Abstract:
A transfer member provided with a cleaning function, which has excellent foreign material removing performance and transfer performance and removes foreign materials having a prescribed particle diameter with especially high efficiency. The transfer member is provided with a transfer member (50) and a cleaning layer (20) arranged at least on one surface of the transfer member. The cleaning layer has an uneven shape having an arithmetic average roughness (Ra) of 0.05µm or less and a maximum height (Rz) of 1.0µm or less. Preferably, a substantial surface area of the cleaning layer per a flat surface of 1mm 2 is 150% of a substantial surface area of a silicon wafer mirror surface per a flat surface of 1mm 2 .
Abstract:
A method of heat peeling chip cut pieces (3a) from a heat peel type adhesive sheet (2) is a method by which chip cut pieces (3a) stuck to the heat peel type adhesive sheet (2) provided with a thermally expansible adhesive layer (2b) containing thermally expansible fine particles on one side of a substrate (2a) are peeled by heat from the heat peel type adhesive sheet (2), the method being characterized in that the heat peel type adhesive sheet (2) is heated in a restrained state and the chip cut pieces (3a) are peeled, wherein the means for restraining the heat peel type adhesive sheet (2) may be a suction means using suction or a adhesive means using an adhesive agent. Thereby, it is possible to heat−peel the chip cut pieces (3a) from the heat peel type adhesive sheet (2) while preventing horizontal positional shift.