ACETYLENE PROCESS GAS PURIFICATION METHODS AND SYSTEMS

    公开(公告)号:WO2010065880A3

    公开(公告)日:2010-06-10

    申请号:PCT/US2009/066812

    申请日:2009-12-04

    IPC分类号: B01D53/78 B01D53/02 B01D53/38

    摘要: Methods and systems of purifying an acetylene process gas are described. The methods may include the steps of providing an acetylene vessel containing source acetylene mixed with a solvent impurity, and flowing the source acetylene through a purification container that holds a cooled purifying medium, where at least a portion of the solvent impurity in the source acetylene separates as a liquid impurity on the purifying medium. The method may also include removing the liquid from the purification container and flowing a purified acetylene gas from the purification container. The purified acetylene gas has a concentration of the solvent impurity of about 5 vol.% or less, and the separated liquid impurity is removed without interrupting the flow of the acetylene while the purified acetylene gas flows from the purification container to keep the concentration of the solvent impurity substantially constant in the purified acetylene gas.

    ACETYLENE PROCESS GAS PURIFICATION METHODS AND SYSTEMS
    6.
    发明申请
    ACETYLENE PROCESS GAS PURIFICATION METHODS AND SYSTEMS 审中-公开
    乙烯过程气体纯化方法和系统

    公开(公告)号:WO2010065880A2

    公开(公告)日:2010-06-10

    申请号:PCT/US2009066812

    申请日:2009-12-04

    IPC分类号: B01D53/78 B01D53/02 B01D53/38

    摘要: Methods and systems of purifying an acetylene process gas are described. The methods may include the steps of providing an acetylene vessel containing source acetylene mixed with a solvent impurity, and flowing the source acetylene through a purification container that holds a cooled purifying medium, where at least a portion of the solvent impurity in the source acetylene separates as a liquid impurity on the purifying medium. The method may also include removing the liquid from the purification container and flowing a purified acetylene gas from the purification container. The purified acetylene gas has a concentration of the solvent impurity of about 5 vol.% or less, and the separated liquid impurity is removed without interrupting the flow of the acetylene while the purified acetylene gas flows from the purification container to keep the concentration of the solvent impurity substantially constant in the purified acetylene gas.

    摘要翻译: 描述了乙炔工艺气体的纯化方法和系统。 所述方法可以包括以下步骤:提供含有与溶剂杂质混合的源乙炔的乙炔容器,并使源乙炔流过保持冷却的纯化介质的净化容器,其中源乙炔中的至少一部分溶剂杂质分离 作为净化介质上的液体杂质。 该方法还可以包括从净化容器中除去液体并使净化的乙炔气体从净化容器流出。 纯化的乙炔气体的溶剂杂质浓度为约5体积%以下,除去分离的液体杂质而不中断乙炔的流动,同时净化的乙炔气体从净化容器流出,以保持浓度 在纯化的乙炔气中溶剂杂质基本恒定。

    FLUID PURIFICATION SYSTEM WITH LOW TEMPERATURE PURIFIER
    7.
    发明申请
    FLUID PURIFICATION SYSTEM WITH LOW TEMPERATURE PURIFIER 审中-公开
    具有低温净化剂的流体净化系统

    公开(公告)号:WO2006057748A2

    公开(公告)日:2006-06-01

    申请号:PCT/US2005038222

    申请日:2005-10-19

    IPC分类号: B01D53/02

    CPC分类号: B01D53/002 Y02C20/10

    摘要: A system and method for processing a matrix fluid to remove one or more impurities (such as moisture from a process gas). The purifier includes a pre-cooler that receives the matrix fluid and cools the matrix fluid to a second, lower temperature. A container is provided to contain a purifier element made up of a high surface area material. The container includes an inlet for receiving the matrix fluid from the pre-cooler and an outlet for outputting the matrix fluid after it is forced to flow through the purifier element. The purifier includes a cooler in thermal contact with an outer surface of the container to cool the outer surface of the container to a purifying temperature, which is selected to be below the ambient temperature and above a phase change point of the matrix fluid and is typically in the range of about 0 to -200°C.

    摘要翻译: 用于处理基质流体以除去一种或多种杂质(例如来自工艺气体的水分)的系统​​和方法。 净化器包括预冷器,其接收基质流体并将基质流体冷却至第二较低温度。 提供容器以容纳由高表面积材料构成的净化器元件。 容器包括用于从预冷器接收基质流体的入口和用于在迫使其流过净化器元件之后输出基质流体的出口。 净化器包括与容器的外表面热接触的冷却器,以将容器的外表面冷却至净化温度,该净化温度被选择为低于环境温度并高于基质流体的相变点,并且通常 在约0至-200℃的范围内。

    GAS STORAGE CONTAINER LININGS FORMED WITH CHEMICAL VAPOR DEPOSITION

    公开(公告)号:WO2007062264A3

    公开(公告)日:2007-05-31

    申请号:PCT/US2006/045614

    申请日:2006-11-28

    IPC分类号: B65D85/84

    摘要: A method of coating an interior of a gas storage container, where the method includes supplying a chemical vapor precursor to the storage container, and forming a metal coating on the interior surface of the container, where the coating is formed from the chemical vapor precursor. Also, a gas storage container that includes a gas storage vessel with an interior surface that has a liner formed on the interior surface of the storage vessel. The liner may include tungsten metal with a purity of about 99%, by weight, or more. Additionally, a system for making a metal lined gas storage container that may include a chemical vapor precursor generator, and a precursor injection assembly for transporting the precursor into a gas storage vessel. The system may also include an exhaust outlet for removing gaseous deposition products from the gas storage vessel.