公开(公告)号：WO2014164363A1

公开(公告)日：2014-10-09

申请号：PCT/US2014/022141

申请日：2014-03-07

Applicant: KONA MEDICAL, INC. ,  ZHANG, Jimin ,  GERTNER, Michael

Inventor： ZHANG, Jimin ,  GERTNER, Michael

IPC: A61B5/05 ,  A61N7/00

CPC classification number: A61B8/4494 ,  A61B6/12 ,  A61B6/487 ,  A61B8/0841 ,  A61B8/085 ,  A61B8/4209 ,  A61B8/4245 ,  A61B8/4254 ,  A61B8/4281 ,  A61B8/4416 ,  A61B2017/00725 ,  A61B2018/00023 ,  A61B2034/2063 ,  A61B2090/378 ,  A61B2090/3937 ,  A61B2090/395 ,  A61N7/02 ,  A61N2007/0065 ,  A61N2007/0082 ,  A61N2007/0091 ,  A61N2007/0095

Abstract: A system to apply ultrasound energy to a region surrounding blood flow in a blood vessel from a position outside a patient includes: a therapeutic ultrasound transducer comprising a plurality of transducer elements; and a processor configured to control the plurality of transducer elements; wherein the processor is configured to change phase inputs to the transducer elements to move a focus of the transducer at least 1 cm in a first plane which is substantially along a plane of the transducer elements of the therapeutic ultrasound transducer and at least 1 cm in a second plane orthogonal to the first plane; and wherein the processor is further configured to position the focus of the transducer in sequential positions offset from the blood flow in the blood vessel according to a pattern pre-determined by an operator of the system.

Abstract translation: 将超声波能量施加到患者外部位置处的血管周围的血流周围的区域的系统包括：包括多个换能器元件的治疗性超声换能器; 以及处理器，被配置为控制所述多个换能器元件; 其中所述处理器被配置为改变到所述换能器元件的相位输入，以使所述换能器的焦点在基本上沿着所述治疗性超声换能器的换能器元件的平面的第一平面中移动至少1cm，并且在 与第一平面正交的第二平面; 并且其中所述处理器还被配置为根据由所述系统的操作者预先确定的模式将所述换能器的焦点定位在与所述血管中的血流偏离的顺序位置。

公开(公告)号：WO2012054263A3

公开(公告)日：2012-06-28

申请号：PCT/US2011055814

申请日：2011-10-11

Applicant: APPLIED MATERIALS INC ,  ZHANG JIMIN ,  WANG ZHIHONG ,  LEE HARRY Q ,  TU WEN-CHIANG

Inventor： ZHANG JIMIN ,  WANG ZHIHONG ,  LEE HARRY Q ,  TU WEN-CHIANG

IPC: H01L21/304 ,  H01L21/66

CPC classification number: B24B37/013 ,  B24B49/12

Abstract: A method of controlling polishing includes storing a plurality libraries, each library including a plurality of reference spectra, polishing a substrate, measuring a sequence of spectra of light from the substrate during polishing, and for each measured spectrum of the sequence of spectra, finding a best matching first reference spectrum from a first library from the plurality of libraries and finding a best matching second reference spectrum from a different second library from the plurality of libraries, determining a first value associated with the best matching first reference spectrum and determining a second value from the best matching second reference spectrum, and calculating a third value from the first value and the second value to generate a sequence of calculated third values. At least one of a polishing endpoint or an adjustment for a polishing rate can be determined based on the sequence of calculated third values.

Abstract translation: 控制抛光的方法包括存储多个库，每个库包括多个参考光谱，抛光衬底，在抛光期间测量来自衬底的光的光谱序列，并且对于光谱序列的每个测量光谱，找到 最佳匹配来自所述多个库中的第一库的第一参考谱，并且从所述多个库中的不同第二库找到最佳匹配的第二参考谱，确定与所述最佳匹配的第一参考谱相关联的第一值，以及确定第二值 从最佳匹配的第二参考频谱中计算第三值，并且从第一值和第二值计算第三值以生成计算的第三值的序列。 基于所计算的第三值的顺序，可以确定抛光终点或抛光速率的调整中的至少一个。

公开(公告)号：WO2011146213A3

公开(公告)日：2012-02-23

申请号：PCT/US2011034212

申请日：2011-04-27

Applicant: APPLIED MATERIALS INC ,  LEE HARRY Q ,  ZHANG JIMIN ,  DAVID JEFFREY DRUE ,  SWEDEK BOGUSLAW A

Inventor： LEE HARRY Q ,  ZHANG JIMIN ,  DAVID JEFFREY DRUE ,  SWEDEK BOGUSLAW A

IPC: H01L21/304 ,  H01L21/66

CPC classification number: B24B37/013 ,  B24B37/042

Abstract: A plurality of substrates are polished simultaneously on the same polishing pad. A sequence of spectra is measured from each zone of each substrate, and for each measured spectrum in the sequence of spectra for each zone of each substrate, a best matching reference spectrum is determined from a library of reference spectra. For each zone of each substrate, a linear function is fit to a sequence of index values associated with the best matching reference spectra. For at least one zone, a projected time at which the zone will reach a target index value is determined based on the linear function, and the polishing parameter for at least one zone on at least one substrate is adjusted such that the at least one zone of the at least one substrate has closer to the target index at the projected time than without such adjustment.

Abstract translation: 多个基板在同一抛光垫上同时被抛光。 从每个底物的每个区域测量光谱序列，并且对于每个底物的每个区域的光谱序列中的每个测量的光谱，从参考光谱库确定最佳匹配的参考光谱。 对于每个衬底的每个区域，线性函数适合于与最佳匹配参考光谱相关联的索引值序列。 对于至少一个区域，基于线性函数确定区域将达到目标指标值的预计时间，并且调整至少一个基底上的至少一个区域的抛光参数，使得至少一个区域 的至少一个基板在投影时间比没有这种调整更接近于目标指标。

公开(公告)号：WO2012019044A2

公开(公告)日：2012-02-09

申请号：PCT/US2011/046646

申请日：2011-08-04

Applicant: APPLIED MATERIALS, INC. ,  HU, Xiaoyuan ,  WANG, Zhihong ,  LEE, Harry Q. ,  ZHU, Zhize ,  DAVID, Jeffrey Drue ,  BENVEGNU, Dominic J. ,  ZHANG, Jimin ,  TU, Wen-Chiang

Inventor： HU, Xiaoyuan ,  WANG, Zhihong ,  LEE, Harry Q. ,  ZHU, Zhize ,  DAVID, Jeffrey Drue ,  BENVEGNU, Dominic J. ,  ZHANG, Jimin ,  TU, Wen-Chiang

IPC: H01L21/304 ,  H01L21/66

CPC classification number: B24B37/013 ,  B24B37/042 ,  B24B37/107 ,  B24B37/205 ,  B24B49/045 ,  B24B49/12

Abstract: A method of controlling polishing includes storing a library having a plurality of reference spectra, polishing a substrate, measuring a sequence of spectra of light from the substrate during polishing, for each measured spectrum of the sequence of spectra, finding a best matching reference spectrum using a matching technique other than sum of squared differences to generate a sequence of best matching reference spectra, and determining at least one of a polishing endpoint or an adjustment for a polishing rate based on the sequence of best matching reference spectra. Finding a best matching reference spectrum may include performing a cross-correlation of the measured spectrum with each of two or more of the plurality of reference spectra from the library and selecting a reference spectrum with the greatest correlation to the measured spectrum as a best matching reference spectrum.

Abstract translation: 控制抛光的方法包括存储具有多个参考光谱的库，抛光衬底，在抛光期间测量来自衬底的光的光谱序列，对于光谱序列的每个测量光谱 ，使用不同于平方差平方和的匹配技术来找到最佳匹配参考谱以产生最佳匹配参考谱的序列，以及基于最佳匹配序列来确定抛光终点或抛光速率的调整中的至少一个 参考光谱。 寻找最佳匹配参考光谱可以包括执行测量光谱与来自库的多个参考光谱中的两个或更多个中的每一个的互相关，并选择与测量光谱具有最大相关性的参考光谱作为最佳匹配参考 谱。

公开(公告)号：WO2007143161A3

公开(公告)日：2008-05-29

申请号：PCT/US2007013053

申请日：2007-06-01

Applicant: WYETH CORP ,  LU ZHIJIAN ,  LIU WEI ,  ZHANG JIMIN ,  YAWORSKY PAUL JOHN ,  BROWN CHRISTOPHER TODD ,  OLLAND STEPHANE H ,  SHEN EMILY SHENG-MING

Inventor： LU ZHIJIAN ,  LIU WEI ,  ZHANG JIMIN ,  YAWORSKY PAUL JOHN ,  BROWN CHRISTOPHER TODD ,  OLLAND STEPHANE H ,  SHEN EMILY SHENG-MING

IPC: C07K1/22 ,  A61K38/18 ,  C07K14/495 ,  C07K14/51 ,  C07K17/02 ,  G01N33/543

CPC classification number: G01N33/6872 ,  C07K1/22 ,  C07K14/495 ,  C07K14/51 ,  C07K17/02 ,  G01N2333/525

Abstract: Members of the TGF- ß superfamily and peptide fragments based on member proteins are employed to purify solutions containing member proteins or as therapeutics.

Abstract translation: 使用基于成员蛋白的TGF-β超家族和肽片段的成员来纯化含有成员蛋白质的溶液或作为治疗剂。

公开(公告)号：WO2008005951A3

公开(公告)日：2008-01-10

申请号：PCT/US2007/072690

申请日：2007-07-02

Applicant: APPLIED MATERIALS, INC. ,  BENVEGNU, Dominic ,  SWEDEK, Boguslaw ,  ZHANG, Jimin

Inventor： BENVEGNU, Dominic ,  SWEDEK, Boguslaw ,  ZHANG, Jimin

IPC: B24B49/12

Abstract: A polishing pad has an opaque polishing layer with an aperture therethrough and a polishing surface, and a solid light-transmissive window in the aperture. The solid light-transmissive window includes an outer portion secured to the polishing layer and an inner portion secured to the outer portion. The outer portion has a upper surface recessed relative to the polishing surface, whereas the inner portion has an upper surface that is substantially co-planar with the polishing surface.

公开(公告)号：WO2007047993A2

公开(公告)日：2007-04-26

申请号：PCT/US2006/041163

申请日：2006-10-19

Applicant: THERUS CORPORATION ,  SILVERSTEIN, Fred ,  EMERY, Charles ,  KOOK, John ,  PEDERSON, Robert ,  SEKINS, K. Michael ,  ZHAO, Xiao ,  KULESA, Larry ,  LAHMAN, Robyn ,  AUGUSTINE, Larry ,  PEROZEK, David, M. ,  ZHANG, Jimin ,  GISSEL BERG, Margo ,  ANDERSON, Thomas

Inventor： EMERY, Charles ,  KOOK, John ,  PEDERSON, Robert ,  SEKINS, K. Michael ,  ZHAO, Xiao ,  KULESA, Larry ,  LAHMAN, Robyn ,  AUGUSTINE, Larry ,  PEROZEK, David, M. ,  ZHANG, Jimin ,  GISSEL BERG, Margo ,  ANDERSON, Thomas

IPC: A61B17/00 ,  A61M25/10 ,  A61N7/02 ,  A61B19/00

CPC classification number: A61B8/0833 ,  A61B5/026 ,  A61B8/0841 ,  A61B8/12 ,  A61B8/4405 ,  A61B8/445 ,  A61B17/0057 ,  A61B18/02 ,  A61B34/25 ,  A61B50/13 ,  A61B2017/00557 ,  A61B2017/00637 ,  A61B2017/00641 ,  A61B2090/372 ,  A61B2090/3784 ,  A61B2090/3929 ,  A61B2090/3958 ,  A61B2090/397 ,  A61F2/82 ,  A61M25/10 ,  A61N7/02

Abstract: Systems and methods for sealing a vascular opening such as an arteriotomy formed during a femoral artery catheterization procedure are described. Included are methods for locating the arteriotomy, aligning the therapeutic applicator to the arteriotomy, transiently occluding the blood vessel, and a station keeping procedure for maintaining alignment. Locating the arteriotomy and aligning the applicator may be performed using a targeting catheter having one or more targeting aids, such as an inflatable balloon or sensor (e.g., Doppler or temperature sensor), and an ultrasonic beacon. Station keeping may be performed using overlapping ultrasound signals that are sent to a target tissue site and the echo detected. An algorithm is described for detecting tissue movement relative to the applicator based on comparison of the echo with a previously stored echo.

Abstract translation: 描述了用于密封血管开口的系统和方法，例如在股动脉导管插入术过程中形成的动脉切开术。 包括用于定位动脉切开术的方法，将治疗施用器对准动脉切开术，瞬时闭塞血管，以及用于维持对准的站保持程序。 定位动脉切开术并对准施用器可以使用具有一个或多个靶向辅助物的靶向导管（例如可充气球囊或传感器（例如，多普勒或温度传感器））和超声波信标进行。 可以使用发送到目标组织部位并检测到回波的重叠超声信号来执行站保持。 描述了一种用于基于回波与先前存储的回波的比较来检测相对于施用器的组织运动的算法。

公开(公告)号：WO2006019804A2

公开(公告)日：2006-02-23

申请号：PCT/US2005/024830

申请日：2005-07-13

Applicant: WYETH ,  YAN, Gouying ,  XIE, Yuhong ,  PAULSEN, Janet, E. ,  ZHANG, Jimin ,  ROOKEY, Dionna ,  BATES, Brian ,  LU, Zhijian ,  MARK, Robert ,  CAMPOS, Susie, J.

Inventor： YAN, Gouying ,  XIE, Yuhong ,  PAULSEN, Janet, E. ,  ZHANG, Jimin ,  ROOKEY, Dionna ,  BATES, Brian ,  LU, Zhijian ,  MARK, Robert ,  CAMPOS, Susie, J.

CPC classification number: C07K14/70503 ,  C07K14/4713 ,  C07K2319/21

Abstract: The present invention provides compositions and methods useful for purifying recombinant myelin-associated glycoprotein (MAG) and fragments thereof. In particular, the invention provides a one-step purification method for MAG and MAG fragments. Novel forms of human recombinant MAG protein are also disclosed in addition to methods of reliably producing and storing stable recombinant MAG proteins.

Abstract translation: 本发明提供了用于纯化重组髓磷脂相关糖蛋白（MAG）及其片段的组合物和方法。 特别地，本发明提供了用于MAG和MAG片段的一步纯化方法。 除了稳定产生和储存稳定的重组MAG蛋白的方法外，还公开了新的人重组MAG蛋白形式。

公开(公告)号：WO2014018027A1

公开(公告)日：2014-01-30

申请号：PCT/US2012/048050

申请日：2012-07-25

Applicant: APPLIED MATERIALS, INC. ,  XU, Kun ,  ZHANG, Jimin ,  MAI, David H. ,  JEW, Stephen ,  SHEN, Shih-Haur Walters ,  WANG, Zhihong ,  OSTERHELD, Thomas H. ,  TU, Wen-Chiang ,  LAM, Gary Ka Ho ,  KITAJIMA, Tomohiko

Inventor： XU, Kun ,  ZHANG, Jimin ,  MAI, David H. ,  JEW, Stephen ,  SHEN, Shih-Haur Walters ,  WANG, Zhihong ,  OSTERHELD, Thomas H. ,  TU, Wen-Chiang ,  LAM, Gary Ka Ho ,  KITAJIMA, Tomohiko

IPC: H01L21/304

CPC classification number: B24B37/015 ,  H01L21/3212

Abstract: Methods for chemical mechanical polishing (CMP) of semiconductor substrates, and more particularly to temperature control during such chemical mechanical polishing are provided. In one aspect, the method comprises polishing the substrate with a polishing surface during a polishing process to remove a portion of the conductive material, repeatedly monitoring a temperature of the polishing surface during the polishing process, and exposing the polishing surface to a rate quench process in response to the monitored temperature so as to achieve a target value for the monitored temperature during the polishing process.

Abstract translation: 提供半导体衬底的化学机械抛光（CMP）的方法，更具体地说，涉及这种化学机械抛光时的温度控制。 一方面，该方法包括在抛光过程中用抛光表面抛光衬底以去除一部分导电材料，在抛光过程中重复地监测抛光表面的温度，并将抛光表面暴露于速率骤冷过程 响应于所监测的温度，以便在抛光过程中达到监测温度的目标值。

公开(公告)号：WO2012030475A4

公开(公告)日：2012-08-16

申请号：PCT/US2011046660

申请日：2011-08-04

Applicant: APPLIED MATERIALS INC ,  DUBOUST ALAIN ,  JEW STEPHEN ,  MAI DAVID H ,  TRAN HUYEN ,  TU WEN-CHIANG ,  SHEN SHIH-HAUR ,  ZHANG JIMIN ,  CARLSSON INGEMAR ,  SWEDEK BOGUSLAW A ,  WANG ZHIHONG

Inventor： DUBOUST ALAIN ,  JEW STEPHEN ,  MAI DAVID H ,  TRAN HUYEN ,  TU WEN-CHIANG ,  SHEN SHIH-HAUR ,  ZHANG JIMIN ,  CARLSSON INGEMAR ,  SWEDEK BOGUSLAW A ,  WANG ZHIHONG

IPC: H01L21/304 ,  H01L21/66

CPC classification number: B24B37/013 ,  B24B37/042 ,  B65B1/366 ,  G06F17/5086 ,  H01L21/30625 ,  H01L22/12 ,  H01L22/20 ,  H01L22/26

Abstract: A difference between a first expected required polish time for a first substrate and a second expected required polish time for a second substrate is determined using a first prepolish thickness and a second pre-polish thickness measured at an in-line metrology station. A duration of an initial period is determined based on the difference between the first expected required polish time and the second expected required polish time. For the initial period at a beginning of a polishing operation, no pressure is applied to whichever of the first substrate and the second substrate has a lesser expected required polish time while simultaneously pressure is applied to whichever of the first substrate and the second substrate has a greater expected required polish time. After the initial period, pressure is applied to both the first substrate and the second substrate.

Abstract translation: 第一衬底的第一预期所需抛光时间与第二衬底的第二预期所需抛光时间之间的差异是使用在线计量站测量的第一预稀释厚度和第二预抛光厚度来确定的。 基于第一预期所需抛光时间和第二预期所需抛光时间之间的差异来确定初始周期的持续时间。 在抛光操作开始时的初始阶段，对于第一基板和第二基板中的任一个具有较少的预期需要的抛光时间，同时对第一基板和第二基板中的哪一个施加压力，则不施加压力 更大的预期需要的抛光时间。 在初始周期之后，对第一基板和第二基板施加压力。