METHOD OF FABRICATING ELECTRODES, METHOD OF FABRICATING THIN FILM TRANSISTOR, METHOD OF FABRICATING ARRAY SUBSTRATE, THIN FILM TRANSISTOR, ARRAY SUBSTRATE, AND DISPLAY APPARATUS
    2.
    发明申请
    METHOD OF FABRICATING ELECTRODES, METHOD OF FABRICATING THIN FILM TRANSISTOR, METHOD OF FABRICATING ARRAY SUBSTRATE, THIN FILM TRANSISTOR, ARRAY SUBSTRATE, AND DISPLAY APPARATUS 审中-公开
    制造电极的方法,制造薄膜晶体管的方法,制造阵列基板的方法,薄膜晶体管,阵列基板和显示装置

    公开(公告)号:WO2018082327A1

    公开(公告)日:2018-05-11

    申请号:PCT/CN2017/091131

    申请日:2017-06-30

    Abstract: A method of fabricating a plurality of electrodes is provided. The method includes forming a hydrophobic pattern (101) containing a hydrophobic material on a base substrate (100), the hydrophobic pattern (101) has a first ridge (1011a) on a first edge (e1) of the hydrophobic pattern (101), the hydrophobic pattern (101) has a thickness at the first ridge (1011a) greater than that in a region outside a region corresponding to the first ridge (1011a); removing a portion of the hydrophobic pattern (101) outside the region corresponding to the first ridge (1011a); and forming a first electrode (103) on a first side of the first ridge (1011a) and a second electrode (104) on a second side of the first ridge (1011a).

    Abstract translation: 提供了一种制造多个电极的方法。 该方法包括在基底基板(100)上形成包含疏水材料的疏水图案(101),疏水图案(101)在疏水图案(101)的第一边缘(e1)上具有第一脊部(1011a) 所述疏水图案(101)在所述第一凸脊(1011a)处的厚度大于在对应于所述第一凸脊(1011a)的区域外侧的区域中的厚度; 在对应于所述第一脊(1011a)的区域外部去除所述疏水图案(101)的一部分; 以及在第一脊(1011a)的第一侧上形成第一电极(103),并在第一脊(1011a)的第二侧上形成第二电极(104)。

    OPTICS AL-MIRROR WITH HIGH VOLUME FRACTION SiCp/Al COMPOSITE-TITANIUM ALLOY-BISMUTHATE GLASS METAL PLUS DIELECTRIC MULTIPLE FILMS AND METHOD FOR MANUFACTURING THE SAME

    公开(公告)号:WO2018188072A1

    公开(公告)日:2018-10-18

    申请号:PCT/CN2017/080571

    申请日:2017-04-14

    CPC classification number: C03C17/36 C03C17/3649 C03C17/3663

    Abstract: A method of making a high volume fraction SiCp/Al composite-Titanium alloy-bismuthate glass metal plus dielectric multi-layer films optics Al-mirror, the method comprising: a step of preparing a novel mirror substrate, and a step of fabricating the mirror of film design. A high volume fraction SiCp/Al composite-Titanium alloy-bismuthate glass metal plus multi-layer films optics Al-mirror comprising, in sequence, at least: a high volume fraction SiCp/Al composite-Titanium alloy-bismuthate glass metal substrate, a transition layer, a reflection layer, a protection layer, and a transmission enhanced layer. The substrate is high volume fraction SiCp/Al composite-Titanium alloy-bismuthate glass metal substrate, the transition layer is a Cr film, the reflector layer is an Al film, the protective layer is SiO 2 and the transmission enhanced layer is Ta 2 O 5 . The high volume fraction SiCp/Al composite-Titanium alloy-bismuthate glass metal plus multi-layer films optics Al-mirror has outstanding optical features: the maximum reflectivity can reach up to 97% in a visible wavelength range of 450-720 nm, and lightweight and stability than traditional optical pure glass mirror.

    SEMICONDUCTOR THIN-FILM AND MANUFACTURING METHOD THEREOF, THIN-FILM TRANSISTOR, AND DISPLAY APPARATUS
    9.
    发明申请
    SEMICONDUCTOR THIN-FILM AND MANUFACTURING METHOD THEREOF, THIN-FILM TRANSISTOR, AND DISPLAY APPARATUS 审中-公开
    半导体薄膜及其制造方法,薄膜晶体管和显示装置

    公开(公告)号:WO2018076960A1

    公开(公告)日:2018-05-03

    申请号:PCT/CN2017/102106

    申请日:2017-09-18

    Abstract: A method for manufacturing a semiconductor thin film includes sequentially forming a first semiconductor layer, an intermediate layer, and a second semiconductor layer over a substrate. The first semiconductor layer and the second semiconductor layer can be one and another of an n-type semiconductor layer and a p-type semiconductor layer. At least one of the first semiconductor layer, the intermediate layer, or the second semiconductor layer is formed via a solution process. The n-type semiconductor layer can include indium oxide. The intermediate layer can include a self-assembly material. The p-type semiconductor layer can include a p-type organic semiconductor material, and can be pentacene. On the basis, a semiconductor thin film manufactured thereby, a semiconductor thin film transistor, and a display apparatus, are also disclosed.

    Abstract translation: 用于制造半导体薄膜的方法包括在衬底上顺序形成第一半导体层,中间层和第二半导体层。 第一半导体层和第二半导体层可以是n型半导体层和p型半导体层中的一个和另一个。 通过溶液工艺形成第一半导体层,中间层或第二半导体层中的至少一个。 该n型半导体层可以包括氧化铟。 中间层可以包括自组装材料。 p型半导体层可以包括p型有机半导体材料,并且可以是并五苯。 在此基础上,还公开了由其制造的半导体薄膜,半导体薄膜晶体管和显示装置。

    METHOD FOR PREPARATION AND ACTIVATION OF SUPER-HYDROPHOBIC ELECTRET FIBER MATERIAL FOR CLEANING PM2.5
    10.
    发明申请
    METHOD FOR PREPARATION AND ACTIVATION OF SUPER-HYDROPHOBIC ELECTRET FIBER MATERIAL FOR CLEANING PM2.5 审中-公开
    用于清洗PM2.5的超疏水电极纤维材料的制备和活化方法

    公开(公告)号:WO2017197812A1

    公开(公告)日:2017-11-23

    申请号:PCT/CN2016/098632

    申请日:2016-09-10

    Abstract: Disclosed is a method for preparation and activation of a super hydrophobic electret nanofibrous filter material for cleaning PM2.5, comprising the steps as follows: (1)dissolving polymer powders and resin into a corresponding solvent so as to prepare a polymer solution, then stirring on a magnetic stirrer and standing for use; (2) in order to reinforce the electrostatic effect of the fiber, before preparing the polymer solution, adding in organic electret nanoparticles into the solvent, then oscillating with an ultrasonic oscillator; (3) in order to reinforce the super hydrophobic effect of the filter, spraying a low surface energy solution on the prepared nanofiber with a designed nozzle to carry out modification.

    Abstract translation: 公开了一种用于清洗PM2.5的超疏水驻极体纳米纤维过滤材料的制备和活化方法,包括以下步骤:(1)将聚合物粉末和树脂溶解在相应的溶剂中,如 制备聚合物溶液,然后在磁力搅拌器上搅拌并静置使用; (2)为了增强纤维的静电效应,在制备聚合物溶液之前,将有机驻极体纳米颗粒加入溶剂中,然后用超声波振荡器振荡; (3)为了增强过滤器的超疏水效果,用设计好的喷嘴在制备的纳米纤维上喷洒低表面能溶液进行修饰。

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