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    ROTATABLE ELECTROSTATIC CHUCK HAVING BACKSIDE GAS SUPPLY
    1.
    发明申请
    ROTATABLE ELECTROSTATIC CHUCK HAVING BACKSIDE GAS SUPPLY 审中-公开

    公开(公告)号：WO2018112159A2

    公开(公告)日：2018-06-21

    申请号：PCT/US2017/066332

    申请日：2017-12-14

    申请人： APPLIED MATERIALS, INC.

    发明人： SWAMINATHAN, Bharath ,  WANG, Wei

    IPC分类号： H01L21/683

    摘要： Embodiments of a substrate support pedestal and an electrostatic chuck incorporating same are disclosed herein. In some embodiments, a substrate support pedestal includes: a body having an upper surface and a lower surface opposite the upper surface; one or more chucking electrodes disposed within the body; a plurality of substrate support elements protruding from the upper surface to support a substrate; a hole disposed in the lower surface at a center of and partially through the body; a plurality of gas holes disposed in the upper surface proximate the center of the body, wherein the plurality of gas holes is disposed above and fluidly coupled to the hole; and a plurality of gas distribution grooves formed in the upper surface and fluidly coupled to the plurality of gas holes.

    METHOD AND APPARATUS FOR PROCESSING A SUBSTRATE
    4.
    发明申请
    METHOD AND APPARATUS FOR PROCESSING A SUBSTRATE 审中-公开

    公开(公告)号：WO2018129049A1

    公开(公告)日：2018-07-12

    申请号：PCT/US2018/012191

    申请日：2018-01-03

    申请人： APPLIED MATERIALS, INC.

    发明人： SWAMINATHAN, Bharath ,  WU, Hanbing ,  MAZZOCCO, John

    IPC分类号： C23C14/50 ,  C23C14/58 ,  C23C14/34 ,  C23C14/56 ,  C23C14/54

    摘要： Embodiments of a method and apparatus for annealing a substrate are disclosed herein. In some embodiments, a substrate support includes a substrate support pedestal having an upper surface to support a substrate and an opposing bottom surface, wherein the substrate support pedestal is formed of a material that is transparent to radiation; a lamp assembly disposed below the substrate support pedestal and having a plurality of lamps configured to heat the substrate; a pedestal support extending through the lamp assembly to support the substrate support pedestal in a spaced apart relation to the plurality of lamps; a shaft coupled to a second end of the pedestal support opposite the first end; and a rotation assembly coupled to the shaft opposite the pedestal support to rotate the shaft, the pedestal support, and the substrate support pedestal with respect to the lamp assembly.

    BIASABLE ROTATABLE ELECTROSTATIC CHUCK
    5.
    发明申请
    BIASABLE ROTATABLE ELECTROSTATIC CHUCK 审中-公开
    可偏转可旋转静电卡盘

    公开(公告)号：WO2017075474A1

    公开(公告)日：2017-05-04

    申请号：PCT/US2016/059500

    申请日：2016-10-28

    申请人： APPLIED MATERIALS, INC.

    发明人： SWAMINATHAN, Bharath ,  SUBRAMANI, Anantha K.

    IPC分类号： H01L21/683 ,  H01L21/203

    CPC分类号： H01L21/6833 ,  H01L21/67115 ,  H01L21/68742 ,  H01L21/68785 ,  H01L21/68792 ,  H01R39/60 ,  H01R39/64

    摘要： Embodiments of the present disclosure relate to a rotatable RF coupling device and an electrostatic chuck incorporating the same. In some embodiments, a rotatable RF coupling device includes a conductive plate; a rotatable split cylinder configured to be coupled to a dielectric disk of an electrostatic chuck to provide RF power to one or more RF bias electrodes disposed within the dielectric disk; a plurality of RF input taps coupled to the conductive plate to couple RF power to the conductive plate; a stationary ring coupled to the conductive plate and surrounding the rotatable split cylinder; and a grounded shield surrounding the conductive plate, the stationary ring, and the rotatable split cylinder.

    摘要翻译： 本公开的实施例涉及一种可旋转的RF耦合装置以及包含该可旋转的RF耦合装置的静电卡盘。 在一些实施例中，可旋转的RF耦合装置包括导电板; 可旋转分裂圆柱体，其被配置为耦合到静电吸盘的介电盘以向设置在所述介电盘内的一个或多个RF偏置电极提供RF功率; 耦合到导电板以将RF功率耦合到导电板的多个RF输入抽头; 固定环，所述固定环联接到所述导电板并且围绕所述可旋转拼合柱体; 以及一个围绕着导电板，固定环和可旋转开口柱体的接地屏蔽层。

    ROTATABLE HEATED ELECTROSTATIC CHUCK
    7.
    发明申请
    ROTATABLE HEATED ELECTROSTATIC CHUCK 审中-公开
    可旋转加热静电切割机

    公开(公告)号：WO2015094750A1

    公开(公告)日：2015-06-25

    申请号：PCT/US2014/069040

    申请日：2014-12-08

    申请人： APPLIED MATERIALS, INC.

    发明人： SUBRAMANI, Anantha K. ,  GOEL, Ashish ,  WANG, Wei W. ,  SWAMINATHAN, Bharath ,  PARKHE, Vijay D. ,  YUAN, Xiaoxiong

    IPC分类号： H01L21/683 ,  H02N13/00 ,  B23Q3/15

    CPC分类号： H02N13/00 ,  H01J37/32091 ,  H01J37/32715 ,  H01J37/32724 ,  H01L21/67103 ,  H01L21/67115 ,  H01L21/6831 ,  H01L21/68742 ,  H01L21/68792

    摘要： An electrostatic chuck includes a dielectric disk having a support surface to support a substrate and an opposing second surface, wherein at least one chucking electrode is disposed within the dielectric disk; a radio frequency (RF) bias plate disposed below the dielectric disk; a plurality of lamps disposed below the RF bias plate to heat the dielectric disk; a metallic plate disposed below the lamps to absorb heat generated by the lamps; a shaft coupled to the second surface of the dielectric disk at a first end of the shaft to support the dielectric disk in a spaced apart relation to the RF bias plate and extending away from the dielectric disk and through the RF bias plate and the metallic plate; and a rotation assembly coupled to the shaft to rotate the shaft and the dielectric disk with respect to the RF bias plate, lamps, and metallic plate.

    摘要翻译： 静电卡盘包括具有用于支撑基板的支撑表面和相对的第二表面的电介质盘，其中至少一个夹持电极设置在电介质盘内; 设置在介质盘下方的射频（RF）偏置板; 设置在所述RF偏置板下方的多个灯以加热所述电介质盘; 设置在灯下方的金属板，以吸收由灯产生的热量; 在所述轴的第一端处耦合到所述电介质盘的所述第二表面的轴，以将所述电介质盘以与所述RF偏置板隔开的关系支撑并且延伸离开所述电介质盘并且穿过所述RF偏置板和所述金属板 ; 以及联接到所述轴的旋转组件，以相对于所述RF偏置板，灯和金属板旋转所述轴和所述电介质盘。

    ROTATABLE ELECTROSTATIC CHUCK HAVING BACKSIDE GAS SUPPLY
    8.
    发明申请
    ROTATABLE ELECTROSTATIC CHUCK HAVING BACKSIDE GAS SUPPLY 审中-公开

    公开(公告)号：WO2018112159A3

    公开(公告)日：2018-06-21

    申请号：PCT/US2017/066332

    申请日：2017-12-14

    申请人： APPLIED MATERIALS, INC.

    发明人： SWAMINATHAN, Bharath ,  WANG, Wei

    IPC分类号： H01L21/683

    摘要： Embodiments of a substrate support pedestal and an electrostatic chuck incorporating same are disclosed herein. In some embodiments, a substrate support pedestal includes: a body having an upper surface and a lower surface opposite the upper surface; one or more chucking electrodes disposed within the body; a plurality of substrate support elements protruding from the upper surface to support a substrate; a hole disposed in the lower surface at a center of and partially through the body; a plurality of gas holes disposed in the upper surface proximate the center of the body, wherein the plurality of gas holes is disposed above and fluidly coupled to the hole; and a plurality of gas distribution grooves formed in the upper surface and fluidly coupled to the plurality of gas holes.