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    NON-AQUEOUS SILOXANE SOLVENT COMPOSITIONS
    1.
    发明申请
    NON-AQUEOUS SILOXANE SOLVENT COMPOSITIONS 审中-公开
    非水性硅氧烷溶剂组合物

    公开(公告)号：WO2017146778A1

    公开(公告)日：2017-08-31

    申请号：PCT/US2016/059257

    申请日：2016-10-28

    Applicant: THE UNITED STATES OF AMERICA AS REPRESENTED BY THE SECRETARY OF THE NAVY

    Inventor： ARAFAT, EI Sayad

    IPC: C11D7/50 ,  C11D7/26

    CPC classification number: C11D3/162 ,  C11D3/43 ,  C11D7/5009 ,  C23G5/032

    Abstract: This invention relates to non aqueous non-volatile alkylated siloxane compositions having low VOC and vapor pressure of about 31 millimeters of mercury at 20°C. consisting essentially of a mixture of a linear or open-chain methyl alkylated siloxane having two silicon atoms and a siloxane having three silicon atoms alkylated with methyl groups.

    Abstract translation: 本发明涉及20℃下具有约31毫米汞柱的低VOC和蒸汽压的非水性非挥发性烷基化硅氧烷组合物。 基本上由具有两个硅原子的直链或开链甲基烷基化硅氧烷和具有三个用甲基烷基化的硅原子的硅氧烷的混合物组成。

    METHOD AND APPARATUS FOR REMOVING CONTAMINANTS FROM SUBSTRATE
    6.
    发明申请
    METHOD AND APPARATUS FOR REMOVING CONTAMINANTS FROM SUBSTRATE 审中-公开
    从基材中除去污染物的方法和装置

    公开(公告)号：WO2009079422A1

    公开(公告)日：2009-06-25

    申请号：PCT/US2008/086742

    申请日：2008-12-14

    Applicant: LAM RESEARCH CORPORATION ,  ZHU, Ji ,  MENDIRATTA, Arjun ,  MUI, David

    Inventor： ZHU, Ji ,  MENDIRATTA, Arjun ,  MUI, David

    IPC: H01L21/302 ,  H01L21/304

    CPC classification number: C11D7/5009 ,  C11D3/3723 ,  C11D3/3765 ,  C11D3/3773 ,  C11D7/261 ,  C11D7/3263 ,  C11D7/34 ,  C11D11/0047 ,  H01L21/02057 ,  H01L21/67051 ,  Y10S134/902

    Abstract: A cleaning material is applied to a surface of a substrate. The cleaning material includes one or more polymeric materials for entrapping contaminants present on the surface of the substrate. A rinsing fluid is applied to the surface of the substrate at a controlled velocity to effect removal of the cleaning material and contaminants entrapped within the cleaning material from the surface of the substrate. The controlled velocity of the rinsing fluid is set to cause the cleaning material to behave in an elastic manner when impacted by the rinsing fluid, thereby improving contaminant removal from the surface of the substrate.

    Abstract translation: 将清洁材料施加到基板的表面。 清洁材料包括用于捕获存在于基底表面上的污染物的一种或多种聚合物材料。 冲洗流体以受控的速度施加到基底的表面，以从衬底的表面去除被清除材料和被污染的清洁材料中的污染物。 洗涤流体的受控速度被设定为使得清洁材料在被冲洗流体冲击时以弹性方式表现，从而改善从基材表面去除污染物质。

    APPARATUS FOR PARTICLE REMOVAL BY SINGLE-PHASE AND TWO-PHASE MEDIA
    7.
    发明申请
    APPARATUS FOR PARTICLE REMOVAL BY SINGLE-PHASE AND TWO-PHASE MEDIA 审中-公开
    用于单相和两相介质去除颗粒的装置

    公开(公告)号：WO2009078969A1

    公开(公告)日：2009-06-25

    申请号：PCT/US2008/013697

    申请日：2008-12-12

    Applicant: LAM RESEARCH CORPORATION ,  MUI, David, S., L. ,  SRINIVASAN, Satish ,  PENG, Grant ,  ZHU, Ji ,  KON, Shih-Chung ,  PODLESNIK, Dragan ,  MENDIRATTA, Arjun

    Inventor： MUI, David, S., L. ,  SRINIVASAN, Satish ,  PENG, Grant ,  ZHU, Ji ,  KON, Shih-Chung ,  PODLESNIK, Dragan ,  MENDIRATTA, Arjun

    IPC: H01L21/302 ,  H01L21/304

    CPC classification number: C11D7/5009 ,  C11D3/3723 ,  C11D3/3765 ,  C11D3/3773 ,  C11D7/261 ,  C11D7/3263 ,  C11D7/34 ,  C11D11/0047 ,  H01L21/02057 ,  H01L21/67051 ,  Y10S134/902

    Abstract: The embodiments of the present invention provide apparatus for cleaning patterned substrates with fine features with cleaning materials. The apparatus using the cleaning materials has advantages in cleaning patterned substrates with fine features without substantially damaging the features. The cleaning materials are fluid, either in liquid phase, or in liquid/gas phase, and deform around device features; therefore, the cleaning materials do not substantially damage the device features or reduce damage all together. The cleaning materials containing polymers of a polymeric compound with large molecular weight capture the contaminants on the substrate. In addition, the cleaning materials entrap the contaminants and do not return the contaminants to the substrate surface. The polymers of one or more polymeric compounds with large molecular weight form long polymer chains, which can also be cross-linked to form a network (or polymeric network). The long polymer chains and/or polymer network show superior capabilities of capturing and entrapping contaminants, in comparison to conventional cleaning materials.

    Abstract translation: 本发明的实施例提供了用清洁材料清洁具有精细特征的图案化衬底的设备。 使用清洁材料的设备具有清洁具有精细特征的图案化基材而不会显着损害特征的优点。 清洁材料是流体，液相或液相/气相，并围绕装置特征变形; 因此，清洁材料基本上不会损坏设备特征或将损伤全部降低在一起。 包含具有大分子量的聚合物的聚合物的清洁材料捕获基底上的污染物。 此外，清洁材料夹带污染物并且不会将污染物返回到基底表面。 一种或多种具有大分子量的聚合物的聚合物形成长的聚合物链，其也可以交联以形成网络（或聚合物网络）。 与传统清洁材料相比，长的聚合物链和/或聚合物网络显示出捕获和捕获污染物的优异性能。

    IMPROVED METAL CONSERVATION WITH STRIPPER SOLUTIONS CONTAINING RESORCINOL
    8.
    发明申请
    IMPROVED METAL CONSERVATION WITH STRIPPER SOLUTIONS CONTAINING RESORCINOL 审中-公开
    改进含有RESORCINOL的剥离溶液的金属保护

    公开(公告)号：WO2009023675A3

    公开(公告)日：2009-04-16

    申请号：PCT/US2008072923

    申请日：2008-08-12

    Applicant: DYNALOY LLC ,  ATKINSON JOHN M ,  POLLARD KIMBERLY DONA

    Inventor： ATKINSON JOHN M ,  POLLARD KIMBERLY DONA

    IPC: C11D3/33 ,  C11D3/20 ,  C11D7/32 ,  H01L21/302

    CPC classification number: G03F7/422 ,  C11D7/10 ,  C11D7/261 ,  C11D7/3209 ,  C11D7/3218 ,  C11D7/5009 ,  C11D11/0047 ,  G03F7/425 ,  G03F7/426 ,  H01L21/02071 ,  H01L21/30604 ,  H01L21/31133

    Abstract: Resist stripping agents useful for fabricating circuits and/or forming electrodes on semiconductor devices for semiconductor integrated circuits and/or liquid crystals with reduced metal and metal alloy etch rates (particularly copper etch rates and TiW etch rates), are provided with methods for their use. The preferred stripping agents contain low concentrations of resorcinol or a resorcinol derivative, with or without an added copper salt, and with or without an added amine to improve solubility of the copper salt. Further provided are integrated circuit devices and electronic interconnect structures prepared according to these methods.

    Abstract translation: 提供用于在具有降低的金属和金属合金蚀刻速率（特别是铜蚀刻速率和TiW蚀刻速率）的半导体集成电路和/或液晶的半导体器件上制造电路和/或形成电极的抗蚀剂剥离剂，以及它们的使用方法 。 优选的汽提剂含有低浓度的间苯二酚或间苯二酚衍生物，添加或不添加铜盐，并添加或不添加胺以提高铜盐的溶解度。 还提供了根据这些方法制备的集成电路器件和电子互连结构。

    CLEANING COMPOSITIONS FOR MICROELECTRONICS SUBSTRATES
    9.
    发明申请
    CLEANING COMPOSITIONS FOR MICROELECTRONICS SUBSTRATES 审中-公开
    微电子基板清洁组合物

    公开(公告)号：WO2006023061A1

    公开(公告)日：2006-03-02

    申请号：PCT/US2005/022598

    申请日：2005-06-23

    Applicant: MALLINCKRODT BAKER, INC. ,  KANE, Sean, M.

    Inventor： KANE, Sean, M.

    IPC: C11D11/00

    CPC classification number: G03F7/426 ,  C11D3/2058 ,  C11D3/2068 ,  C11D3/2075 ,  C11D3/30 ,  C11D3/43 ,  C11D7/263 ,  C11D7/265 ,  C11D7/3218 ,  C11D7/3227 ,  C11D7/5009 ,  C11D7/5013 ,  C11D11/0047 ,  G03F7/425 ,  H05K3/26

    Abstract: A stripping and cleaning composition for cleaning microelectronics substrates, the composition comprising: at least one organic stripping solvent, at least one nucleophilic amine, at least one non-nitrogen containing weak acid in an amount sufficient to neutralize from about 3% to about 75% by weight of the nucleophilic amine such that the stripping composition has an aqueous pH of from about 9.6 to about 10.9, said weak acid having a pK value in aqueous solution of 2.0 or greater and an equivalent weight of less than 140, at least one metal-removing compound selected from the group consisting of diethylene glycol and diethylene glycolamine, and water, and method for cleaning microelectronic substrates with these compositions.

    Abstract translation: 一种用于清洁微电子学基底的剥离和清洁组合物，所述组合物包含：至少一种有机剥离溶剂，至少一种亲核胺，至少一种非含氮的弱酸，其量足以中和约3％至约75％ 的亲核胺，使得汽提组合物的水溶液pH为约9.6至约10.9，所述弱酸在水溶液中的pK值为2.0或更大，当量重量小于140，至少一种金属 - 选自二甘醇和二乙二醇胺和水的去除化合物，以及用这些组合物清洗微电子基底的方法。

    DEGREASING COMPOSITIONS
    10.
    发明申请
    DEGREASING COMPOSITIONS 审中-公开
    卸料组合物

    公开(公告)号：WO02018502A2

    公开(公告)日：2002-03-07

    申请号：PCT/US2001/027052

    申请日：2001-08-30

    IPC: C09D9/00 ,  C11D3/20 ,  C11D3/39 ,  C11D3/43 ,  C11D7/26 ,  C11D7/34 ,  C11D7/50

    CPC classification number: C09D9/00 ,  C09D9/005 ,  C11D3/2093 ,  C11D3/3947 ,  C11D3/43 ,  C11D7/263 ,  C11D7/264 ,  C11D7/266 ,  C11D7/34 ,  C11D7/5009

    Abstract: A composition useful as a paint remover which includes a carbonate, a dibasic ester and a mono-ester. The paint stripping composition may also contain an organic sulfur-containing compound such as dimethyl sulfoxide (DMSO), a glycol ether, a ketone, or combination thereof. The composition may be used in a process for removing paint by applying it to a painted surface. A degreasing composition is also disclosed which comprises a carbonate and an alkyl-substituted cyclo-alkane such as naphthene. The compositions have several important attributes, including low toxicity and high efficacy in removing paint and coatings.

    Abstract translation: 可用作除漆剂的组合物，其包括碳酸酯，二元酯和单酯。 涂料剥离组合物还可以含有有机含硫化合物如二甲基亚砜（DMSO），二醇醚，酮或其组合。 该组合物可以用于通过将其施涂到涂漆表面上去除涂料的方法中。 还公开了一种脱脂组合物，其包含碳酸酯和烷基取代的环烷烃如环烷烃。 该组合物具有几个重要的特性，包括低毒性和高效去除油漆和涂料。

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