Abstract:
A method of making high-density electrical interconnects between micro-electronic components using rivet bonds, by positioning a first substrate over a second substrate to align a through-hole and adjacent first metal bond pad of the first substrate with a second metal bond pad of the second substrate, and forming a metal bump through the through-hole so that the metal bump bonds to and electrically connects the first and second metal bond pads via the through-hole.
Abstract:
A method of making high-density electrical interconnects between micro-electronic components using rivet bonds, by positioning a first substrate over a second substrate to align a through-hole and adjacent first metal bond pad of the first substrate with a second metal bond pad of the second substrate, and forming a metal bump through the through-hole so that the metal bump bonds to and electrically connects the first and second metal bond pads via the through-hole.