OCULAR METROLOGY EMPLOYING SPECTRAL WAVEFRONT ANALYSIS OF REFLECTED LIGHT
    1.
    发明申请
    OCULAR METROLOGY EMPLOYING SPECTRAL WAVEFRONT ANALYSIS OF REFLECTED LIGHT 审中-公开
    使用反射光的光谱波形分析的OCULAR METROLOGY

    公开(公告)号:WO2014201503A1

    公开(公告)日:2014-12-24

    申请号:PCT/AU2014/000637

    申请日:2014-06-20

    申请人: CYLITE PTY LTD

    摘要: Method and systems are presented for analysing a wavefront using a spectral wavefront analyser to extract optical phase and spectral information at a two dimensional array of sampling points across the wavefront, wherein the relative phase information between the sampling points is maintained. Methods and systems are also presented for measuring an eye by reflecting a wavefront of an eye and measuring the wavefront at a plurality of angles to provide a map of the off-axis relative wavefront curvature and aberration of the eye. The phase accuracy between wavelengths and sample points over a beam aperture offered by these methods and systems have a number of ocular applications including corneal and anterior eye tomography, high resolution retinal imaging, and wavefront analysis as a function of probe beam incident angle for determining myopia progression and for designing and testing lenses for correcting myopia.

    摘要翻译: 提出了一种方法和系统,用于使用光谱波前分析器分析波前,以在波阵面上的采样点的二维阵列提取光学相位和光谱信息,其中保持采样点之间的相对相位信息。 还提出了用于通过反射眼睛的波前并以多个角度测量波前来测量眼睛的方法和系统,以提供离轴相对波前曲率和眼睛的像差的图。 这些方法和系统提供的光束孔径之间的波长和采样点之间的相位精度具有许多眼睛应用,包括角膜和前眼层析成像,高分辨率视网膜成像和波前分析作为用于确定近视的探针束入射角的函数 进展和设计和测试矫正近视眼镜。

    一种大孔径空间外差干涉光谱成像方法及光谱仪

    公开(公告)号:WO2015123983A1

    公开(公告)日:2015-08-27

    申请号:PCT/CN2014/085536

    申请日:2014-08-29

    IPC分类号: G01J3/45 G01N21/45

    摘要: 一种大孔径空间外差干涉光谱成像方法及光谱仪,其中,所述方法包括:复合光经分束器(73)后一部分被反射得到反射光,另一部分被透射得到透射光;反射光经反射镜组(74,75)以及闪耀光栅组(76,77)后再次经分束器(73)反射到达成像镜(78),透射光沿着与反射光相反的光路经反射镜组(74,75)以及闪耀光栅组(76,77)后到达成像镜(78),其中,闪耀光栅组(76,77)包括平行设置的第一闪耀光栅(76)和第二闪耀光栅(77),入射闪耀光栅组(76,77)的复合光被衍射成多束相互平行的出射光,且多束出射光与入射光平行;成像镜(78)上得到具有横向剪切量的干涉光,从而在探测器(79)得到干涉信息。加入一对平行的闪耀光栅实现外差的特性,实现采样点数减少以及信噪比提高。

    TWO GRATING LATERAL SHEARING WAVEFRONT SENSOR
    3.
    发明申请
    TWO GRATING LATERAL SHEARING WAVEFRONT SENSOR 审中-公开
    两个侧面剪切波纹传感器

    公开(公告)号:WO2010077675A3

    公开(公告)日:2010-09-10

    申请号:PCT/US2009067189

    申请日:2009-12-08

    发明人: KUECHEL MICHAEL

    IPC分类号: G01J9/02

    CPC分类号: G01J9/0215 G01J2009/0219

    摘要: Methods include simultaneously diffracting a beam in a first direction and a second direction orthogonal to the first direction to form a once-diffracted beam, where the beam comprises a wavefront shaped by a test object, simultaneously diffracting the once-diffracted beam in orthogonal directions to form a twice-diffracted beam, overlapping at least two orders of the twice-diffracted beam in each direction to form an interference pattern at a detector, the interference pattern being formed by multiple copies of the wavefront laterally sheared in the first direction and multiple copies of the wavefront laterally sheared in the second direction; and determining information about the wavefront based on the interference pattern.

    摘要翻译: 方法包括同时沿与第一方向正交的第一方向和第二方向衍射光束以形成一次衍射光束,其中光束包括由测试对象形成的波前,同时将一次衍射光束沿正交方向衍射到 形成两次衍射的光束,在每个方向上重叠两次衍射光束的至少两个阶,以在检测器处形成干涉图案,干涉图案由沿第一方向横向剪切的波阵面的多个拷贝形成,多个拷贝 的波前横向剪切在第二个方向; 以及基于干涉图案确定关于波前的信息。

    SYSTEM FOR INTERFEROMETRICALLY MEASURING THE IMAGING QUALITY OF AN ANAMORPHIC PROJECTION LENS
    4.
    发明申请
    SYSTEM FOR INTERFEROMETRICALLY MEASURING THE IMAGING QUALITY OF AN ANAMORPHIC PROJECTION LENS 审中-公开
    用于干涉测量投影透镜成像质量的系统

    公开(公告)号:WO2018007211A1

    公开(公告)日:2018-01-11

    申请号:PCT/EP2017/065889

    申请日:2017-06-27

    发明人: WEGMANN, Ulrich

    摘要: A measuring method and a measuring system for interferometrically measuring the imaging quality of an optical imaging system are configured, by adapted design of measurement structures of associated structure carriers, to carry out a wavefront measurement on an imaging system which has a first imaging scale β 1 in a first direction and a second imaging scale β 2 in a second direction, perpendicular to the first direction, said second imaging scale differing from the first imaging scale by a scale ratio (β 1 / β 2 ) ≠ 1 (anamorphic imaging system). A first measurement structure (MS1) on a first structure carrier to be arranged on the object side of the imaging system has a two-dimensional mask structure suitable for shaping the coherence of measurement radiation. A second measurement structure (MS2) on a second structure carrier to be arranged on the image side of the imaging system has a diffraction grating. The first and second measurement structures are adapted to one another taking account of the scale ratio in such a way that an interference pattern arises upon an imaging of the first measurement structure (MS1) onto the second measurement structure (MS2) with the aid of the anamorphic imaging system.

    摘要翻译: 用于干涉测量光学成像系统的成像质量的测量方法和测量系统通过相关联的结构载体的测量结构的适应性设计来配置成在成像系统上执行波前测量 其具有在第一方向上的第一成像比例尺β1和在垂直于第一方向的第二方向上的第二成像比例尺β2,所述第二成像比例尺不同于 通过比例尺(β1/β2)≠1(变形成像系统)的第一成像比例。 将要布置在成像系统的物体侧上的第一结构载体上的第一测量结构(MS1)具有适合于成形测量辐射的相干性的二维掩模结构。 位于成像系统的图像侧上的第二结构载体上的第二测量结构(MS2)具有衍射光栅。 考虑到比例尺,第一和第二测量结构以这样的方式相互适配,即,在第一测量结构(MS1)成像到第二测量结构(MS2)上时,借助于 变形成像系统。

    WAVEFRONT ANALYSER
    5.
    发明申请
    WAVEFRONT ANALYSER 审中-公开
    WAVEFRONT分析仪

    公开(公告)号:WO2014201504A1

    公开(公告)日:2014-12-24

    申请号:PCT/AU2014/000638

    申请日:2014-06-20

    申请人: CYLITE PTY LTD

    IPC分类号: G01J9/00 G01B9/02 A61B3/10

    摘要: Interferometry-based methods and apparatus are presented for analysing one or more wavefronts from a sample, in which the sample wavefronts are interfered with two or more reference wavefronts to produce two or more interferograms in a sufficiently short time period for the interferograms to be captured in a single exposure of an image capture device such as a CCD array. Each interferogram has a unique carrier frequency dependent on the angle between a respective pair of sample and reference wavefronts. In certain embodiments multiple sample and/or reference wavefronts are generated using scanning mirrors, while in other embodiments utilising multi-wavelength beams multiple sample and/or reference wavefronts are generated with wavelength dispersive elements. The methods and apparatus are suitable for measuring aberrations at one or more positions on the retina of an eye.

    摘要翻译: 介绍了基于干涉测量的方法和装置,用于分析来自样本的一个或多个波前,其中样本波前被干扰两个或多个参考波前,以在足够短的时间内产生两个或更多个干涉图,以便干涉图被捕获在 诸如CCD阵列的图像捕获装置的单次曝光。 每个干涉图具有取决于相应的一对样本和参考波前之间的角度的唯一载波频率。 在某些实施例中,使用扫描反射镜产生多个采样和/或参考波阵面,而在其他实施例中利用多波长光束,使用波长色散元件产生多个采样和/或参考波前。 所述方法和装置适于测量眼睛视网膜上的一个或多个位置处的像差。

    TWO GRATING LATERAL SHEARING WAVEFRONT SENSOR
    6.
    发明申请
    TWO GRATING LATERAL SHEARING WAVEFRONT SENSOR 审中-公开
    两个光栅横向剪切波前传感器

    公开(公告)号:WO2010077675A2

    公开(公告)日:2010-07-08

    申请号:PCT/US2009/067189

    申请日:2009-12-08

    发明人: KÜCHEL, Michael

    IPC分类号: G01J9/02

    CPC分类号: G01J9/0215 G01J2009/0219

    摘要: Methods include simultaneously diffracting a beam in a first direction and a second direction orthogonal to the first direction to form a once-diffracted beam, where the beam comprises a wavefront shaped by a test object, simultaneously diffracting the once-diffracted beam in orthogonal directions to form a twice-diffracted beam, overlapping at least two orders of the twice-diffracted beam in each direction to form an interference pattern at a detector, the interference pattern being formed by multiple copies of the wavefront laterally sheared in the first direction and multiple copies of the wavefront laterally sheared in the second direction; and determining information about the wavefront based on the interference pattern.

    摘要翻译: 方法包括同时在第一方向和与第一方向正交的第二方向上衍射光束以形成一次衍射光束,其中光束包括由测试对象成形的波前,同时衍射 一次衍射光束在正交方向上形成两次衍射光束,在每个方向上重叠两次衍射光束的至少两个阶次以在检测器处形成干涉图案,干涉图案由横向多次复制的波前形成 在第一方向剪切并且波前的多个副本在第二方向上横向剪切; 并基于干涉图案确定关于波前的信息。

    SPATIAL HETERODYNE SPECTROMETER AND METHOD
    7.
    发明申请
    SPATIAL HETERODYNE SPECTROMETER AND METHOD 审中-公开
    空间异质光谱仪和方法

    公开(公告)号:WO1990012294A1

    公开(公告)日:1990-10-18

    申请号:PCT/US1990001813

    申请日:1990-04-04

    IPC分类号: G01J03/45

    摘要: A spatial heterodyne spectrometer has a two beam dispersive interferometer (25) which includes a diffraction grating (45) as a beam splitter/combiner. An incoming beam is collimated and passed to the grating (45) in the interferometer (25) where it is split into two beams (47, 50) which are recombined such that the angle between the wavefronts in the recombined beam at a particular wavelength is directly related to the deviation of that wavelength from a null wavelength at which the wavefronts are parallel. The recombined output beam is focused and imaged to produce Fizeau fringes across the output aperture (31), with these fringes being recorded on an imaging detector (34). The spatially varying intensity output of the imaging detector (34) is Fourier transformed to yield an output indicative of the spectral frequency content of the image which is related to the wavelength content of the incoming beam from the source.