发明授权
- 专利标题: Method for producing a nitride semiconductor element
- 专利标题(中): 氮化物半导体元件的制造方法
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申请号: US10614778申请日: 2003-07-09
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公开(公告)号: US06916676B2公开(公告)日: 2005-07-12
- 发明人: Masahiko Sano , Mitsuhiro Nonaka , Kazumi Kamada , Masashi Yamamoto
- 申请人: Masahiko Sano , Mitsuhiro Nonaka , Kazumi Kamada , Masashi Yamamoto
- 申请人地址: JP Anan
- 专利权人: Nichia Corporation
- 当前专利权人: Nichia Corporation
- 当前专利权人地址: JP Anan
- 代理机构: Wenderoth, Lind & Ponack, L.L.P.
- 优先权: JP2002/19192 20020128; JP2002/175686 20020617; JP2002/195179 20020703; JP2002/233866 20020809; JP2002/356463 20021209
- 主分类号: H01L33/62
- IPC分类号: H01L33/62 ; H01L27/15 ; H01L29/16 ; H01L29/26 ; H01L33/00 ; H01L33/06 ; H01L33/10 ; H01L33/20 ; H01L33/22 ; H01L33/32 ; H01L33/38 ; H01L33/40 ; H01L33/44 ; H01S5/00 ; H01S5/02 ; H01S5/022 ; H01S5/024 ; H01S5/042 ; H01S5/183 ; H01S5/30 ; H01S5/343 ; H01L21/00
摘要:
A method of producing an efficient nitride semiconductor element having an opposed terminal structure. The method includes a growing step for growing the nitride semiconductor further having an undoped GaN layer on a different materials substrate; subsequently, an attaching step for attaching the supporting substrate to the first conductive type nitride semiconductor layer side of the nitride semiconductor and interposing a first terminal between them; and subsequently, an exposing step for exposing the second conductive type nitride semiconductor layer by eliminating the different material substrate and the undoped GaN.
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