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1.发明授权REFLEKTIVES ROENTGENMIKROSKOP ZUR UNTERSUCHUNG VON OBJEKTEN MIT WELLENLAENGEN = 100NM IN REFLEXION 有权反光ROENTGENMIKROSKOP的对象与Wellenlaengen = 100NM反射调查
公开(公告)号：EP1446813B1
公开(公告)日：2010-11-10
申请号：EP03740130.4
申请日：2003-05-08
发明人： MANN, Hans-Jürgen , DINGER, Udo , ULRICH, Wilhelm , REINECKE, Wolfgang , ENGEL, Thomas , ZIBOLD, Axel , HARNISCH, Wolfgang , WEDOWSKI, Marco , PAUSCHINGER, Dieter
摘要： The invention relates to a reflective X-ray microscope for examining an object on an object plane wherein the object is illuminated with radiation at a wavelength of
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2.发明公开VERFAHREN ZUR HERSTELLUNG EINES OPTISCHEN ELEMENTES MIT HILFE VON ABFORMUNG, OPTISCHES ELEMENT HERGESTELLT NACH DIESEM VERFAHREN, KOLLEKTOR UND BELEUCHTUNGSSYSTEM 审中-公开方法制造光学元件中使用的印象，光学元件制造的这种方法，采集器和照明系统
公开(公告)号：EP2155932A2
公开(公告)日：2010-02-24
申请号：EP08801441.0
申请日：2008-05-29
申请人： Carl Zeiss SMT AG
发明人： DINGER, Udo , BINGEL, Ulrich , ERXMEYER, Jeffrey , ERZIN, Eral , WEIGL, Bernhard , BRUYNOOGHE, Stephane
CPC分类号： C25D1/06 , B82Y10/00 , C23C14/0005 , C23C28/023 , C23C28/322 , C23C28/345 , C23C28/42 , C25D7/08 , G02B5/0816 , G02B5/0891 , G03F7/70166 , G03F7/70958 , G21K1/062 , G21K2201/061 , G21K2201/064 , G21K2201/067 , Y10T29/49812
摘要： Disclosed is a method for producing an optical element or part of an optical element having a base. Said method comprises the following steps: - a mold (21, 1000, 2000) is provided that has a surface corresponding to the geometry of the optical element; - a layer system (7) encompassing at least one separation layer system (15, 1010, 2010) is deposited on the surface of the mold (21, 1000, 2000); - a base (4, 1030, 2030) is electroformed on the layer system (7); - at least the base on the separation layer system (15, 1010, 2010) is detached from the mold (21, 1000, 2000).
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公开(公告)号：EP2122393A2
公开(公告)日：2009-11-25
申请号：EP08707756.6
申请日：2008-02-18
申请人： Carl Zeiss SMT AG
发明人： WARM, Berndt , RENNON, Sigfried , DINGER, Udo , BAIER, Jürgen , BURKART, Stefan , KOUROUKLIS, Christos , CHUNG, Hin Yiu Anthony , WIESNER, Stefan , ENKISCH, Hartmut , DENGEL, Günther
CPC分类号： G02B5/08 , B29D11/00596 , G02B5/09 , G03F7/702 , G03F7/70825
摘要： The invention relates to methods for producing mirrors, in particular facet mirrors, and projection exposure apparatuses equipped with the mirrors according to the invention.
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公开(公告)号：EP1417159A1
公开(公告)日：2004-05-12
申请号：EP02794791.0
申请日：2002-08-14
发明人： DINGER, Udo , EISERT, Frank , WEISER, Martin , KNAPP, Konrad , MITRA, Ina , MORIAN, Hans
CPC分类号： G21K1/06 , C03C10/0009 , C03C19/00 , C03C23/0055 , C03C2204/08
摘要： The invention relates to substrate material for X-ray optical components for X-rays of wavelength μR, comprising a glass ceramic material with a glass phase made of amorphous material and with a crystal phase containing microcrystallites. The amorphous material has a positive thermal expansion and the microcrystallites have a negative thermal expansion, and the stoichiometric ratio of crystal to glass phase is set such that the thermal expansion α of the glass ceramic material, within a temperature range of 20 °C to 100 °C, is
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5.发明公开
公开(公告)号：EP2243047A1
公开(公告)日：2010-10-27
申请号：EP09709960.0
申请日：2009-02-06
申请人： Carl Zeiss SMT AG
CPC分类号： G03F7/702 , G02B5/09 , G02B26/06 , G02B26/0816 , G02B26/0833 , G02B27/0927 , G03F7/70075 , G03F7/70116
摘要： A facet mirror is to be used as a bundle-guiding optical component in a projection exposure apparatus for microlithography. The facet mirror has a plurality of separate mirrors. For individual deflection of incident illumination light, the separate mirrors are in each case connected to an actuator in such a way that they are separately tiltable about at least one tilt axis. A control device, which is connected to the actuators, is configured in such a way that a given grouping of the separate mirrors can be grouped into separate mirror groups that include in each case at least two separate mirrors. The result is a facet mirror which, when installed in the projection exposure apparatus, increases the variability for setting various illumination geometries of an object field to be illuminated by the projection exposure apparatus. Various embodiments of separate mirrors for forming the facet mirrors are described.
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6.发明公开REFLEKTIVES ROENTGENMIKROSKOP UND INSPEKTIONSSYSTEM ZUR UNTERSUCHUNG VON OBJEKTEN MIT WELLENLAENGEN 100NM 有权反光ROENTGENMIKROSKOP的对象与Wellenlaengen = 100NM反射调查
公开(公告)号：EP1446813A2
公开(公告)日：2004-08-18
申请号：EP03740130.4
申请日：2003-05-08
发明人： MANN, Hans-Jürgen , DINGER, Udo , ULRICH, Wilhelm , REINECKE, Wolfgang , ENGEL, Thomas , ZIBOLD, Axel , HARNISCH, Wolfgang , WEDOWSKI, Marco , PAUSCHINGER, Dieter
摘要： The invention relates to a reflective X-ray microscope for examining an object on an object plane wherein the object is illuminated with radiation at a wavelength of
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公开(公告)号：EP1417159B1
公开(公告)日：2010-11-17
申请号：EP02794791.0
申请日：2002-08-14
申请人： Schott AG , Carl Zeiss SMT AG
发明人： DINGER, Udo , EISERT, Frank , WEISER, Martin , KNAPP, Konrad , MITRA, Ina , MORIAN, Hans
CPC分类号： G21K1/06 , C03C10/0009 , C03C19/00 , C03C23/0055 , C03C2204/08
摘要： The invention relates to substrate material for X-ray optical components for X-rays of wavelength μR, comprising a glass ceramic material with a glass phase made of amorphous material and with a crystal phase containing microcrystallites. The amorphous material has a positive thermal expansion and the microcrystallites have a negative thermal expansion, and the stoichiometric ratio of crystal to glass phase is set such that the thermal expansion α of the glass ceramic material, within a temperature range of 20 °C to 100 °C, is
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8.发明公开HIGH-PRECISION OPTICAL SURFACE PREPARED BY SAGGING FROM A MASTERPIECE 审中-公开BY拐点一个MASTER PIECE WON OPTICAL面加工精度高的
公开(公告)号：EP1812935A2
公开(公告)日：2007-08-01
申请号：EP05808702.4
申请日：2005-11-08
申请人： Carl Zeiss SMT AG
发明人： EGLE, Wilhelm , DINGER, Udo , MATTHES, Axel
CPC分类号： G03F7/70166 , C03B23/0252 , C03B23/0357 , G03F7/70175 , G03F7/70958 , G21K1/06 , G21K2201/067
摘要： A method of making a high-precision optical surface which may be used either as a Wolter-type segment in an X-ray mirror system or in a collector of a EUVL system or as a spherical, aspherical, or free form normal or grazing incidence mirror in an EUVL system is prepared by sagging a thin flat glass sheet onto a masterpiece, in particular a mandrel, made from a temperature-resistant material, such as an alumina based ceramic or a keatite glass ceramic. The glass sheet is polished to the desired surface roughness (14), is positioned to an upper surface of the masterpiece (16), and is heated (18) to effect sagging onto the upper surface of the masterpiece for generating a shaped body. Thereafter, the shaped body is cooled and removed from the masterpiece, is mounted within a holder (22), is inspected for deviations from the specification (24) preferably using interferometric measurements, and is corrected for defects (26), preferably using ion beam figuring.
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9.发明公开EUV-PROJEKTIONSOBJEKTIV MIT SPIEGELN AUS MATERIALIEN MIT UNTERSCHIEDLICHEM VORZEICHEN DER STEIGUNG DER TEMPERATURABHÄNGIGKEIT DES WÄRMEAUSDEHNUNGSKOEFFIZIENTEN NAHE DER NULLDURCHGANGSTEMPERATUR 审中-公开具有不同标牌材料接近零隧道温度的热膨胀系数的温度依赖性的斜率MIRROR EUV投影镜头
公开(公告)号：EP1664933A1
公开(公告)日：2006-06-07
申请号：EP03755564.6
申请日：2003-09-27
申请人： Carl Zeiss SMT AG
发明人： DINGER, Udo , EISERT, Frank , KOEHLER, Stefan , OCHSE, Andreas , ZELLNER, Johannes , LOWISCH, Martin , LAUFER, Timo
CPC分类号： G03F7/70958 , B82Y10/00 , G02B1/00 , G02B5/0891 , G02B7/181 , G03F7/70891 , G21K1/062 , G21K2201/065
摘要： The invention relates to a projection lens (1) for short wavelengths, in particular, for wavelengths μ
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