公开(公告)号：EP3108030A4

公开(公告)日：2017-08-23

申请号：EP15751417

申请日：2015-02-20

申请人： INTEVAC INC ,  BLUCK TERRY ,  SHAH VINAY ,  LATCHFORD IAN ,  RIPOSAN ALEX

发明人： BLUCK TERRY ,  SHAH VINAY ,  LATCHFORD IAN ,  RIPOSAN ALEXANDRU

IPC分类号： C23C14/50 ,  H01L21/67 ,  H01L21/677

CPC分类号： C23C14/50 ,  C23C14/568 ,  H01L21/67173 ,  H01L21/67271 ,  H01L21/67709 ,  H01L21/67718 ,  H01L21/67748 ,  H01L21/6776

摘要： A system for processing substrates in plasma chambers, such that all substrates transport and loading/unloading operations are performed in atmospheric environment, but processing is performed in vacuum environment. The substrates are transported throughout the system on carriers. The system's chambers are arranged linearly, such that carriers move from one chamber directly to the next. A conveyor, placed above or below the system's chambers, returns the carriers to the system's entry area after processing is completed. The carriers are configured for supporting substrates of different sizes. The carriers are also configured for flipping the substrates such that both surfaces of the substrates may be processed.

摘要翻译： 一种用于在等离子体室中处理基板的系统，使得所有的基板运输和装载/卸载操作在大气环境中进行，但是处理在真空环境中进行。 基材在载体上通过系统运输。 系统的腔室线性排列，使得载体从一个腔室直接移动到下一个腔室。 放置在系统腔室上方或下方的传送带在处理完成后将载体返回到系统的入口区域。 载体被配置用于支撑不同尺寸的衬底。 载体还被配置用于翻转衬底，使得衬底的两个表面都可以被处理。

公开(公告)号：EP2839052A4

公开(公告)日：2015-06-10

申请号：EP13777473

申请日：2013-04-19

申请人： INTEVAC INC ,  BLUCK TERRY ,  LATCHFORD IAN ,  SHAH VINAY ,  RIPOSAN ALEX

发明人： BLUCK TERRY ,  LATCHFORD IAN ,  SHAH VINAY ,  RIPOSAN ALEX

IPC分类号： C23C14/04 ,  H01L21/673 ,  H01L31/18

CPC分类号： H01L31/1892 ,  C23C14/042 ,  C23C14/50 ,  C23C16/042 ,  C23C16/4585 ,  H01L21/6734 ,  H01L21/67346 ,  H01L31/18

公开(公告)号：EP2852469A4

公开(公告)日：2015-09-02

申请号：EP13780965

申请日：2013-04-26

申请人： INTEVAC INC ,  BLUCK TERRY ,  SHAH VINAY ,  RIPOSAN ALEX

发明人： BLUCK TERRY ,  SHAH VINAY ,  RIPOSAN ALEX

IPC分类号： C23C14/04 ,  H01L21/673 ,  H01L21/677 ,  H01L31/18

CPC分类号： H01L21/67709 ,  H01L21/67173 ,  H01L21/67736 ,  H01L21/67739 ,  H01L21/67754 ,  H01L21/67769 ,  H01L21/67775 ,  H01L21/67778 ,  H01L21/67781 ,  H01L21/68742 ,  H01L21/68785

摘要： A system for processing substrates in plasma chambers, such that all substrates transport and loading/unloading operations are performed in atmospheric environment, but processing is performed in vacuum environment. The substrates are transported throughout the system on carriers. The system's chambers are arranged linearly, such that carriers move from one chamber directly to the next. A conveyor, placed above or below the system's chambers, returns the carriers to the system's entry area after processing is completed. Loading and unloading of substrates may be performed at one side of the system, or loading can be done at the entry side and unloading at the exit side.

公开(公告)号：EP2773792A4

公开(公告)日：2015-04-22

申请号：EP12866275

申请日：2012-11-02

申请人： INTEVAC INC ,  BROWN DAVID WARD ,  SHAH VINAY ,  PEDERSON TERRY ,  BLUCK TERRY

发明人： BROWN DAVID WARD ,  SHAH VINAY ,  PEDERSON TERRY ,  BLUCK TERRY

IPC分类号： C23C14/35

CPC分类号： H01J37/3455 ,  C23C14/35 ,  C23C14/56 ,  H01J37/32779 ,  H01J37/32899 ,  H01J37/3405 ,  H01J37/3417 ,  H01J37/3452

公开(公告)号：EP3108028A4

公开(公告)日：2017-08-23

申请号：EP15752686

申请日：2015-02-19

申请人： INTEVAC INC

发明人： SHAH VINAY ,  RIPOSAN ALEXANDRU ,  BLUCK TERRY

IPC分类号： C23C14/00 ,  C23C14/35 ,  C23C14/54 ,  H01J37/34

CPC分类号： C23C14/35 ,  C23C14/352 ,  C23C14/542 ,  C23C14/562 ,  H01J37/3405 ,  H01J37/3408 ,  H01J37/345 ,  H01J37/3455 ,  H01J37/347

摘要： A system for depositing material from a target onto substrates, comprising a processing chamber; a sputtering target having length L and having sputtering material provided on front surface thereof; a magnet operable to reciprocally scan across the length L in close proximity to rear surface of the target; and a counterweight operable to reciprocally scan at same speed but opposite direction of the magnet.

摘要翻译： 一种用于将来自目标的材料沉积到衬底上的系统，包括处理室; 具有长度L并且在其前表面上设置有溅射材料的溅射靶; 磁体，其可操作以在接近靶的后表面的整个长度L上往复扫描; 以及可操作成以相同的速度但相反方向对磁体进行往复扫描的配重。