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1.
公开(公告)号:WO2022209029A1
公开(公告)日:2022-10-06
申请号:PCT/JP2021/045431
申请日:2021-12-03
IPC分类号: H01L21/607 , H01L23/49 , B23K20/00 , B23K20/004 , H01L2224/04042 , H01L2224/05014 , H01L2224/05015 , H01L2224/056 , H01L2224/45014 , H01L2224/45015 , H01L2224/45124 , H01L2224/45147 , H01L2224/48227 , H01L2224/48247 , H01L2224/48458 , H01L2224/4851 , H01L2224/78315 , H01L2224/78901 , H01L2224/85205 , H01L2224/8593 , H01L2224/85947 , H01L2224/85948 , H01L24/05 , H01L24/45 , H01L24/48 , H01L24/85
摘要: The invention relates to producing a semiconductor chip-metal wire bond, by performing the steps of bonding a wire having a metal body to the semiconductor chip so as to connect the wire to the semiconductor chip, the bond metal having a polycrystalline microstructure, and deforming a bonding region of the metal body in contact with to the semiconductor chip, the deformed bonding region being characterized by a relative cross section area change given by (AA), where Af is a final cross section area and A0 is an initial cross section area, the deformation involving an increase of a dislocation density in the microstructure of at least a portion of the bonding region.
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2.
公开(公告)号:WO2022271250A1
公开(公告)日:2022-12-29
申请号:PCT/US2022/022615
申请日:2022-03-30
申请人: INTEL CORPORATION
IPC分类号: H01L23/00 , H01L25/065 , H01L25/18 , H01L2224/05014 , H01L2224/06051 , H01L2224/06132 , H01L2224/2512 , H01L24/05 , H01L24/06 , H01L24/08 , H01L24/25 , H01L25/0652
摘要: Embodiments disclosed herein include semiconductor dies with hybrid bonding layers and multi-die modules that are coupled together by hybrid bonding layers. In an embodiment, a semiconductor die comprises a die substrate, a pad layer over the die substrate, where the pad layer comprises first pads with a first dimension and a first pitch and second pads with a second dimension and a second pitch. In an embodiment, the semiconductor die further comprises a hybrid bonding layer over the pad layer. In an embodiment, the hybrid bonding layer comprises a dielectric layer, and an array of hybrid bonding pads in the dielectric layer, wherein the hybrid bonding pads comprise a third dimension and a third pitch.
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