公开(公告)号：WO2012138460A2

公开(公告)日：2012-10-11

申请号：PCT/US2012028910

申请日：2012-03-13

Applicant: KLA TENCOR CORP ,  ZHAO GUOHENG ,  LEVY ADY ,  SALNIK ALEX ,  VAEZ-IRAVANI MEHDI ,  NICOLAIDES LENA ,  NGAI SAMUEL S H

Inventor： ZHAO GUOHENG ,  LEVY ADY ,  SALNIK ALEX ,  VAEZ-IRAVANI MEHDI ,  NICOLAIDES LENA ,  NGAI SAMUEL S H

IPC: G01N21/01 ,  F21S2/00 ,  F21V8/00 ,  G01R31/26

CPC classification number: H05B33/0803

Abstract: An apparatus for illuminating a target surface, the apparatus having a plurality of LED arrays, where each of the arrays has a plurality of individually addressable LEDs, and where at least one of the arrays is disposed at an angle of between about forty-five degrees and about ninety degrees relative to the target surface, where all of the arrays supply light into a light pipe, the light pipe having interior walls made of a reflective material, where light exiting the light pipe illuminates the target surface, and a controller for adjusting an intensity of the individually addressable light sources.

Abstract translation: 一种用于照射目标表面的装置，该装置具有多个LED阵列，其中每个阵列具有多个独立可寻址的LED，并且其中至少一个阵列以大约四十五度之间的角度设置 并且相对于目标表面大约九十度，其中所有阵列将光提供到光管中，光管具有由反射材料制成的内壁，其中离开光管的光照射目标表面，以及用于调节的控制器 独立寻址光源的强度。

公开(公告)号：WO2010077865A2

公开(公告)日：2010-07-08

申请号：PCT/US2009068060

申请日：2009-12-15

Applicant: KLA TENCOR CORP ,  ZHAO GUOHENG ,  ZAPALAC GEORGE H ,  NGAI SAMUEL S H ,  VAEZ-IRAVANI MEHDI ,  LEVY ADY ,  DHARMADHIKARI VINEET

Inventor： ZHAO GUOHENG ,  ZAPALAC GEORGE H ,  NGAI SAMUEL S H ,  VAEZ-IRAVANI MEHDI ,  LEVY ADY ,  DHARMADHIKARI VINEET

IPC: H01L21/66 ,  H01L31/042

CPC classification number: G06T7/001 ,  G01N25/72 ,  G02F1/1309 ,  G06T2207/10048 ,  G06T2207/30148

Abstract: To increase inspection throughput, the field of view of an infrared camera can be moved over the sample at a constant velocity. Throughout this moving, a modulation can be provided to the sample and infrared images can be captured using the infrared camera. Moving the field of view, providing the modulation, and capturing the infrared images can be synchronized. The infrared images can be filtered to generate the time delay lock-in thermography, thereby providing defect identification. This filtering can account for the number of pixels of the infrared camera in a scanning direction. For the case of optical modulation, a dark field region can be provided for the field of view throughout the moving, thereby providing an improved signal-to-noise ratio during filtering. Localized defects can be repaired by a laser integrated into the detection system or marked by ink for later repair in the production line.

Abstract translation: 为了提高检查吞吐量，红外摄像机的视野可以以恒定的速度移动到样品上。 在整个移动过程中，可以向样品提供调制，并可以使用红外摄像机捕获红外图像。 可以同步移动视野，提供调制和捕获红外图像。 可以对红外图像进行滤波以产生延时锁定热成像，从而提供缺陷识别。 该过滤可以解释红外摄像机在扫描方向上的像素数。 对于光调制的情况，可以在整个移动期间为视场提供暗场区域，从而在滤波期间提供改善的信噪比。 局部缺陷可以通过集成到检测系统中的激光器或由墨水标记来修复，以便在生产线中进行后续修复。

公开(公告)号：WO2010104799A3

公开(公告)日：2011-01-27

申请号：PCT/US2010026557

申请日：2010-03-08

Applicant: KLA TENCOR CORP ,  LEVY ADY ,  NGAI SAMUEL ,  BEVIS CHRISTOPHER F ,  CONCINA STEFANO ,  FIELDEN JOHN ,  MIEHER WALTER ,  MUELLER DIETER ,  RICHARDSON NEIL ,  WACK DAN ,  WAGNER LARRY

Inventor： LEVY ADY ,  NGAI SAMUEL ,  BEVIS CHRISTOPHER F ,  CONCINA STEFANO ,  FIELDEN JOHN ,  MIEHER WALTER ,  MUELLER DIETER ,  RICHARDSON NEIL ,  WACK DAN ,  WAGNER LARRY

IPC: H01L21/66

CPC classification number: G01N21/9505 ,  G01N21/3581 ,  H01L22/12

Abstract: Systems and methods for determining one or more characteristics of a specimen using radiation in the terahertz range are provided. One system includes an illumination subsystem configured to illuminate the specimen with radiation. The system also includes a detection subsystem configured to detect radiation propagating from the specimen in response to illumination of the specimen and to generate output responsive to the detected radiation. The detected radiation includes radiation in the terahertz range. In addition, the system includes a processor configured to determine the one or more characteristics of the specimen using the output.

Abstract translation: 提供了使用太赫兹范围内的辐射来确定样本的一个或多个特征的系统和方法。 一个系统包括被配置为用辐射照射样本的照明子系统。 该系统还包括检测子系统，该检测子系统被配置为响应于样本的照射来检测从样本传播的辐射，并响应于检测到的辐射产生输出。 检测到的辐射包括太赫兹范围内的辐射。 另外，该系统包括配置成使用该输出来确定样本的一个或多个特性的处理器。

公开(公告)号：WO03054475A2

公开(公告)日：2003-07-03

申请号：PCT/US0241151

申请日：2002-12-19

Applicant: KLA TENCOR CORP

Inventor： SHCHEGROV ANDREI V ,  FABRIKANT ANATOLY ,  NIKOONAHAD MEHRDAD ,  LEVY ADY ,  WACK DANIEL C ,  BAREKET NOAH ,  MIEHER WALTER ,  DZIURA TED

IPC: G01N21/21 ,  G01N21/47 ,  G01N21/95 ,  G01N21/956 ,  G03F7/20 ,  G01B11/06 ,  G01B11/24 ,  G01B11/30 ,  H01L21/66

CPC classification number: G03F7/70616 ,  G01N21/211 ,  G01N21/47 ,  G01N21/4788 ,  G01N21/9501 ,  G01N21/956 ,  G01N21/95607 ,  G01N2021/213 ,  G03F7/70625 ,  G03F7/70641

Abstract: A gallery of seed profiles is constructed and the initial parameter values associated with the profiles are selected using manufacturing process knowledge of semiconductor devices. Manufacturing process knowledge may also be used to select the best seed profile and the best set of initial parameter values as the starting point of an optimization process whereby data associated with parameter values of the profile predicted by a model is compared to measured data in order to arrive at values of the parameters. Film layers over or under the periodic structure may also be taken into account. Different radiation parameters such as the reflectivities Rs, Rp and ellipsometric parameters may be used in measuring the diffracting structures and the associated films. Some of the radiation parameters may be more sensitive to a change in the parameter value of the profile or of the films then other radiation parameters. One or more radiation parameters that are more sensitive to such changes may be selected in the above-described optimization process to arrive at a more accurate measurement. The above-described techniques may be supplied to a track/stepper and etcher to control the lithographic and etching processes in order to compensate for any errors in the profile parameters.

Abstract translation: 构建种子轮廓的画廊，并且使用半导体器件的制造工艺知识来选择与轮廓相关联的初始参数值。 也可以使用制造过程知识来选择最佳种子轮廓和最佳初始参数值集合作为优化过程的起始点，由此将与模型预测的轮廓的参数值相关联的数据与测量数据进行比较，以便 达到参数的值。 也可以考虑在周期性结构之上或之下的膜层。 可以使用诸如反射率Rs，Rp和椭偏参数的不同辐射参数来测量衍射结构和相关膜。 一些辐射参数可能对轮廓或膜的参数值的变化对其他辐射参数更敏感。 可以在上述优化过程中选择对这种变化更敏感的一个或多个辐射参数，以获得更准确的测量。 可以将上述技术提供给轨道/步进器和蚀刻器以控制光刻和蚀刻工艺，以便补偿轮廓参数中的任何误差。

公开(公告)号：WO03001297A3

公开(公告)日：2003-03-20

申请号：PCT/US0220876

申请日：2002-06-26

Applicant: KLA TENCOR CORP

Inventor： MIEHER WALTER DEAN ,  DZIURA THADDEUS GERARD ,  LEVY ADY ,  MACK CHRIS

IPC: G03F7/20 ,  G01B11/24 ,  G02B7/04 ,  G03B27/34 ,  G03B27/52

CPC classification number: G03F7/70491 ,  G03F7/706 ,  G03F7/70625 ,  G03F7/70641

Abstract: The invention relates to a method for determining process parameter settings of a photolithographic system. The method includes correlating the values of a first set of one or more shape parametres (12) with the values of a first set of one or more process parameters. The method also includes determining the values of a second set of one or more shape parameters associated with one or more structures (14). The method further includes determining the values of a second set of one or more process parameters associated with forming the one or more structures by comparing the second set of one or more shape parameters with the correlated dependencies (16).

Abstract translation: 本发明涉及一种用于确定光刻系统的过程参数设置的方法。 该方法包括将第一组一个或多个形状参数（12）的值与第一组一个或多个工艺参数的值相关。 该方法还包括确定与一个或多个结构（14）相关联的第二组一个或多个形状参数的值。 该方法还包括通过将第二组一个或多个形状参数与相关依赖性（16）进行比较来确定与形成一个或多个结构相关联的第二组一个或多个工艺参数的值。