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337 条记录 (耗时 0.021 秒)

    SUSCEPTOR
    91.
    发明公开
    SUSCEPTOR 审中-公开
    感受器

    公开(公告)号：EP2824698A1

    公开(公告)日：2015-01-14

    申请号：EP13757808.4

    申请日：2013-03-04

    申请人： Toyo Tanso Co., Ltd.

    发明人： SASAKI, Seisyu

    IPC分类号： H01L21/683

    CPC分类号： H01L21/68785 ,  H01L21/68771

    摘要： A susceptor is provided in which wasteful space is minimized in the outermost peripheral portion and the maximum number of recesses are disposed, by modifying a recess arrangement of an outermost peripheral recess array, which is disposed on an outer peripheral portion of a plurality of recess arrays that are disposed in a closest packed arrangement in a honeycomb-shaped pattern structure.
    Each of recesses located at vertices of a second recess array (A2), which is the outermost periphery of concentric hexagonal recess arrays (A1) and (A2) in a honeycomb-shaped pattern, is substantially in point contact with two recesses forming the outermost peripheral recess array (A3), and those two recesses are substantially in point contact with each other. The same number of recesses as the number of the recesses disposed between a vertex (B2) and a vertex (B1) of the recess array (A2) are disposed between a recess (M(3)-C) and a recess (M(3)-B) of the outermost peripheral recess array (A3), and the same number of recesses as the number of the recesses disposed between the vertex (B2) and a vertex (B3) of the recess array (A2) are disposed between a recess (M(3)-D) and a recess (M(3)-E) of the outermost peripheral recess array (A3).

    摘要翻译： 通过改变设置在多个凹部阵列的外周部分上的最外周边凹部阵列的凹部配置，提供了一种基座，其中在最外围部分中浪费空间被最小化并且设置了最大数量的凹部 它们以蜂巢形图案结构以最紧密的排列布置而布置。 位于作为蜂巢状图案中的同心六边形凹陷列（A1）和（A2）的最外周的第二凹陷列（A2）的顶点处的每个凹陷基本上点接触形成最外侧的两个凹陷 外围凹陷阵列（A3），并且这两个凹陷基本上彼此点接触。 在凹部（M（3）-C）和凹部（M（3）-C）之间设置与凹部阵列（A2）的顶点（B2）和顶点（B1）之间设置的凹部的数量相同的凹部数量 （B2）与顶点（B3）之间的凹部的数量相同的凹部的数量设置在凹部阵列（A2）的顶点（B2）和顶点 （A3）的凹槽（M（3）-D）和凹槽（M（3）-E）。

    CVD DEVICE, METHOD FOR MANUFACTURING SUSCEPTOR IN WHICH CVD DEVICE IS USED, AND SUSCEPTOR
    93.
    发明公开
    CVD DEVICE, METHOD FOR MANUFACTURING SUSCEPTOR IN WHICH CVD DEVICE IS USED, AND SUSCEPTOR 审中-公开
    CVD装置中，产生一个基座WITH A CVD装置和基座的方法

    公开(公告)号：EP2767612A1

    公开(公告)日：2014-08-20

    申请号：EP12840633.7

    申请日：2012-10-12

    申请人： Toyo Tanso Co., Ltd.

    发明人： KITA, Masaaki ,  KUBOTA, Takeshi ,  HIRANO, Hiroyuki

    IPC分类号： C23C16/458 ,  H01L21/205

    CPC分类号： C30B35/00 ,  C04B41/009 ,  C04B41/5057 ,  C04B41/5059 ,  C04B41/87 ,  C23C16/042 ,  C23C16/325 ,  C23C16/4404 ,  C23C16/4588 ,  C04B35/52 ,  C04B41/4531 ,  C04B41/4572

    摘要： The invention provides a CVD apparatus that can remarkably improve the quality and productivity of a susceptor provided with a film such as a SiC film or a TaC film without causing increase in production cost or increase in size of the apparatus. The invention also provides a method of manufacturing a susceptor using the CVD apparatus and a susceptor.
    A masking portion (recessed portion) 20 is provided at the center of a rear surface of a carbonaceous substrate 10. The masking portion 20 includes a first bore portion 20a and a second bore portion 20b. The first bore portion 20a has an inner wall in which a female screw portion 21 is formed. A male screw portion 7a of a masking jig 7 is screw-fitted to the female screw portion 21. The masking jig 7 is fixed to a film forming jig 2. The carbonaceous substrate is thus supported in a standing posture, and the carbonaceous substrate is provided, on a surface, with a film such as a SiC film or a TaC film except for the recessed portion by introducing gas into the apparatus in this supported state.

    摘要翻译： 本发明提供一种化学气相沉积装置确实可以显着提高设置有一个基座的质量和生产率膜审查作为膜 - 碳化硅或TAC电影，而不在装置的尺寸导致生产成本的增加或增加。 因此本发明提供使用该CVD设备和基座制造基座的方法。 掩蔽部分（凹部）20以碳质基材10的屏蔽部分20包括第一孔部分20a和20b的第二孔部分的后表面的中心处。 所述第一孔部20a具有在其中的阴螺纹部21形成内壁。 掩蔽夹具7的外螺纹部7a螺纹配合到该掩模夹具7固定到成膜夹具2的碳质基材是在站立姿势因此支持阴螺纹部21，和碳质基材是 提供，在表面上，用薄膜：如在SiC电影或TAC膜 - 除了通过将气体引入到支撑在该状态下该装置的凹部。

    POWDER-PROCESSING DEVICE AND POWDER-PROCESSING METHOD
    94.
    发明公开
    POWDER-PROCESSING DEVICE AND POWDER-PROCESSING METHOD 审中-公开
    PULVERVERARBEITUNGSVORRICHTUNG UND PULVERVERARBEITUNGSVERFAHREN

    公开(公告)号：EP2756880A1

    公开(公告)日：2014-07-23

    申请号：EP12831873.0

    申请日：2012-09-11

    申请人： Toyo Tanso Co., Ltd.

    发明人： TANAKA, Noriyuki ,  HIRAIWA, Jiro ,  MUKAI, Takahiro

    IPC分类号： B01J8/24

    CPC分类号： B01F3/068 ,  B01F2003/063 ,  B01J8/1818 ,  B01J8/1827 ,  B01J8/40 ,  B82Y30/00 ,  B82Y40/00 ,  C01B32/15 ,  Y10T137/87652

    摘要： A processing space is provided in a reaction container. One gas inlet port is provided at the lower end of the reaction container. A distribution plate is attached to the one gas inlet port. Another gas inlet port is provided at a lower side surface of the reaction container. Powder that is an object to be processed is stored on the distribution plate in the reaction container. The distribution plate is configured to let a gas pass and not let the powder pass. A nitrogen gas is introduced into the processing space through the distribution plate from the one gas inlet port, and a processing gas is introduced into the processing space from the other gas inlet port without passing through the distribution plate.

    摘要翻译： 处理空间设置在反应容器中。 一个气体入口设置在反应容器的下端。 分配板附接到一个气体入口。 在反应容器的下侧表面设有另一气体入口。 作为被处理物的粉末被储存在反应容器的分配板上。 分配板被配置为使气体通过并且不让粉末通过。 通过分配板从一个气体入口将氮气引入加工空间，并且处理气体从另一个气体入口导入处理空间，而不通过分配板。