传感器的旁路比等于通过传感器的总流量除以仅通过传感器管的流速。 加热器元件加热传感器管的上游部分和下游部分，并且电路连接到加热器元件，用于基于加热器元件之间的电阻差产生电压。 电压基于已知的参考气体流量进行校准，并且通过传感器的流量基于校准电压乘以多气体校正函数和雷诺数校正函数。

公开(公告)号：WO2006055314A2

公开(公告)日：2006-05-26

申请号：PCT/US2005/040280

申请日：2005-11-07

申请人： MKS INSTRUMENTS, INC. ,  SHAJII, Ali ,  MENEGHINI, Paul

发明人： SHAJII, Ali ,  MENEGHINI, Paul

CPC分类号： G01F15/046 ,  G01F1/6847 ,  G01F1/6965 ,  G01F5/00

摘要： A mass flow rate sensor uses a Reynolds number correction function to compensate for errors in a bypass ratio of the sensor for all gases, based on the fact that all bypass errors are functions of Reynolds number. The sensor includes a sensor tube and a bypass tube dividing flow, wherein a bypass ratio of the sensor equals a total flow rate through the sensor divided by a flow rate through just the sensor tube. Heater elements heat an upstream portion and a downstream portion of the sensor tube, and a circuit is connected to the heater elements for producing a voltage based upon a difference in resistance between the heater elements. The voltage is calibrated based on known flow rates of a reference gas, and the flow rate through the sensor is based upon the calibrated voltage multiplied by a multi-gas correction function and a Reynolds number correction function.

摘要翻译： 基于所有旁路误差是雷诺数的函数的事实，质量流量传感器使用雷诺数校正功能来补偿所有气体的传感器的旁路比的误差。 传感器包括传感器管和旁路管分流，其中传感器的旁路比等于通过传感器的总流量除以仅通过传感器管的流量。 加热元件加热传感器管的上游部分和下游部分，并且电路连接到加热器元件，用于基于加热器元件之间的电阻差产生电压。 基于参考气体的已知流速校准电压，并且通过传感器的流量基于校准电压乘以多气体校正功能和雷诺数校正功能。

公开(公告)号：WO2008154222A1

公开(公告)日：2008-12-18

申请号：PCT/US2008/065651

申请日：2008-06-03

申请人： MKS INSTRUMENTS, INC. ,  ENTLEY, William, Robert ,  CHEN, Xing ,  SHAJII, Ali ,  BAKHTARI, Kaveh ,  COWE, Andrew

发明人： ENTLEY, William, Robert ,  CHEN, Xing ,  SHAJII, Ali ,  BAKHTARI, Kaveh ,  COWE, Andrew

IPC分类号： H01J37/32

CPC分类号： H01J37/3299 ,  H01J37/32357 ,  H01J37/3244 ,  H01J37/32449

摘要： A system for producing excited gases for introduction to a. semiconductor processing chamber. The system includes a plasma source (104) for generating a plasma. The plasma source includes a plasma chamber (156) and a gas inlet (126) for receiving process gases from a gas source (116). A gas flow rate controller (108) is coupled to the gas inlet for controlling an inlet flow rate of the process gases from the gas source to the plasma chamber via the gas inlet. The system includes a control loop for detecting a transition from a first process gas. to a second process gas and for adjusting the inlet flow rate of the second process gas from about 0 seem to about 10,000 seem over a period of time greater than about 300 milliseconds to maintain transient heat flux loads applied by the plasma to an inner surface of the plasma chamber below a vaporization temperature of the plasma chamber.

摘要翻译： 用于生产用于引入a的激发气体的系统。 半导体处理室。 该系统包括用于产生等离子体的等离子体源（104）。 等离子体源包括用于从气体源（116）接收工艺气体的等离子体室（156）和气体入口（126）。 气体流量控制器（108）耦合到气体入口，用于经由气体入口控制从气体源到等离子体室的处理气体的入口流量。 该系统包括用于检测来自第一处理气体的转变的控制回路。 到第二工艺气体并且用于在大于约300毫秒的时间段内将第二工艺气体的入口流量从约0sccm调节至约10,000sccm，以将由等离子体施加的瞬态热通量负载保持在 等离子体室低于等离子体室的汽化温度。

公开(公告)号：WO2007053569A1

公开(公告)日：2007-05-10

申请号：PCT/US2006/042360

申请日：2006-10-31

申请人： MKS INSTRUMENTS, INC. ,  NAGARKATTI, Siddharth, P. ,  KISHINEVSKY, Michael ,  SHAJII, Ali ,  KALVAITIS, Timothy, E. ,  MCKINNEY, William, S. ,  GOODMAN, Daniel ,  HOLBER, William, M. ,  SMITH, John, A.

发明人： NAGARKATTI, Siddharth, P. ,  KISHINEVSKY, Michael ,  SHAJII, Ali ,  KALVAITIS, Timothy, E. ,  MCKINNEY, William, S. ,  GOODMAN, Daniel ,  HOLBER, William, M. ,  SMITH, John, A.

IPC分类号： H03H7/40

CPC分类号： H03H7/40

摘要： A system (200) and method are provided for delivering power to a dynamic load (260). The system includes a power supply (210) providing DC power having a substantially constant power open loop response, a power amplifier (220) for converting the DC power to RF power, a sensor (240) for measuring voltage, current and phase angle between voltage and current vectors associated with the RF power, an electrically controllable impedance matching system (250, 252) to modify the impedance of the power amplifier to at least a substantially matched impedance of the dynamic load (260), and a controller (230) for controlling the electrically controllable impedance matching system (200). The system (200) further includes a sensor calibration measuring module for determining power delivered by the power amplifier, an electronic matching system calibration module (252) for determining power delivered to the dynamic load, (260) and a power dissipation module for calculating power dissipated in the electrically controllable impedance matching system.

摘要翻译： 提供了一种用于将功率传递给动态负载（260）的系统（200）和方法。 该系统包括提供具有基本上恒定的功率开环响应的DC电力的电源（210），用于将DC功率转换成RF功率的功率放大器（220），用于测量DC功率的电压，电流和相位角的传感器（240） 与RF功率相关联的电压和电流矢量;将电力可控阻抗匹配系统（250,252）修改成至少动态负载（260）的基本上匹配的阻抗的功率放大器的阻抗;以及控制器（230） 用于控制电可控阻抗匹配系统（200）。 所述系统（200）还包括用于确定由所述功率放大器输出的功率的传感器校准测量模块，用于确定输送到所述动态负载的功率的电子匹配系统校准模块（252）和用于计算功率的功率耗散模块 消耗在电可控阻抗匹配系统中。

公开(公告)号：WO2007032826A2

公开(公告)日：2007-03-22

申请号：PCT/US2006029921

申请日：2006-07-28

申请人： MKS INSTR INC ,  MENEGHINI PAUL ,  SMITH DANIEL ,  SHAJII ALI

发明人： MENEGHINI PAUL ,  SMITH DANIEL ,  SHAJII ALI

CPC分类号： G05D11/133 ,  C23C16/4481 ,  C23C16/45512 ,  C23C16/52

摘要： A system and method are described that control the amount of precursor that is delivered to a process chamber by precisely measuring the mole fraction of the gas mixture being delivered. A gas delivery system includes a delivery chamber, a precursor inlet valve, a carrier inlet valve, an outlet valve, and a controller. The controller controls the opening and closing of the precursor inlet valve, the carrier inlet valve, and the outlet valve, so as to introduce a desired amount of a precursor gas and a carrier gas into the delivery chamber, to generate a gas mixture having a desired mole fraction of the precursor gas, and to deliver to the process chamber the gas mixture having the desired mole fraction of the precursor gas.

摘要翻译： 描述了一种系统和方法，其通过精确测量被输送的气体混合物的摩尔分数来控制被输送到处理室的前体的量。 气体输送系统包括输送室，前体入口阀，载体入口阀，出口阀和控制器。 控制器控制前体入口阀，载体入口阀和出口阀的打开和关闭，以便将所需量的前体气体和载气引入到输送室中，以产生具有 前体气体的所需摩尔分数，并将具有所需前体气体摩尔分数的气体混合物输送到处理室。

公开(公告)号：WO2005094404A3

公开(公告)日：2005-10-13

申请号：PCT/US2005/002783

申请日：2005-02-01

申请人： MKS INSTRUMENTS, INC. ,  SHAJII, Ali ,  NAGARKATTI, Siddharth

发明人： SHAJII, Ali ,  NAGARKATTI, Siddharth

IPC分类号： G05D7/00 ,  G05D11/00

摘要： A system for dividing a single flow into two or more secondary flows of desired ratios, including an inlet adapted to receive the single flow, at least two secondary flow lines connected to the inlet, an input device adapted to receive at least one desired ratio of flow, at least one in-situ process monitor providing measurements of products produced by each of the flows lines, and a controller connected to the input device and the in-situ process monitor. The controller is programmed to receive the desired ratio of flow through the input device, receive the product measurements from the in-situ process monitor, and calculate a corrected ratio of flow based upon the desired ratio of flow and the product measurements. If the product measurements are not equal, then the corrected ratio of flow will be different than the desired ratio of flow.