CONTROLLED DOPING OF SEMICONDUCTOR NANOWIRES
    6.
    发明申请
    CONTROLLED DOPING OF SEMICONDUCTOR NANOWIRES 审中-公开
    半导体纳米管的控制掺杂

    公开(公告)号:WO2009055181A1

    公开(公告)日:2009-04-30

    申请号:PCT/US2008/077419

    申请日:2008-09-24

    Abstract: A catalyst particle on a substrate is exposed to reactants containing a semiconductor material in a reactor. An intrinsic semiconductor nanowire having constant lateral dimensions is grown at a low enough temperature so that pyrolysis of the reactant is suppressed on the sidewalls of the intrinsic semiconductor nanowire. Once the intrinsic semiconductor nanowire grows to a desired length, the temperature of the reactor is raised to enable pyrolysis on the sidewalls of the semiconductor nanowire, and thereafter dopants are supplied into the reactor with the reactant. A composite semiconductor nanowire having an intrinsic inner semiconductor nanowire and a doped semiconductor shell is formed. The catalyst particle is removed, followed by an anneal that distributes the dopants uniformly within the volume of the composite semiconductor nanowire, forming a semiconductor nanowire having constant lateral dimensions and a substantially uniform doping.

    Abstract translation: 在反应器中将基材上的催化剂颗粒暴露于含有半导体材料的反应物。 具有恒定横向尺寸的本征半导体纳米线在足够低的温度下生长,使得反应物的热解被抑制在本征半导体纳米线的侧壁上。 一旦本征半导体纳米线生长到期望的长度,则升高反应器的温度以使得能够在半导体纳米线的侧壁上进行热解,然后将掺杂剂与反应物一起供入反应器中。 形成具有本征内半导体纳米线和掺杂半导体外壳的复合半导体纳米线。 除去催化剂颗粒,然后进行退火,将掺杂剂均匀地分布在复合半导体纳米线的体积内,形成具有恒定横向尺寸和基本均匀掺杂的半导体纳米线。

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