公开(公告)号：WO2009059614A1

公开(公告)日：2009-05-14

申请号：PCT/EP2007/009593

申请日：2007-11-06

Applicant: CARL ZEISS SMT AG ,  ASML NETHERLANDS B.V. ,  STORM, Arnold ,  EHM, Dirk, Heinrich ,  MOORS, Johannes, Hubertus, Josephina ,  WOLSCHRIJN, Bastiaan, Theodoor ,  STEIN, Thomas ,  TE SLIGTE, Edwin

Inventor： STORM, Arnold ,  EHM, Dirk, Heinrich ,  MOORS, Johannes, Hubertus, Josephina ,  WOLSCHRIJN, Bastiaan, Theodoor ,  STEIN, Thomas ,  TE SLIGTE, Edwin

IPC: B08B7/00

CPC classification number: B08B5/02 ,  B08B7/00 ,  G03F7/70925

Abstract: The invention relates to a method for at least partially removing a contamination layer (15) from an optical surface (14a) of an EUV-reflective optical element (14) by bringing a cleaning gas, preferably comprising atomic hydrogen, into contact with the contamination layer (15), the method comprising the steps of: directing a jet (20) of cleaning gas to the contamination layer (15) for removing material from the contamination layer (15), monitoring the contamination layer (15) for generating a signal indicative of the thickness of the contamination layer (15), and controlling the jet (20) of cleaning gas by moving the jet (20) of cleaning gas relative to the optical surface (14a) using the signal indicative of the thickness of the contamination layer (15) as a feedback signal, and to a corresponding cleaning arrangement (19 to 24). The invention further relates to a method for generating a jet (20) of cleaning gas, as well as to a corresponding cleaning gas generation arrangement.

Abstract translation: 本发明涉及通过使清洁气体（优选包括原子氢）与污染物接触而至少部分地从EUV反射光学元件（14）的光学表面（14a）去除污染物层（15）的方法 层（15），所述方法包括以下步骤：将清洁气体的喷嘴（20）引导到污染层（15）以从污染层（15）去除材料，监测污染层（15）以产生信号 指示污染层（15）的厚度，以及通过使用指示污染物厚度的信号相对于光学表面（14a）移动清洁气体的喷嘴（20）来控制清洁气体的喷嘴（20） 层（15）作为反馈信号，以及相应的清洁装置（19至24）。 本发明还涉及一种用于产生清洁气体的喷嘴（20）的方法，以及相应的清洁气体产生装置。

公开(公告)号：WO2012158024A1

公开(公告)日：2012-11-22

申请号：PCT/NL2012/050324

申请日：2012-05-11

Applicant: NEDERLANDSE ORGANISATIE VOOR TOEGEPAST-NATUURWETENSCHAPPELIJK ONDERZOEK TNO ,  TE SLIGTE, Edwin ,  KOSTER, Norbertus Benedictus

Inventor： TE SLIGTE, Edwin ,  KOSTER, Norbertus Benedictus

IPC: H01L21/00 ,  H01L21/683

CPC classification number: H01L21/67248 ,  H01L21/6833

Abstract: The invention relates to a method of manufacturing an electrostatic clamp. The method comprises providing a base substrate (110) having an electrostatic clamp structure formed on an insulator layer (20) by lithography; providing a planarized carrier having a cavity structure that covers the entire planar surface; forming a stack of the base substrate on the planarized carrier; applying vacuum pressure to the stack of the base substrate and the carrier to vacuumize gas between the base substrate and the carrier and thereby press the base substrate and carrier against each other; drawing, by means of the applied vacuum pressure an adhesive into the cavity structure to form a bonded stack of the base substrate and carrier; and finalizing the stack.

Abstract translation: 本发明涉及一种制造静电夹的方法。 该方法包括提供通过光刻形成在绝缘体层（20）上的静电夹紧结构的基底（110）; 提供具有覆盖整个平坦表面的空腔结构的平坦化载体; 在平坦化的载体上形成基底衬底的叠层; 对基底基板和载体的叠层施加真空压力以使基底基板和载体之间的气体抽真空，从而将基底基板和载体彼此压靠; 通过施加的真空压力将粘合剂引入空腔结构中以形成基底和载体的键合堆叠; 并完成堆栈。

公开(公告)号：WO2011053145A1

公开(公告)日：2011-05-05

申请号：PCT/NL2010/050727

申请日：2010-11-01

Applicant: NEDERLANDSE ORGANISATIE VOOR TOEGEPAST-NATUURWETENSCHAPPELIJK ONDERZOEK TNO ,  KOSTER, Norbertus Benedictus ,  MEIJERINK, Marcus Gerhardus Hendrikus ,  TE SLIGTE, Edwin

Inventor： KOSTER, Norbertus Benedictus ,  MEIJERINK, Marcus Gerhardus Hendrikus ,  TE SLIGTE, Edwin

IPC: H01L21/683 ,  H01L21/687

CPC classification number: H05K1/0296 ,  H01L21/6833 ,  H05K1/115 ,  H05K3/10

Abstract: The invention relates to a method of manufacturing a support structure for supporting an article in a lithographic process, comprising: providing a substrate having an electrically conductive top layer provided on an insulator; patterning the conductive top layer to provide a patterned electrode structure; and oxidizing the conductive top layer, so as to provide a buried electrode structure having an insulating top surface. In this way a simple buried structure can be provided as electrode structure to conveniently provide an electrostatic clamp. The invention additionally relates to a correspondingly manufactured support structure for supporting an article in a lithographic process.

Abstract translation: 本发明涉及一种制造用于在光刻工艺中支撑制品的支撑结构的方法，包括：提供具有设置在绝缘体上的导电顶层的基板; 图案化导电顶层以提供图案化的电极结构; 并氧化导电顶层，以提供具有绝缘顶表面的掩埋电极结构。 以这种方式，可以提供简单的掩埋结构作为电极结构，以方便地提供静电夹。 本发明还涉及用于在光刻工艺中支撑制品的相应制造的支撑结构。

公开(公告)号：WO2011102711A1

公开(公告)日：2011-08-25

申请号：PCT/NL2010/050079

申请日：2010-02-17

Applicant: VISION DYNAMICS HOLDING B.V. ,  BLOM, Paulus Petrus Maria ,  STEVENS, Alquin Alphons Elisabeth ,  HUIJBREGTS, Laurentia Johanna ,  DE HAAN, Hugo Anton Marie ,  VAN SCHIJNDEL, Antonius Hubertus ,  TE SLIGTE, Edwin ,  VAN HIJNINGEN, Nicolaas Cornelis Josephus ,  HUISKAMP, Tom

Inventor： BLOM, Paulus Petrus Maria ,  STEVENS, Alquin Alphons Elisabeth ,  HUIJBREGTS, Laurentia Johanna ,  DE HAAN, Hugo Anton Marie ,  VAN SCHIJNDEL, Antonius Hubertus ,  TE SLIGTE, Edwin ,  VAN HIJNINGEN, Nicolaas Cornelis Josephus ,  HUISKAMP, Tom

IPC: H05H1/24 ,  C23C14/04

CPC classification number: H05H1/46 ,  C23C16/042 ,  C23C16/503 ,  C23C16/509 ,  H05H1/24 ,  H05H1/44 ,  H05H2001/466

Abstract: Device for generating a plasma discharge near a substrate for patterning the surface of the substrate, comprising a first electrode having a first discharge portion and a second electrode having a second discharge portion, a high voltage source for generating a high voltage difference between the first and the second electrode, and positioning means for positioning the first electrode with respect to the substrate. The device is further provided with an intermediate structure that is, in use, arranged in between the first electrode and the substrate while allowing for positioning the first electrode with respect to the substrate.

Abstract translation: 一种用于在用于对衬底表面进行图案化的衬底附近产生等离子体放电的装置，包括具有第一放电部分的第一电极和具有第二放电部分的第二电极，用于产生第一和第二放电部分之间的高电压差的高电压源 第二电极和用于相对于基板定位第一电极的定位装置。 该装置还设置有中间结构，该中间结构在使用中布置在第一电极和基板之间，同时允许第一电极相对于基板定位。