DICING BEFORE GRINDING PROCESS FOR PREPARATION OF SEMICONDUCTOR

    公开(公告)号:WO2010124179A3

    公开(公告)日:2010-10-28

    申请号:PCT/US2010/032193

    申请日:2010-04-23

    Inventor: YOO, Hoseung

    Abstract: A method for preparing a semiconductor wafer into individual semiconductor dies using both a dicing before grinding operation and a wafer back side adhesive coating includes the step of applying a water or organic solvent soluble material into the partially cut/etched dicing lines and over the top surface of the circuits to prevent the ingress of wafer back side coating into the dicing streets and interference during singulation.

    DICING BEFORE GRINDING PROCESS FOR PREPARATION OF SEMICONDUCTOR
    3.
    发明申请
    DICING BEFORE GRINDING PROCESS FOR PREPARATION OF SEMICONDUCTOR 审中-公开
    用于制备半导体的研磨工艺之前的定义

    公开(公告)号:WO2010124179A2

    公开(公告)日:2010-10-28

    申请号:PCT/US2010032193

    申请日:2010-04-23

    Inventor: YOO HOSEUNG

    CPC classification number: H01L21/78

    Abstract: A method for preparing a semiconductor wafer into individual semiconductor dies using both a dicing before grinding operation and a wafer back side adhesive coating includes the step of applying a water or organic solvent soluble material into the partially cut/etched dicing lines and over the top surface of the circuits to prevent the ingress of wafer back side coating into the dicing streets and interference during singulation.

    Abstract translation: 使用研磨操作之前的切割和晶片背面粘合剂涂布将半导体晶片制备成单个半导体管芯的方法包括将水或有机溶剂可溶性材料施加到部分切割/蚀刻的切割线中并在顶表面上的步骤 的电路,以防止晶片背面涂层进入切割街道,并在分割期间产生干扰。

    METHODS FOR COATING THE BACKSIDE OF SEMICONDUCTOR WAFERS
    4.
    发明申请
    METHODS FOR COATING THE BACKSIDE OF SEMICONDUCTOR WAFERS 审中-公开
    涂覆半导体波形背面的方法

    公开(公告)号:WO2009152221A1

    公开(公告)日:2009-12-17

    申请号:PCT/US2009/046866

    申请日:2009-06-10

    Inventor: YOO, Hoseung

    Abstract: The invention provides methods for depositing a coating onto the entire backside of a semiconductor wafer. The methods of the invention address the deficiencies typically associated with deposition of coatings onto the backside of semiconductor wafers. Since the methods of the invention result in wafers wherein a coating has been dispensed all the way to the edge of the wafer, there is minimal chip flying during dicing, and minimal wafer breakage and chip breakage. In addition, the methods of the invention result in a marked decrease in waste when compared to traditional spin coating methods.

    Abstract translation: 本发明提供了在半导体晶片的整个背面上沉积涂层的方法。 本发明的方法解决了通常与涂层沉积到半导体晶片的背面相关的缺陷。 由于本发明的方法导致其中涂层已经一直分配到晶片的边缘的晶片,因此在切割期间芯片飞行最小,并且最小的晶片断裂和断屑。 此外,与传统的旋涂方法相比,本发明的方法导致废物显着减少。

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