公开(公告)号：WO2007146782A3

公开(公告)日：2007-12-21

申请号：PCT/US2007/070728

申请日：2007-06-08

Applicant: VEECO INSTRUMENTS, INC. ,  LUSE, Todd, Arthur ,  FREMGEN, Roger ,  MILLER, William, J. ,  CELARU, Adrian

Inventor： LUSE, Todd, Arthur ,  FREMGEN, Roger ,  MILLER, William, J. ,  CELARU, Adrian

IPC: H01L21/00 ,  H01L21/687

Abstract: Apparatus and methods for improving the control of the temperature of a supported member, such as a substrate, in high vacuum processing systems, such as ion beam etch (IBE) systems. The apparatus includes thermoelectric devices (70) that transfer heat from a support member (42) supporting the supported member (20) to a liquid-cooled heat exchange member (44) to regulate the temperature of the support member (42). The method includes cooling the support member (42) with thermoelectric devices (70) that transfer the heat to the liquid-cooled heat exchange member (44).

公开(公告)号：WO2007146782A2

公开(公告)日：2007-12-21

申请号：PCT/US2007070728

申请日：2007-06-08

Applicant: VEECO INSTR INC ,  LUSE TODD ARTHUR ,  FREMGEN ROGER ,  MILLER WILLIAM J ,  CELARU ADRIAN

Inventor： LUSE TODD ARTHUR ,  FREMGEN ROGER ,  MILLER WILLIAM J ,  CELARU ADRIAN

CPC classification number: H01L21/67109 ,  F25B21/02 ,  H01L21/67103 ,  H01L21/67248

Abstract: Apparatus and methods for improving the control of the temperature of a supported member, such as a substrate, in high vacuum processing systems, such as ion beam etch (IBE) systems. The apparatus includes thermoelectric devices (70) that transfer heat from a support member (42) supporting the supported member (20) to a liquid-cooled heat exchange member (44) to regulate the temperature of the support member (42). The method includes cooling the support member (42) with thermoelectric devices (70) that transfer the heat to the liquid-cooled heat exchange member (44).

Abstract translation: 用于改进在诸如离子束蚀刻（IBE）系统的高真空处理系统中的诸如衬底的被支撑构件的温度控制的装置和方法。 该装置包括将支撑构件（20）的支撑构件（42）的热传递到液冷的热交换构件（44）以调节支撑构件（42）的温度的热电装置（70）。 该方法包括用将热量转移到液冷的热交换构件（44）的热电装置（70）来冷却支撑构件（42）。

公开(公告)号：WO2011156371A1

公开(公告)日：2011-12-15

申请号：PCT/US2011/039441

申请日：2011-06-07

Applicant: VEECO INSTRUMENTS, INC. ,  LUSE, Todd, Arthur ,  PARANJPE, Ajit, Pramod ,  CELARU, Adrian ,  SCANDARIATO, Joseph ,  TANG, Quinfu

Inventor： LUSE, Todd, Arthur ,  PARANJPE, Ajit, Pramod ,  CELARU, Adrian ,  SCANDARIATO, Joseph ,  TANG, Quinfu

IPC: H01L21/687

CPC classification number: H01L21/68771 ,  C23C16/4584 ,  H01L21/68764

Abstract: Wafer carriers and methods for moving wafers in a reactor. The wafer carrier (220) may include a platen (215) with a plurality of compartments and a plurality of wafer platforms (210). The platen (215) is configured to rotate about a first axis. Each of the wafer platforms (210) is associated with one of the compartments and is configured to rotate about a respective second axis relative to the respective compartment (770). The platen (215) and the wafer platforms (210) rotate with different angular velocities to create planetary motion therebetween. The method may include rotating a platen (215) about a first axis of rotation. The method further includes rotating each of a plurality of wafer platforms (210) carried on the platen (215) and carrying the wafers (200) about a respective second axis of rotation and with a different angular velocity than the platen (215) to create planetary motion therebetween.

Abstract translation: 用于在反应器中移动晶片的晶片载体和方法。 晶片载体（220）可以包括具有多个隔室的台板（215）和多个晶片平台（210）。 压板（215）构造成围绕第一轴线旋转。 每个晶片平台（210）与隔室中的一个相关联并且被配置为相对于相应的隔室（770）围绕相应的第二轴线旋转。 压板（215）和晶片平台（210）以不同的角速度旋转以在它们之间产生行星运动。 该方法可以包括围绕第一旋转轴旋转压板（215）。 该方法还包括旋转承载在压板（215）上的多个晶片平台（210）中的每一个并且以相对于第二旋转轴线和与压板（215）不同的角速度运送晶片（200）以产生 行星运动。

公开(公告)号：WO2011028597A1

公开(公告)日：2011-03-10

申请号：PCT/US2010/046783

申请日：2010-08-26

Applicant: VEECO INSTRUMENTS, INC. ,  PARANJPE, Ajit ,  LUSE, Todd, Arthur ,  FREMGEN, Roger, P. ,  SRINIVASAN, Narasimhan ,  ROOK, Katrina ,  DRUZ, Boris, L. ,  CELARU, Adrian

Inventor： PARANJPE, Ajit ,  LUSE, Todd, Arthur ,  FREMGEN, Roger, P. ,  SRINIVASAN, Narasimhan ,  ROOK, Katrina ,  DRUZ, Boris, L. ,  CELARU, Adrian

IPC: G11B5/65

CPC classification number: G11B5/855 ,  C23C14/042 ,  C23C14/046 ,  C23C14/505 ,  H01L21/67173 ,  H01L21/67709 ,  H01L21/67712 ,  H01L21/67718 ,  H01L21/67742 ,  H01L21/67754

Abstract: An inline processing system for patterning magnetic recording layers on hard discs for use in a hard disc drive. Discs are processed on both sides simultaneously in a vertical orientation, in round plate-like holders called MDCs. A plurality (as many as 10) discs are held in a dial carrier of the MDC, and transferred from one process station to another. The dial carrier of the MDC may be rotated and/or angled at up to 70° from normal in each process station, so that one or a plurality of process sources may treat the discs simultaneously. This configuration provides time savings and a reduction in the number and size of process sources needed. A mask enhancement process for patterning of magnetic media, and a filling and planarizing process used therewith, are also disclosed.

Abstract translation: 一种用于在用于硬盘驱动器的硬盘上图案化磁记录层的在线处理系统。 光盘在垂直方向同时处理，在称为MDC的圆盘状支架中。 多个（多达10个）盘被保存在MDC的拨号载体中，并从一个处理站传送到另一个处理站。 MDC的拨号盘可以在每个处理站中与正常旋转和/或成角度高达70°，使得一个或多个处理源可以同时处理盘。 此配置可节省时间并减少所需的进程源的数量和大小。 还公开了用于磁性介质图案化的掩模增强工艺，以及与其一起使用的填充和平坦化工艺。