PLASMA VAPOR CHAMBER AND ANTIMICROBIAL APPLICATIONS THEREOF
    2.
    发明申请
    PLASMA VAPOR CHAMBER AND ANTIMICROBIAL APPLICATIONS THEREOF 审中-公开
    等离子体蒸气室及其抗微生物应用

    公开(公告)号:WO2016130750A1

    公开(公告)日:2016-08-18

    申请号:PCT/US2016/017460

    申请日:2016-02-11

    CPC classification number: A61L2/14 A61L2202/122 H05H1/2406 H05H2001/2412

    Abstract: Exemplary apparatuses and methods of killing or deactivating bacteria are disclosed herein. An exemplary apparatus for killing or deactivating bacteria includes a plasma vapor chamber. The plasma vapor chamber has a vapor inlet for allowing a vapor into the chamber, a high voltage electrode, one or more grounding electrodes. The one or more grounding electrodes at least partially surrounding the plasma vapor chamber. The plasma vapor chamber includes an outlet for allowing fluid to flow out of the chamber. When the chamber is filled with vapor for a period of time sufficient to saturate the chamber with vapor, the high voltage electrode is energized to generate plasma throughout the chamber.

    Abstract translation: 本文公开了杀死或灭活细菌的示例性装置和方法。 用于杀死或灭活细菌的示例性装置包括等离子体蒸气室。 等离子体蒸气室具有用于允许蒸气进入室的蒸气入口,高压电极,一个或多个接地电极。 一个或多个接地电极至少部分地围绕等离子体蒸气室。 等离子体蒸气室包括用于允许流体流出室的出口。 当室内充满蒸气一段足以使蒸发室饱和的时间时,高压电极被通电以在整个室中产生等离子体。

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