公开(公告)号：WO2010077675A2

公开(公告)日：2010-07-08

申请号：PCT/US2009/067189

申请日：2009-12-08

Applicant: ZYGO CORPORATION ,  KÜCHEL, Michael

Inventor： KÜCHEL, Michael

IPC: G01J9/02

CPC classification number: G01J9/0215 ,  G01J2009/0219

Abstract: Methods include simultaneously diffracting a beam in a first direction and a second direction orthogonal to the first direction to form a once-diffracted beam, where the beam comprises a wavefront shaped by a test object, simultaneously diffracting the once-diffracted beam in orthogonal directions to form a twice-diffracted beam, overlapping at least two orders of the twice-diffracted beam in each direction to form an interference pattern at a detector, the interference pattern being formed by multiple copies of the wavefront laterally sheared in the first direction and multiple copies of the wavefront laterally sheared in the second direction; and determining information about the wavefront based on the interference pattern.

Abstract translation: 方法包括同时在第一方向和与第一方向正交的第二方向上衍射光束以形成一次衍射光束，其中光束包括由测试对象成形的波前，同时衍射 一次衍射光束在正交方向上形成两次衍射光束，在每个方向上重叠两次衍射光束的至少两个阶次以在检测器处形成干涉图案，干涉图案由横向多次复制的波前形成 在第一方向剪切并且波前的多个副本在第二方向上横向剪切; 并基于干涉图案确定关于波前的信息。

公开(公告)号：WO2003021184A1

公开(公告)日：2003-03-13

申请号：PCT/US2002/027798

申请日：2002-09-03

Applicant: ZYGO CORPORATION ,  KÜCHEL, Michael

Inventor： KÜCHEL, Michael ,  EVANS, Christopher, James

IPC: G01B9/02

CPC classification number: H05K1/024 ,  G01B11/2441 ,  G01B11/255 ,  H05K3/0047 ,  H05K3/429 ,  H05K3/445 ,  H05K2201/0187 ,  H05K2201/09309 ,  H05K2201/09581 ,  H05K2201/09718 ,  Y10T29/49117 ,  Y10T29/49126 ,  Y10T29/49155 ,  Y10T29/49156 ,  Y10T29/49165 ,  Y10T428/24917

Abstract: Interferometric apparatus and methods by which aspheric surfaces and wavefronts may be precisely measured. The apparatus is provided with two modes of operation. In one mode, the apparatus is configured generally as Fizeau interferometer in which an aspheric reference surface (34) is used to permit the rapid, robust measurement of the difference between the aspheric reference surface and an aspheric test optic or wavefront (42). In another mode of operation, the aspheric test surface is completely characterized through in-situ use of an interferometric scanning technique using a spherical reference surface.

Abstract translation: 可以精确测量非球面和波前的干涉仪和方法。 该装置具有两种操作模式。 在一种模式中，该装置通常配置为Fizeau干涉仪，其中使用非球面参考表面（34）来快速，鲁棒地测量非球面参考表面和非球面测试光学器件或波前（42）之间的差异。 在另一种操作模式中，非球面测试表面通过使用球面参考表面的干涉扫描技术的原位使用来完全表征。

公开(公告)号：WO2002090882A1

公开(公告)日：2002-11-14

申请号：PCT/US2002/009158

申请日：2002-03-25

Applicant: ZYGO CORPORATION ,  KÜCHEL, Michael

Inventor： KÜCHEL, Michael ,  DECK, Leslie, L. ,  STEPHENSON, David ,  GRATRIX, Edward, J. ,  ZANONI, Carl, A.

IPC: G01B9/02

CPC classification number: G02B27/48 ,  G01B9/0201 ,  G01B9/02022 ,  G01B9/02034 ,  G01B9/02057 ,  G01B9/02069 ,  G01B9/02082

Abstract: Interferometric apparatus and methods for reducing the effects of coherent artifacts in interferometers. Fringe contrast in interferograms is preserved while coherent superposition of unwanted radiation generated in the interferometer (500) are suppressed. Use is made of illumination and interferogrammetric imaging architectures that generate individual interferograms of the selected characteristics of a test surface (522) from the perspective of different off-axis locations of illumination in an interferometer (500) and then combine them to preserve fringe contrast while at the same time arranging for artifacts to exist at different field locations so that their contribution in the combined interferogram is diluted.

Abstract translation: 用于减少干涉仪中相干伪像的影响的干涉仪和方法。 保留干涉图中的边缘对比度，同时抑制在干涉仪（500）中产生的不想要的辐射的相干叠加。 使用照明和干涉测量成像架构，其从干涉仪（500）中的照明的不同离轴位置的角度产生测试表面（522）的选定特征的单独干涉图，然后将它们组合以保留条纹对比度， 同时在不同的场地安排人造物存在，使得它们在组合干涉图中的贡献被稀释。