TWO-STEP, DIRECT-WRITE LASER METALLIZATION
    3.
    发明公开

    公开(公告)号:EP3621416A3

    公开(公告)日:2020-05-06

    申请号:EP19195990.7

    申请日:2014-02-18

    申请人: Orbotech Ltd.

    摘要: A method for manufacturing, comprising coating a substrate (22) with a matrix (28) containing a material to be patterned on the substrate; irradiating the coated substrate with an energy beam so as to fix a pattern (42) in an outer layer of the matrix without fixing a bulk of the matrix or sintering the material that is to be patterned in the matrix; removing the matrix (28) remaining on the substrate (22) outside the fixed pattern (42); and after removing the matrix (28), sintering the material in the pattern (42), wherein the matrix (28) comprises a photosensitive surfactant additive, and wherein irradiating the coated substrate activates the additive so as to cause the additive to form the fixed pattern (42) in the outer layer of the matrix (28).

    RANGE DIFFERENTIATORS FOR AUTO-FOCUSING IN OPTICAL IMAGING SYSTEMS

    公开(公告)号:EP3531688A2

    公开(公告)日:2019-08-28

    申请号:EP19158879.7

    申请日:2019-02-22

    申请人: Orbotech Ltd.

    IPC分类号: H04N5/232

    摘要: A range differentiator useful for auto-focusing, the range differentiator including an image generator (540, 130, 132) providing an image of a scene at various physical depths, a depth differentiator (132) distinguishing portions of the image at depths below a predetermined threshold, irrespective of a shape of the portions, and providing a depth differentiated image and a focus distance ascertainer (132) ascertaining a focus distance based on the depth differentiated image.

    ANGLED LIFT JETTING
    5.
    发明公开
    ANGLED LIFT JETTING 审中-公开
    倾斜的升降机射流

    公开(公告)号:EP3247529A1

    公开(公告)日:2017-11-29

    申请号:EP16739876.7

    申请日:2016-01-05

    申请人: Orbotech Ltd.

    IPC分类号: B23K26/57

    摘要: An apparatus for material deposition on an acceptor surface includes a transparent donor substrate having opposing first and second surfaces, such that at least a part of the second surface is not parallel to the acceptor surface, and including a donor film on the second surface. The apparatus additionally includes an optical assembly, which is configured to direct a beam of radiation to pass through the first surface of the donor substrate and impinge on the donor film at a location on the part of the second surface that is not parallel to the acceptor surface, so as to induce ejection of droplets of molten material from the donor film onto the acceptor surface.

    TILTING DEVICE
    8.
    发明公开
    TILTING DEVICE 审中-公开
    俯仰装置

    公开(公告)号:EP2030069A2

    公开(公告)日:2009-03-04

    申请号:EP07825688.0

    申请日:2007-06-20

    申请人: ORBOTECH LTD.

    IPC分类号: G02B26/10

    摘要: A flat surface tilting device including a selectably positionable flat surface element assembly defining a flat surface element having a flat surface and a pivot location portion, the pivot location portion being generally centered with respect to the flat surface, a pivot support element pivotably engaging the pivot location portion, an electromagnet, fixed with respect to the pivot support element and arranged for application of magnetic force in a direction generally perpendicular to the flat surface thereby to pivot the flat surface element about the pivot support element, a sensor for sensing the position of the flat surface element and feedback circuitry operative in response to an output of the sensor to govern operation of the electromagnet.

    Plotting an image on a thin material having variations in thickness
    9.
    发明公开
    Plotting an image on a thin material having variations in thickness 审中-公开
    在具有厚度变化的薄材料上绘制图像

    公开(公告)号:EP1872956A2

    公开(公告)日:2008-01-02

    申请号:EP07012463.1

    申请日:2007-06-26

    申请人: ORBOTECH LTD.

    摘要: System and corresponding method for plotting an image on a thin material having variations in thickness. System (40) includes: a plotter unit (46), for plotting the image on a surface (48) of thin material (42); a control unit (50), for controlling plotter unit (46), for effecting the plotting; and a thickness measuring device (52), for measuring thickness (44) of thin material (42). Control unit (50) receives measured thickness values from thickness measuring device (52), and uses measured thickness values for adjusting plotting of the image via plotter unit (46), to compensate for variations in thickness (44) of thin material (42).

    摘要翻译: 用于在具有厚度变化的薄材料上绘制图像的系统和相应的方法。 系统(40)包括:绘图仪单元(46),用于在薄材料(42)的表面(48)上绘制图像; 控制单元(50),用于控制绘图仪单元(46),用于实现绘图; 和厚度测量装置(52),用于测量薄材料(42)的厚度(44)。 控制单元(50)接收来自厚度测量装置(52)的测量的厚度值,并使用测量的厚度值来通过绘图仪单元(46)调整图像的绘图,以补偿薄材料(42)的厚度变化(44) 。