SEMICONDUCTOR THIN-FILM AND MANUFACTURING METHOD THEREOF, THIN-FILM TRANSISTOR, AND DISPLAY APPARATUS
    3.
    发明申请
    SEMICONDUCTOR THIN-FILM AND MANUFACTURING METHOD THEREOF, THIN-FILM TRANSISTOR, AND DISPLAY APPARATUS 审中-公开
    半导体薄膜及其制造方法,薄膜晶体管和显示装置

    公开(公告)号:WO2018076960A1

    公开(公告)日:2018-05-03

    申请号:PCT/CN2017/102106

    申请日:2017-09-18

    Abstract: A method for manufacturing a semiconductor thin film includes sequentially forming a first semiconductor layer, an intermediate layer, and a second semiconductor layer over a substrate. The first semiconductor layer and the second semiconductor layer can be one and another of an n-type semiconductor layer and a p-type semiconductor layer. At least one of the first semiconductor layer, the intermediate layer, or the second semiconductor layer is formed via a solution process. The n-type semiconductor layer can include indium oxide. The intermediate layer can include a self-assembly material. The p-type semiconductor layer can include a p-type organic semiconductor material, and can be pentacene. On the basis, a semiconductor thin film manufactured thereby, a semiconductor thin film transistor, and a display apparatus, are also disclosed.

    Abstract translation: 用于制造半导体薄膜的方法包括在衬底上顺序形成第一半导体层,中间层和第二半导体层。 第一半导体层和第二半导体层可以是n型半导体层和p型半导体层中的一个和另一个。 通过溶液工艺形成第一半导体层,中间层或第二半导体层中的至少一个。 该n型半导体层可以包括氧化铟。 中间层可以包括自组装材料。 p型半导体层可以包括p型有机半导体材料,并且可以是并五苯。 在此基础上,还公开了由其制造的半导体薄膜,半导体薄膜晶体管和显示装置。

    OXIDE SEMICONDUCTOR MATERIAL, THIN-FILM TRANSISTOR, AND FABRICATION METHOD THEREOF
    4.
    发明申请
    OXIDE SEMICONDUCTOR MATERIAL, THIN-FILM TRANSISTOR, AND FABRICATION METHOD THEREOF 审中-公开
    氧化物半导体材料,薄膜晶体管及其制造方法

    公开(公告)号:WO2017124672A1

    公开(公告)日:2017-07-27

    申请号:PCT/CN2016/082904

    申请日:2016-05-20

    CPC classification number: H01L29/7869

    Abstract: A thin-film transistor (TFT) is provided in this disclosure, which comprises Sn-doped ZrO 2 . This oxide semiconductor material can be used in a semiconductor layer of a TFT, and a mass percentage of Sn doped in the ZrO 2 is about 1%-95%. A semiconductor layer comprising Sn-doped ZrO 2 exhibits higher acid tolerance after annealing. This disclosure also provides a method for fabricating a TFT, which comprises: (i) forming a semiconductor layer, wherein the semiconductor layer comprises Sn-doped ZrO 2 , and (ii) annealing the semiconductor layer.

    Abstract translation: 本发明提供了一种薄膜晶体管(TFT),其包括Sn掺杂的ZrO 2。 该氧化物半导体材料可以用于TFT的半导体层中,并且在ZrO 2中掺杂的Sn的质量百分比为大约1%-95%。 包含Sn掺杂的ZrO 2的半导体层在退火后表现出较高的耐酸性。 本发明还提供了一种制造TFT的方法,其包括:(i)形成半导体层,其中所述半导体层包含Sn掺杂的ZrO 2,和(ii)对所述半导体层进行退火。 / p>

    METHOD OF FABRICATING ELECTRODES, METHOD OF FABRICATING THIN FILM TRANSISTOR, METHOD OF FABRICATING ARRAY SUBSTRATE, THIN FILM TRANSISTOR, ARRAY SUBSTRATE, AND DISPLAY APPARATUS
    5.
    发明申请
    METHOD OF FABRICATING ELECTRODES, METHOD OF FABRICATING THIN FILM TRANSISTOR, METHOD OF FABRICATING ARRAY SUBSTRATE, THIN FILM TRANSISTOR, ARRAY SUBSTRATE, AND DISPLAY APPARATUS 审中-公开
    制造电极的方法,制造薄膜晶体管的方法,制造阵列基板的方法,薄膜晶体管,阵列基板和显示装置

    公开(公告)号:WO2018082327A1

    公开(公告)日:2018-05-11

    申请号:PCT/CN2017/091131

    申请日:2017-06-30

    Abstract: A method of fabricating a plurality of electrodes is provided. The method includes forming a hydrophobic pattern (101) containing a hydrophobic material on a base substrate (100), the hydrophobic pattern (101) has a first ridge (1011a) on a first edge (e1) of the hydrophobic pattern (101), the hydrophobic pattern (101) has a thickness at the first ridge (1011a) greater than that in a region outside a region corresponding to the first ridge (1011a); removing a portion of the hydrophobic pattern (101) outside the region corresponding to the first ridge (1011a); and forming a first electrode (103) on a first side of the first ridge (1011a) and a second electrode (104) on a second side of the first ridge (1011a).

    Abstract translation: 提供了一种制造多个电极的方法。 该方法包括在基底基板(100)上形成包含疏水材料的疏水图案(101),疏水图案(101)在疏水图案(101)的第一边缘(e1)上具有第一脊部(1011a) 所述疏水图案(101)在所述第一凸脊(1011a)处的厚度大于在对应于所述第一凸脊(1011a)的区域外侧的区域中的厚度; 在对应于所述第一脊(1011a)的区域外部去除所述疏水图案(101)的一部分; 以及在第一脊(1011a)的第一侧上形成第一电极(103),并在第一脊(1011a)的第二侧上形成第二电极(104)。

    STRETCHABLE DISPLAY PANEL, STRETCHABLE DISPLAY APPARATUS, AND METHOD OF FABRICATING STRETCHABLE DISPLAY PANEL

    公开(公告)号:WO2020093354A1

    公开(公告)日:2020-05-14

    申请号:PCT/CN2018/114756

    申请日:2018-11-09

    Abstract: A stretchable display panel has a plurality of first regions (I) and a plurality of second regions (II) alternately arranged. The stretchable display panel includes a plurality of first light emitting elements (E1) and a plurality of first driving circuits (T1) for driving light emission of the plurality of first light emitting elements(E1); and a plurality of second light emitting elements (E2) and a plurality of second driving circuits (T2) for driving light emission of the plurality of second light emitting elements(E1). The plurality of first light emitting elements(E1), the plurality of first driving circuits(T1), and the plurality of second driving circuits(T2) are limited in the plurality of first regions (I). The plurality of second light emitting elements (E2) are limited in the plurality of second regions (II). The stretchable display panel in the plurality of first regions(I) have a Young's modulus greater than a Young's modulus in the plurality of second regions (II) of the stretchable display panel.

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