Abstract:
A projector including a light source apparatus that includes a fluorescent layer that produces fluorescence by irradiation of an excitation light emitted from a solid-state light source, a polarization conversion element that converts the light from the light source apparatus into polarized light, and a reflector that is disposed between the light source apparatus and the polarization conversion element, transmits light in the vicinity of the optical axis of the light source apparatus, and reflects peripheral light apart from the optical axis of the light source apparatus toward the fluorescent layer.
Abstract:
The invention relates to an illumination system of a microlithographic projection exposure apparatus comprising a depolariser (10, 500-900) which in conjunction with a light mixing system disposed downstream in the light propagation direction at least partially causes effective depolarisation of polarised light impinging on the depolariser (10, 500-900) and a microlens array (20) which is arranged upstream of the light mixing system in the light propagation direction and in which a plurality of microlenses (20a, 20b,... ) are arranged with a periodicity, wherein the depolariser (10, 500-900) is such that a contribution afforded by interaction of the depolariser (10, 500-900) on the one hand with the periodicity of the microlens array (20) on the other hand, to a residual polarisation distribution occurring in a pupil plane (PP) arranged downstream of the microlens array (20) in the light propagation direction has a maximum degree of polarisation of not more than 5%.
Abstract:
A transflective optical film reflects ambient light incident on the first surface and transmits light having a preferred polarization state incident on the opposite surface. The film has a substrate wherein a plurality of tapered cavities extends from a first surface of the substrate toward an opposite surface, the tapered cavities narrowing toward the opposite surface, and a filler material deposited within each the tapered cavity. A reflective layer is deposited on the filler material in each tapered cavity, along the first surface of the substrate. At least one of the substrate and the filler material is birefringet such that for a preferred polarization state, the refractive index of the filler is substantially lower than the refractive index of the filler is substantially lower than the refractive index of the substrate and that, for the polarization state orthogonal to the preferred polarization state, the refractive index of the filler is substantially the same as the refractive index of the substrate.
Abstract:
The present solution relates to a 2D/3D data projector, which comprises: A data projector, the data projector comprising: at least one micro display having an image to be projected, at least one source unit comprising at least one light source chip, said source unit further comprising at least one beam forming component, said at least one beam forming component comprising a plurality of surfaces disposed in a three dimensional configuration, at least one of said plurality of surfaces comprising micro-structure optics, and a focusing optical unit for projecting the image of the micro display on a target.
Abstract:
An illumination engine for a projection display using a tapered light pipe(718) including a reflector having first and second focal points. A source of electro-magnetic radiation disposed proximate to the first focal point of the reflector emits rays of radiation that reflect from the reflector toward the second focal point. A tapered light pipe(718) collects and transmits substantially all of the radiation converged at the second focal point(722), adjusting the numerical aperture of the radiation, but curving the surface formed by the images of the radiation. A straight light pipe(724) or a lens collects and transmits substantially all of the radiation transmitted by the tapered light pipe , flattening the surface formed by the images of the radiation. A condenser lens(707) collects and transmits all of the radiation transmitted by the contoured delay element to a polarizing beam splitter(740) and a projection system (738).