Invention Grant
- Patent Title: EUV photolithography system fuel source and methods of operating the same
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Application No.: US18366092Application Date: 2023-08-07
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Publication No.: US12235586B2Publication Date: 2025-02-25
- Inventor: Cheng-Hao Lai , Ming-Hsun Tsai , Hsin-Feng Chen , Wei-Shin Cheng , Yu-Kuang Sun , Cheng-Hsuan Wu , Yu-Fa Lo , Shih-Yu Tu , Jou-Hsuan Lu , Shang-Chieh Chien , Li-Jui Chen , Heng-Hsin Liu
- Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
- Applicant Address: TW Hsinchu
- Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
- Current Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
- Current Assignee Address: TW Hsinchu
- Agency: Seed IP Law Group LLP
- Main IPC: G03F7/00
- IPC: G03F7/00
Abstract:
Impurities in a liquefied solid fuel utilized in a droplet generator of an extreme ultraviolet photolithography system are removed from vessels containing the liquefied solid fuel. Removal of the impurities increases the stability and predictability of droplet formation which positively impacts wafer yield and droplet generator lifetime.
Public/Granted literature
- US20230375938A1 EUV PHOTOLITHOGRAPHY SYSTEM FUEL SOURCE AND METHODS OF OPERATING THE SAME Public/Granted day:2023-11-23
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