Invention Grant
US09481811B2 Composition and method for polishing memory hard disks exhibiting reduced edge roll-off
有权
用于抛光显示减少边缘滚降的存储硬盘的组合物和方法
- Patent Title: Composition and method for polishing memory hard disks exhibiting reduced edge roll-off
- Patent Title (中): 用于抛光显示减少边缘滚降的存储硬盘的组合物和方法
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Application No.: US14627081Application Date: 2015-02-20
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Publication No.: US09481811B2Publication Date: 2016-11-01
- Inventor: Tong Li , Hon-Wu Lau , Michael White
- Applicant: Cabot Microelectronics Corporation
- Applicant Address: US IL Aurora
- Assignee: Cabot Microelectronics Corporation
- Current Assignee: Cabot Microelectronics Corporation
- Current Assignee Address: US IL Aurora
- Agent Thomas Omholt; Francis J. Koszyk
- Main IPC: C09G1/04
- IPC: C09G1/04 ; B24B1/00 ; C09G1/02 ; B24B37/04 ; H01L21/321 ; H01L21/306 ; C09K3/14 ; C09K13/06 ; C09G1/00 ; C09G1/06

Abstract:
The invention provides a chemical-mechanical polishing composition containing (a) an abrasive selected from wet-process silica, alpha alumina, fumed alumina, ceria, zirconia, titania, and combinations thereof, (b) an oxidation catalyst, (c) a non-transition metal sulfate salt, (d) a complexing agent, (e) hydrogen peroxide, (f) a nonionic surfactant, (g) an anionic surfactant, and (h) water. The polishing composition has a pH of about 1 to about 5, and the polishing composition is substantially free of a peroxydisulfate salt. The invention also provides a method of chemically-mechanically polishing a substrate, especially a nickel-phosphorous substrate, by contacting a substrate with a polishing pad and the chemical-mechanical polishing composition, moving the polishing pad and the polishing composition relative to the substrate, and abrading at least a portion of the substrate to polish the substrate.
Public/Granted literature
- US20160244639A1 COMPOSITION AND METHOD FOR POLISHING MEMORY HARD DISKS EXHIBITING REDUCED EDGE ROLL-OFF Public/Granted day:2016-08-25
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