Invention Grant
- Patent Title: Catalyst layer forming method, catalyst layer forming system and recording medium
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Application No.: US15047690Application Date: 2016-02-19
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Publication No.: US09966306B2Publication Date: 2018-05-08
- Inventor: Yuichiro Inatomi , Takashi Tanaka , Nobutaka Mizutani , Yusuke Saito , Kazutoshi Iwai , Mitsuaki Iwashita
- Applicant: Tokyo Electron Limited
- Applicant Address: JP Tokyo
- Assignee: TOKYO ELECTRON LIMITED
- Current Assignee: TOKYO ELECTRON LIMITED
- Current Assignee Address: JP Tokyo
- Agency: Pearne & Gordon LLP
- Priority: JP2015-033342 20150223
- Main IPC: H01L21/768
- IPC: H01L21/768 ; H01L21/67 ; C23C18/18 ; C23C18/16 ; C25D7/12 ; C23C18/38 ; C23C18/50

Abstract:
A catalyst adsorbed on a surface of a substrate is bound to the substrate without leaving residues within a recess of the substrate. A catalyst layer forming method includes forming a catalyst layer 22 by supplying a catalyst solution 32 onto a substrate 2 having a recess 2a to adsorb the catalyst 22A onto a surface of the substrate and onto an inner surface of the recess; rinsing the surface of the substrate 2 and an inside of the recess 2a by supplying a rinse liquid; drying the surface of the substrate 2 and the inside of the recess 2a. Further, by supplying a binder solution 34 containing a binder 22B onto the substrate 2, the catalyst 22A on the surface of the substrate 2 is bound to the substrate 2 by the binder 22B.
Public/Granted literature
- US20160247683A1 CATALYST LAYER FORMING METHOD, CATALYST LAYER FORMING SYSTEM AND RECORDING MEDIUM Public/Granted day:2016-08-25
Information query
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