Invention Grant
- Patent Title: Plating method, plating system and storage medium
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Application No.: US14384495Application Date: 2013-02-22
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Publication No.: US10030308B2Publication Date: 2018-07-24
- Inventor: Takashi Tanaka , Yuichiro Inatomi , Nobutaka Mizutani , Yusuke Saito , Mitsuaki Iwashita
- Applicant: Tokyo Electron Limited
- Applicant Address: JP Tokyo
- Assignee: TOKYO ELECTRON LIMITED
- Current Assignee: TOKYO ELECTRON LIMITED
- Current Assignee Address: JP Tokyo
- Agency: Pearne & Gordon LLP
- Priority: JP2012-065489 20120322
- International Application: PCT/JP2013/054504 WO 20130222
- International Announcement: WO2013/140939 WO 20130926
- Main IPC: B05D3/10
- IPC: B05D3/10 ; C23C18/16 ; C23C18/30 ; C23C18/18 ; C25D17/00 ; H01L21/768 ; H01L21/288 ; H01L23/48 ; C23C18/38

Abstract:
A plating method can improve adhesivity with an underlying layer. The plating method of performing a plating process on a substrate includes forming a first plating layer 23a serving as a barrier film on a substrate 2; baking the first plating layer 23a; forming a second plating layer 23b serving as a barrier film; and baking the second plating layer 23b. A plating layer stacked body 23 serving as a barrier film is formed of the first plating layer 23a and the second plating layer 23b.
Public/Granted literature
- US20150030774A1 PLATING METHOD, PLATING SYSTEM AND STORAGE MEDIUM Public/Granted day:2015-01-29
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