Abstract:
A metal oxide semiconductor thin film, a thin film transistor (TFT), methods for fabricating the metal oxide semiconductor thin film and the TFT, and a display apparatus are provided. In some embodiments, the metal oxide semiconductor comprises: a first metal element, a second metal element and a third metal element, wherein: the first metal element is at least one of scandium, yttrium, aluminum, indium, and a rare earth element; the second metal element is at least one of calcium, strontium, and barium; and the third metal element is at least one of titanium and tin.
Abstract:
A method of fabricating a plurality of electrodes is provided. The method includes forming a hydrophobic pattern (101) containing a hydrophobic material on a base substrate (100), the hydrophobic pattern (101) has a first ridge (1011a) on a first edge (e1) of the hydrophobic pattern (101), the hydrophobic pattern (101) has a thickness at the first ridge (1011a) greater than that in a region outside a region corresponding to the first ridge (1011a); removing a portion of the hydrophobic pattern (101) outside the region corresponding to the first ridge (1011a); and forming a first electrode (103) on a first side of the first ridge (1011a) and a second electrode (104) on a second side of the first ridge (1011a).
Abstract:
A TFT, a related TFT array substrate, fabricating methods thereof, a display panel and a display device containing the same are provided. A method for fabricating a TFT is provided, the method comprising: forming an initial conductive layer on a base substrate (01); performing an oxidization process to partially oxidize the initial conductive layer to form an oxidized insulating sub-layer (15) and a non-oxidized conductive sub-layer(10); and forming an active layer(19), a source electrode (20) and a drain electrode (21) over the oxidized insulating sub-layer (15).
Abstract:
The invention provides a MtuΔI-CM intein variant or a biologically active fragment there of, and a method for producing and purifying a molecule of interest using the same.
Abstract:
A method of making a high volume fraction SiCp/Al composite-Titanium alloy-bismuthate glass metal plus dielectric multi-layer films optics Al-mirror, the method comprising: a step of preparing a novel mirror substrate, and a step of fabricating the mirror of film design. A high volume fraction SiCp/Al composite-Titanium alloy-bismuthate glass metal plus multi-layer films optics Al-mirror comprising, in sequence, at least: a high volume fraction SiCp/Al composite-Titanium alloy-bismuthate glass metal substrate, a transition layer, a reflection layer, a protection layer, and a transmission enhanced layer. The substrate is high volume fraction SiCp/Al composite-Titanium alloy-bismuthate glass metal substrate, the transition layer is a Cr film, the reflector layer is an Al film, the protective layer is SiO 2 and the transmission enhanced layer is Ta 2 O 5 . The high volume fraction SiCp/Al composite-Titanium alloy-bismuthate glass metal plus multi-layer films optics Al-mirror has outstanding optical features: the maximum reflectivity can reach up to 97% in a visible wavelength range of 450-720 nm, and lightweight and stability than traditional optical pure glass mirror.
Abstract:
An active layer, a thin film transistor, an array substrate, and a display apparatus, and fabrication methods thereof are provided. A method for fabricating an active layer (4) in a thin film transistor is provided by forming a thin film by a direct current (DC) sputtering process; and etching the thin film to form the active layer (4). The thin film is made of a material selected to provide the active layer (4) with a carrier concentration of at least approximately 1x10 17 cm -3 and a carrier mobility of at least approximately 20 cm 2 /Vs.
Abstract:
Disclosed are adhesives comprising a first compound comprising three or more 1,2-dihydroxybenzene groups; and a second compound that is a functionalized polymer; wherein the first compound and second compound are in the form of a mixture, and wherein the adhesive has adhesive properties when wet. Additional embodiments to methods of preparing an adhesive, adhesives prepared by the method, and articles prepared from the adhesive are disclosed.
Abstract:
A method of making a high volume fraction SiCp/Al composite-titanium alloy-PbO glass metal plus dielectric films optical Ag mirror is disclosed. The method comprises: a step of preparing a novel mirror substrate, and a step of fabricating the mirror of film design. A high volume fraction SiCp/Al composite-titanium alloy-PbO glass metal plus dielectric films optical Ag mirror comprises, in sequence, at least: a high volume fraction SiCp/Al composite-Titanium alloy-PbO glass metal substrate, a transition layer, a reflection layer, a protection layer, and a transmission enhanced layer. The transition layer is a Cr film, the reflector layer is an Ag film, the protective layer is SiO 2 and the transmission enhanced layer is Ta 2 O 5 . The high volume fraction SiCp/Al composite-titanium alloy-PbO glass metal plus dielectric films optical Ag mirror has high reflectivity (≥ 96%) in a visible wavelength range of 450-1600 nm. This material can be used in space telescopes and space surveillance cameras.
Abstract:
A method for manufacturing a semiconductor thin film includes sequentially forming a first semiconductor layer, an intermediate layer, and a second semiconductor layer over a substrate. The first semiconductor layer and the second semiconductor layer can be one and another of an n-type semiconductor layer and a p-type semiconductor layer. At least one of the first semiconductor layer, the intermediate layer, or the second semiconductor layer is formed via a solution process. The n-type semiconductor layer can include indium oxide. The intermediate layer can include a self-assembly material. The p-type semiconductor layer can include a p-type organic semiconductor material, and can be pentacene. On the basis, a semiconductor thin film manufactured thereby, a semiconductor thin film transistor, and a display apparatus, are also disclosed.
Abstract:
Disclosed is a method for preparation and activation of a super hydrophobic electret nanofibrous filter material for cleaning PM2.5, comprising the steps as follows: (1)dissolving polymer powders and resin into a corresponding solvent so as to prepare a polymer solution, then stirring on a magnetic stirrer and standing for use; (2) in order to reinforce the electrostatic effect of the fiber, before preparing the polymer solution, adding in organic electret nanoparticles into the solvent, then oscillating with an ultrasonic oscillator; (3) in order to reinforce the super hydrophobic effect of the filter, spraying a low surface energy solution on the prepared nanofiber with a designed nozzle to carry out modification.