- 专利标题： POLISHING COMPOSITION AND METHOD UTILIZING ABRASIVE PARTICLES TREATED WITH AN AMINOSILANE
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申请号： US16664235申请日： 2019-10-25
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公开(公告)号： US20200056069A1公开(公告)日： 2020-02-20
- 发明人: Steven Grumbine , Shoutian Li , William Ward , Pankaj Singh , Jeffrey Dysard
- 申请人： Cabot Microelectronics Corporation
- 专利权人： Cabot Microelectronics Corporation
- 当前专利权人： Cabot Microelectronics Corporation
- 主分类号： C09G1/02
- IPC分类号： C09G1/02 ; C09K3/14 ; H01L21/3105 ; B24B37/04
摘要：
The inventive method comprises chemically-mechanically polishing a substrate with an inventive polishing composition comprising a liquid carrier and abrasive particles that have been treated with a compound.
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