CIRCUIT FORMING METHOD AND INFORMATION PROCESSING DEVICE

    公开(公告)号:EP4415490A1

    公开(公告)日:2024-08-14

    申请号:EP21959971.9

    申请日:2021-10-08

    申请人: Fuji Corporation

    发明人: TOMINAGA, Ryojiro

    IPC分类号: H05K3/10

    CPC分类号: H05K3/10

    摘要: A circuit forming method including: an acquiring step of acquiring metal-containing liquid information including at least one of a density of a metal-containing liquid containing metal fine particles or a content of the metal fine particles; a calculating step of calculating the number of layers of the metal-containing liquid required to form a wiring by stacking the metal-containing liquid, based on the metal-containing liquid information acquired in the acquiring step; and a wiring forming step of forming a wiring by stacking the metal-containing liquid in the number of layers calculated in the calculating step.