Abstract:
A metal oxide semiconductor thin film, a thin film transistor (TFT), methods for fabricating the metal oxide semiconductor thin film and the TFT, and a display apparatus are provided. In some embodiments, the metal oxide semiconductor comprises: a first metal element, a second metal element and a third metal element, wherein: the first metal element is at least one of scandium, yttrium, aluminum, indium, and a rare earth element; the second metal element is at least one of calcium, strontium, and barium; and the third metal element is at least one of titanium and tin.
Abstract:
An active layer, a thin film transistor, an array substrate, and a display apparatus, and fabrication methods thereof are provided. A method for fabricating an active layer (4) in a thin film transistor is provided by forming a thin film by a direct current (DC) sputtering process; and etching the thin film to form the active layer (4). The thin film is made of a material selected to provide the active layer (4) with a carrier concentration of at least approximately 1x10 17 cm -3 and a carrier mobility of at least approximately 20 cm 2 /Vs.
Abstract:
A method for manufacturing a semiconductor thin film includes sequentially forming a first semiconductor layer, an intermediate layer, and a second semiconductor layer over a substrate. The first semiconductor layer and the second semiconductor layer can be one and another of an n-type semiconductor layer and a p-type semiconductor layer. At least one of the first semiconductor layer, the intermediate layer, or the second semiconductor layer is formed via a solution process. The n-type semiconductor layer can include indium oxide. The intermediate layer can include a self-assembly material. The p-type semiconductor layer can include a p-type organic semiconductor material, and can be pentacene. On the basis, a semiconductor thin film manufactured thereby, a semiconductor thin film transistor, and a display apparatus, are also disclosed.
Abstract:
A thin-film transistor (TFT) is provided in this disclosure, which comprises Sn-doped ZrO 2 . This oxide semiconductor material can be used in a semiconductor layer of a TFT, and a mass percentage of Sn doped in the ZrO 2 is about 1%-95%. A semiconductor layer comprising Sn-doped ZrO 2 exhibits higher acid tolerance after annealing. This disclosure also provides a method for fabricating a TFT, which comprises: (i) forming a semiconductor layer, wherein the semiconductor layer comprises Sn-doped ZrO 2 , and (ii) annealing the semiconductor layer.
Abstract:
A method of fabricating a plurality of electrodes is provided. The method includes forming a hydrophobic pattern (101) containing a hydrophobic material on a base substrate (100), the hydrophobic pattern (101) has a first ridge (1011a) on a first edge (e1) of the hydrophobic pattern (101), the hydrophobic pattern (101) has a thickness at the first ridge (1011a) greater than that in a region outside a region corresponding to the first ridge (1011a); removing a portion of the hydrophobic pattern (101) outside the region corresponding to the first ridge (1011a); and forming a first electrode (103) on a first side of the first ridge (1011a) and a second electrode (104) on a second side of the first ridge (1011a).
Abstract:
A TFT, a related TFT array substrate, fabricating methods thereof, a display panel and a display device containing the same are provided. A method for fabricating a TFT is provided, the method comprising: forming an initial conductive layer on a base substrate (01); performing an oxidization process to partially oxidize the initial conductive layer to form an oxidized insulating sub-layer (15) and a non-oxidized conductive sub-layer(10); and forming an active layer(19), a source electrode (20) and a drain electrode (21) over the oxidized insulating sub-layer (15).
Abstract:
A display panel includes a touch electrode layer (4). The touch electrode layer (4) may include a plurality of touch electrodes (41). Each of the plurality of the touch electronics (41) may be insulated from one another. A shape of each of the plurality of the touch electronics (41) may be configured to determine a distance of a touch position on one of the plurality of the touch electrodes (41) to a geometric center of the touch electrode layer (4) based on a change of a capacitance of each of the plurality of the touch electrodes (41).
Abstract:
A mutual-capacitance touch sensing pattern recognition device, a related fabricating method, a related display panel, and a related display apparatus are disclosed. The mutual-capacitance touch sensing pattern recognition device can comprise a plurality of sensing electrode lines and a plurality of driving electrode lines, wherein at least one set of the plurality of sensing electrode lines and the plurality of driving electrode lines have curved portions
Abstract:
A touch display panel. The touch display panel includes a first substrate (11); a plurality of data lines (13); and a plurality of gate lines (14). The touch display panel also includes a plurality of subpixel regions (15) arranged in an array defined by the plurality of data lines (13) and the plurality of gate lines (14) on the first substrate (11), each subpixel region (15) including a common electrode pattern (16); a plurality of touch-driving electrodes (17), each formed by electrically connected common electrode patterns (16) corresponding to at least one row of subpixel regions (15); and a plurality of touch-sensing electrodes (18). The plurality of touch-driving electrodes (17) and the touch-sensing electrodes (18) are for detecting a touch motion on the touch display panel.
Abstract:
A stretchable display panel has a plurality of first regions (I) and a plurality of second regions (II) alternately arranged. The stretchable display panel includes a plurality of first light emitting elements (E1) and a plurality of first driving circuits (T1) for driving light emission of the plurality of first light emitting elements(E1); and a plurality of second light emitting elements (E2) and a plurality of second driving circuits (T2) for driving light emission of the plurality of second light emitting elements(E1). The plurality of first light emitting elements(E1), the plurality of first driving circuits(T1), and the plurality of second driving circuits(T2) are limited in the plurality of first regions (I). The plurality of second light emitting elements (E2) are limited in the plurality of second regions (II). The stretchable display panel in the plurality of first regions(I) have a Young's modulus greater than a Young's modulus in the plurality of second regions (II) of the stretchable display panel.