Invention Grant
- Patent Title: Semiconductor memory device employing a ferromagnetic gate
- Patent Title (中): 采用铁磁门的半导体存储器件
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Application No.: US14257395Application Date: 2014-04-21
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Publication No.: US09337334B2Publication Date: 2016-05-10
- Inventor: Hari V. Mallela , Edward J. Nowak , Yunsheng Song , Reinaldo A. Vega , Keith Kwong Hon Wong , Zhijian Yang
- Applicant: GLOBALFOUNDRIES INC.
- Applicant Address: KY Grand Cayman
- Assignee: GLOBALFOUNDRIES INC.
- Current Assignee: GLOBALFOUNDRIES INC.
- Current Assignee Address: KY Grand Cayman
- Agency: Scully, Scott, Murphy & Presser, P.C.
- Main IPC: H01L21/02
- IPC: H01L21/02 ; H01L29/78 ; H01L29/49 ; H01L29/06 ; H01L29/08 ; H01L29/417 ; H01L29/66 ; H01L21/28 ; H03K17/687 ; H01L29/51

Abstract:
A semiconductor memory device including a channel region and a ferromagnetic gate is provided. The channel region can be formed within a semiconductor nanowire. The ferromagnetic gate is programmed with a selected orientation of magnetization by the electrical current that passes through the channel region in one direction or another. The orientation of the magnetization in the ferromagnetic gate can be detected by changes in the threshold voltage of a field effect transistor employing the ferromagnetic gate as a gate electrode, or can be detected by the resistance of the channel region that changes with the orientation of the magnetization in a two terminal device.
Public/Granted literature
- US20150303313A1 SEMICONDUCTOR MEMORY DEVICE EMPLOYING A FERROMAGNETIC GATE Public/Granted day:2015-10-22
Information query
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