公开(公告)号：WO2022051119A1

公开(公告)日：2022-03-10

申请号：PCT/US2021/047022

申请日：2021-08-20

Applicant: APPLIED MATERIALS ISREAL LTD. ,  APPLIED MATERIALS, INC.

Inventor： ZUR, Yehuda

IPC: H01J37/21 ,  H01J37/20 ,  H01J37/244 ,  H01J37/305 ,  H01L21/66 ,  G01B15/02 ,  G01N2223/6116 ,  G01N23/2258 ,  H01J2237/30466 ,  H01J2237/3174 ,  H01J2237/31749 ,  H01J37/3005 ,  H01J37/3026 ,  H01J37/31 ,  H01L22/26

Abstract: A method of evaluating a region of a sample that includes a first sub-region and a second sub-region, adjacent to the first sub-region, the region comprising a plurality of sets of vertically-stacked double-layers extending through both the first and second sub-regions with a geometry or orientation of the vertically-stacked double layers in the first sub-region being different than a geometry or orientation of the vertically-stacked double layers in the second region resulting in the first sub-region having a first milling rate and the second sub-region having a second milling rate different than the first milling rate, the method including: milling the region of a sample by scanning a focused ion beam over the region a plurality of iterations in which, for each iteration, the focused ion beam is scanned over the first sub-region and the second sub-region generating secondary electrons and secondary ions from each of the first and second sub-regions; detecting, during the milling, at least one of the generated secondary electrons or the secondary ions; generating, in real-time, an endpoint detection signal from the at least one of detected secondary electrons or secondary ions, the endpoint detection signal including a fast oscillating signal having a first frequency and a slow oscillating signal having a second frequency, slower than the first frequency; analyzing the fast and slow oscillating signals to determine original first and second frequencies of the fast and slow oscillating signals; and estimating, in real-time, a depth of each of the first and second sub-regions based on the determined first and second frequencies.

公开(公告)号：WO2022005753A1

公开(公告)日：2022-01-06

申请号：PCT/US2021/037669

申请日：2021-06-16

Applicant: APPLIED MATERIALS ISREAL LTD. ,  APPLIED MATERIALS, INC.

Inventor： ZUR, Yehuda

IPC: G01N23/225 ,  G01N23/18 ,  G01N23/2202 ,  H01L21/66 ,  H01J37/305 ,  H01J37/21 ,  H01J37/3005 ,  H01J37/31

Abstract: A method of evaluating a region of a sample that includes two or more sub-regions adjacent to each other that have different milling rates. The method can include: scanning a focused ion beam over the region during a single scan frame such that the ion beam is scanned over a first sub-region of the region having a first milling rate at a first scan rate and then scanned over a second sub-region of the region having a second milling rate at a second scan rate, where the second milling rate is faster than the first milling rate and second scan rate is faster than the first scan rate; and repeating the scanning process a plurality of times to etch the region to a desired depth

公开(公告)号：WO2009026340A2

公开(公告)日：2009-02-26

申请号：PCT/US2008/073674

申请日：2008-08-20

Applicant: VARIAN SEMICONDUCTOR EQUIPMENT ASSOCIATES, INC. ,  TEKLETSADIK, Kasegn, D. ,  KRAUSE, Stephen, E. ,  HERMANSON, Eric, D. ,  LOW, Russell, J.

Inventor： TEKLETSADIK, Kasegn, D. ,  KRAUSE, Stephen, E. ,  HERMANSON, Eric, D. ,  LOW, Russell, J.

IPC: H01B17/56 ,  H01J37/31

CPC classification number: H01J37/3171 ,  H01J37/09 ,  H01J2237/2001 ,  H01J2237/26

Abstract: Insulated conducting devices and related methods are disclosed. An insulated conducting device for a voltage structure comprises: a conductor connected to a voltage; and multiple insulation segments enclosing the conductor, the multiple insulation segments interfacing with one another.

Abstract translation: 公开了绝缘导电装置和相关方法。 一种用于电压结构的绝缘导电装置，包括：连接到电压的导体; 以及包围导体的多个绝缘段，多个绝缘段彼此连接。

公开(公告)号：WO2013143531A1

公开(公告)日：2013-10-03

申请号：PCT/DE2013/100091

申请日：2013-03-11

Applicant: RWTH AACHEN KÖRPERSCHAFT DES ÖFFENTLICHEN RECHTS ,  AIXACCT SYSTEMS GMBH

Inventor： REISGEN, Uwe ,  DE VRIES, Jens ,  BACKHAUS, Alexander ,  BAUER, Hans-Peter ,  UFER, Sebastian ,  REICHENBERG, Bernd ,  SCHMITZ-KEMPEN, Thorsten

IPC: B23K15/00 ,  G01T1/29 ,  H01J37/244 ,  H01J37/31

CPC classification number: G01R19/0061 ,  B23K15/0013 ,  B23K15/0026 ,  G21K1/04 ,  H01J37/244 ,  H01J37/3007 ,  H01J37/3053 ,  H01J37/31 ,  H01J37/315 ,  H01J2237/24514 ,  H01J2237/24542 ,  H01J2237/303

Abstract: Diese Anmeldung betrifft ein Verfahren zur Ermittlung von Strahlparametern eines Ladungsträgerstrahls, eine Messeinrichtung sowie eine Ladungsträgerstrahlvorrichtung. Der Ladungsträgerstrahl (4) einer Ladungsträgerstrahlvorrichtung (1) wird mittels einer Strahlablenkeinheit (3) über eine in einer Blendenvorrichtung (7) vorgesehene Schlitzblendenanordnung mit einer oder mehreren Schlitzblenden (8) geführt. Von den durch die Schlitzblendenanordnung hindurch getretenen Strahlanteilen werden Messebenen-Koordinaten erfasst. Anhand der Messebenen-Koordinaten wird die Blendenvorrichtung automatisch so verfahren, dass eine in der Blendenvorrichtung angeordnete Messblende (9) über einen vorgegebenen Messreferenzpunkt verfahren wird. Die Strahlparametermessung erfolgt mittels der Messblende. Bei einer für das Verfahren geeigneten Messeinrichtung (5) weist die Schlitzblendenanordnung mindestens zwei zueinander nicht parallele Schlitzblendenabschnitte (12, 13, 15, 16) auf, die zu einer einzelnen durchgehenden Schlitzblende gehören können.

Abstract translation: 本申请涉及一种用于确定带电粒子束，一个测量装置和一个带电粒子射线装置的射束参数的方法。 带电粒子束装置（1）的带电粒子束（4）被光束偏转单元（3）通过在快门装置被引导（7）提供具有一个或多个狭缝孔槽孔径装置（8）。 通过穿过狭缝光阑布置输入光束部分测量平面坐标可以被检测到。 使得隔膜装置被布置在孔板光圈装置自动地移动（9）上移动，基于测量的平面坐标的预定测定基准点。 束参数由计量孔的装置测量的。 在一个适用于该方法的测量装置（5），槽孔径装置包括可以属于单个连续的狭缝的至少两个相互非平行的狭缝光阑部（12，13，15，16）。

公开(公告)号：WO1990014684A1

公开(公告)日：1990-11-29

申请号：PCT/GB1990000784

申请日：1990-05-18

Applicant: HUMPHREYS, Colin, John ,  DEVENISH, Robert, Walter ,  BULLOUGH, Timothy, John

IPC: H01J37/31

CPC classification number: B23K15/085 ,  B01D29/012 ,  B01D67/0032 ,  B01D71/021 ,  B01D71/028 ,  B01D2323/34 ,  B01D2325/08 ,  B01J37/341

Abstract: A method of preparation of microprofiled substrates comprises removing an array of atoms by bombardment with a narrow beam of electrons.

公开(公告)号：WO2022174187A2

公开(公告)日：2022-08-18

申请号：PCT/US2022/016448

申请日：2022-02-15

Applicant: E.A. FISCHIONE INSTRUMENTS, INC.

Inventor： FISCHIONE, Paul, E. ,  MATESA, Joseph, M. ,  LIU, Junhai ,  BOCCABELLA, Michael, F.

IPC: H01J37/30 ,  H01J37/08 ,  H01J37/20 ,  H01J37/244 ,  H01J37/22 ,  H01J37/305 ,  H01J37/18 ,  H01J2237/2001 ,  H01J2237/20214 ,  H01J2237/20221 ,  H01J37/147 ,  H01J37/31

Abstract: A system and method for the precise and uniform material removal or delayering of a large area of a sample is provided. The size of the milled area is controllable, ranging from sub-millimeter to multi-millimeter scale and the depth resolution is controllable on the nanometer scale. A controlled singularly charged ion beam is scanned across the sample surface in such a manner to normalize the ion density distribution from the sample center toward the periphery to realize uniform delayering.

公开(公告)号：WO2011026607A3

公开(公告)日：2011-06-23

申请号：PCT/EP2010005350

申请日：2010-08-31

Applicant: GLOBAL BEAM TECHNOLOGIES AG ,  VOKURKA FRANZ

Inventor： VOKURKA FRANZ

IPC: H01J37/16 ,  B23K15/00 ,  B23K15/06 ,  G21K5/10 ,  H01J37/30 ,  H01J37/31

CPC classification number: H01J37/16 ,  B23K15/002 ,  B23K15/06 ,  H01J37/30 ,  H01J2237/0245 ,  H01J2237/166

Abstract: The invention relates to a particle beam processing device having a particle beam generator (7), and a vacuum chamber (101) comprising a chamber volume (V) that can be evacuated, wherein the vacuum chamber (101) has a chamber wall (1) with a first opening which is formed in the chamber wall (1). Said device also has a first cover (2) which is designed to cover the first opening (O1) and be rotated about a first rotational axis extending through the first opening, and a second opening which is formed in the first cover (2). Said device also has a second cover (3) which is designed to cover the second opening, be rotated about a second rotational axis extending through the second opening, and move the particle beam generator (7). The particle beam generator (7) can be displaced in a first direction (Z) within the chamber volume (V) that can be evacuated.

Abstract translation: 本发明提供一种Teilchenstrahlbearbeitungsvorrichtung其中带电粒子束（7），具有可抽真空的腔室容积（V）的真空室（101），其中，具有与在所述腔室壁上形成的第一开口的腔室的壁的真空室（101），第一 盖（2），其适合于覆盖所述第一开口和围绕旋转的第一轴旋转通过第一开口和与在所述第一盖的第二开口（2）形成的，其包括， 并且其适于覆盖所述第二开口和围绕旋转的第二轴的第二盖（3）被旋转和带电粒子束（7）移动穿过第二开口，该开口。 在抽空室体积（V）可在第一方向（Z）的带电粒子束（7）。

公开(公告)号：WO2009002736A2

公开(公告)日：2008-12-31

申请号：PCT/US2008066923

申请日：2008-06-13

Applicant: VARIAN SEMICONDUCTOR EQUIPMENT ,  CHANG SHENGWU ,  SINCLAIR FRANK

Inventor： CHANG SHENGWU ,  SINCLAIR FRANK

IPC: H01J23/10 ,  H01J37/31

CPC classification number: H01B17/64

Abstract: A high voltage insulator for preventing instability in an ion implanter due to triple junction breakdown is described. In one embodiment, there is an apparatus for preventing triple junction instability in an ion implanter. In this embodiment, there is a first metal electrode and a second metal electrode. An insulator is disposed between the first metal electrode and the second metal electrode. The insulator has at least one surface between the first metal electrode and the second metal electrode that is exposed to a vacuum that transports an ion beam generated by the ion implanter. A first conductive layer is located between the first metal electrode and the insulator. The first conductive layer prevents triple junction breakdown from occurring at an interface of the first electrode, insulator and vacuum. A second conductive layer is located between the second metal electrode and the insulator opposite the first conductive layer. The second conductive layer prevents triple junction breakdown from occurring at an interface of the second electrode, insulator and vacuum.

Abstract translation: 描述了一种用于防止由于三结击穿引起的离子注入机不稳定性的高压绝缘体。 在一个实施例中，存在用于防止离子注入机中的三重连接不稳定性的装置。 在本实施例中，存在第一金属电极和第二金属电极。 绝缘体设置在第一金属电极和第二金属电极之间。 绝缘体具有在第一金属电极和第二金属电极之间的至少一个表面，其暴露于输送由离子注入机产生的离子束的真空。 第一导电层位于第一金属电极和绝缘体之间。 第一导电层防止在第一电极，绝缘体和真空的界面处发生三结击穿。 第二导电层位于第二金属电极和与第一导电层相对的绝缘体之间。 第二导电层防止在第二电极，绝缘体和真空的界面处发生三结击穿。

公开(公告)号：WO2006103828A8

公开(公告)日：2008-01-24

申请号：PCT/JP2006301812

申请日：2006-01-27

Applicant: SHOWA DENKO KK ,  OSAWA HIROSHI ,  KUROKAWA GOHEI

Inventor： OSAWA HIROSHI ,  KUROKAWA GOHEI

IPC: G11B5/84 ,  G11B5/725 ,  H01J37/31 ,  H01J37/32 ,  H05H1/24

CPC classification number: H01J37/32825 ,  G11B5/7325 ,  G11B5/8408

Abstract: The present invention provides a magnetic recording medium having superior startup operation and durability as well as satisfactory surface lubricity. The present invention relates to a method of manufacturing a magnetic recording medium in which at least a magnetic layer, a protective film layer and a lubricant layer are sequentially laminated on a non-magnetic substrate, wherein the lubricant layer is surface treated using a gas activated by plasma generated at a pressure in the vicinity of atmospheric pressure. The present invention also relates to a magnetic recording medium produced according to the aforementioned manufacturing method.

Abstract translation: 本发明提供了具有优异的起动操作和耐久性以及令人满意的表面润滑性的磁记录介质。 本发明涉及一种制造磁记录介质的方法，其中至少将磁性层，保护膜层和润滑剂层依次层压在非磁性基板上，其中使用气体活化来润滑层进行表面处理 通过在大气压附近的压力下产生的等离子体。 本发明还涉及根据上述制造方法制造的磁记录介质。

公开(公告)号：WO2006103828A1

公开(公告)日：2006-10-05

申请号：PCT/JP2006/301812

申请日：2006-01-27

Applicant: SHOWA DENKO K.K. ,  OSAWA, Hiroshi ,  KUROKAWA, Gohei

Inventor： OSAWA, Hiroshi ,  KUROKAWA, Gohei

IPC: G11B5/84 ,  G11B5/725 ,  H01J37/31 ,  H05H1/24 ,  H01J37/32

CPC classification number: H01J37/32825 ,  G11B5/7325 ,  G11B5/8408

Abstract: The present invention provides a magnetic recording medium having superior startup operation and durability as well as satisfactory surface lubricity. The present invention relates to a method of manufacturing a magnetic recording medium in which at least a magnetic layer, a protective film layer and a lubricant layer are sequentially laminated on a non-magnetic substrate, wherein the lubricant layer is surface treated using a gas activated by plasma generated at a pressure in the vicinity of atmospheric pressure. The present invention also relates to a magnetic recording medium produced according to the aforementioned manufacturing method.

Abstract translation: 本发明提供了具有优异的启动操作和耐久性以及令人满意的表面润滑性的磁记录介质。 本发明涉及一种磁性记录介质的制造方法，其中在非磁性基板上至少依次层叠有磁性层，保护膜层和润滑剂层，其中润滑剂层使用气体活化 通过在大气压附近的压力下产生的等离子体。 本发明还涉及根据上述制造方法制造的磁记录介质。