公开(公告)号：EP2495613B1

公开(公告)日：2013-07-31

申请号：EP12169023.4

申请日：2003-11-10

申请人： ASML Netherlands B.V.

发明人： Lof, Joeri ,  De Smit, Joannes Theodoor ,  Straaijer, Alexander ,  Streefkerk, Bob ,  Van Santen, Helmar ,  Derksen, Antonius ,  Hoogendam, Christiaan ,  Kolesnychenko, Aleksey ,  Loopstra, Erik ,  Modderman, Theodorus ,  Mulkens, Johannes ,  Ritsema, Roelof ,  Simon, Klaus

IPC分类号： G03F7/20

CPC分类号： G03F7/707 ,  G03F7/70341 ,  G03F7/7085 ,  G03F9/7088

公开(公告)号：EP1720074B1

公开(公告)日：2011-11-02

申请号：EP06252309.7

申请日：2006-04-28

申请人： ASML Netherlands B.V.

发明人： Streefkerk, Bob ,  Donders, Sjoerd Nicolaas Lambertus ,  de Graaf, Roelof Frederik ,  Hoogendam, Christiaan Alexander ,  Leenders, Martinus Hendrikus Antonius ,  Mertens, Jeroen Johannes Sophia Maria ,  Riepen, Michel

IPC分类号： G03F7/20

CPC分类号： G03F7/70341

摘要： An immersion lithographic apparatus has adaptations (23,27,28,29,30,31,32) to prevent or reduce bubble formation in one or more gaps (22) in the substrate table by preventing bubbles (24) escaping from the gap into the beam path and/or extracting bubbles that may form in the gap.

公开(公告)号：EP2284613A1

公开(公告)日：2011-02-16

申请号：EP10179595.3

申请日：2004-08-25

申请人： ASML Netherlands B.V.

发明人： Dierichs, Marcel ,  Donders, Sjoerd ,  Jacobs, Johannes ,  Jansen, Hans ,  Loopstra, Erik ,  Mertens, Jeroen ,  Stavenga, Marco ,  Streefkerk, Bob ,  Verhagen, Martinus ,  Seuntiens, Lejla

IPC分类号： G03F7/20

CPC分类号： G03F7/70866 ,  B01D19/0031 ,  B01D61/025 ,  B01D61/24 ,  C02F1/04 ,  C02F1/20 ,  C02F1/28 ,  C02F1/283 ,  C02F1/32 ,  C02F1/42 ,  C02F1/441 ,  C02F2103/40 ,  G03F7/2041 ,  G03F7/70341

摘要： In a lithographic projection apparatus a liquid supply system maintains liquid in a space between a final element of the projection system and the substrate with a liquid confinement system. The liquid supply system further comprises a de-mineralizing unit, a distillation unit and a UV radiating source for the purification of immersion liquid. Chemicals may be added to the immersion liquid for the inhibition of lifeform growth and components of the liquid supply system may be made of a material which is non-transparent to visible light such that growth of lifeforms is reduced.

摘要翻译： 在光刻投影装置中，液体供应系统使用液体限制系统将液体保持在投影系统的最终元件和基板之间的空间中。 液体供应系统还包括去矿化单元，蒸馏单元和用于净化浸液的UV辐射源。 可以将化学品添加到浸渍液体中以抑制生命形态生长，并且液体供应系统的组分可以由对可见光不透明的材料制成，使得寿命形式的生长降低。

公开(公告)号：EP1420299B1

公开(公告)日：2011-01-05

申请号：EP03257071.5

申请日：2003-11-10

申请人： ASML Netherlands B.V.

发明人： Lof, Joeri ,  Derksen, Antonius Theodorus Anna Maria ,  Hoogendam, Christiaan Alexander ,  Loopstra, Erik Roelof ,  Mulkens, Johannes Catharinus Hubertus ,  Straaijer, Alexander ,  Streefkerk, Bob ,  Donders, Sjoerd Nicolaas Lambertus ,  Mertens, Jeroen Johannes Sophia Maria ,  Sengers, Timotheus Franciscus

IPC分类号： G03F7/20

CPC分类号： G03F7/707 ,  G03F7/70341 ,  G03F7/7085 ,  G03F7/70916

公开(公告)号：EP2042930A3

公开(公告)日：2009-06-24

申请号：EP08253055.1

申请日：2008-09-17

申请人： ASML Netherlands B.V.

发明人： Streefkerk, Bob ,  De Graaf, Roelof Frederik ,  Mulkens, Johannes Catharinus Hubertus ,  Beckers, Marcel ,  Berkvens, Paul Petrus Joannes ,  Anstotz, David Lucien

IPC分类号： G03F7/20

CPC分类号： G03F7/70916 ,  G03F7/70341

摘要： A method of operating a fluid confinement system (12) of an immersion lithographic apparatus is disclosed. The performance of the liquid confinement system is measured in several different ways. On the basis of the result of the measurement of performance, a signal indicating, for example, that a remedial action may need to be taken is generated.

公开(公告)号：EP1837705A3

公开(公告)日：2007-12-19

申请号：EP07013766.6

申请日：2006-04-26

申请人： ASML Netherlands B.V.

发明人： Streefkerk, Bob ,  Donders, Sjoerd, Nicolaas, Lambertus ,  De Graaf, Roelof, Frederik ,  Hoogendam, Christiaan, Alexander ,  Jansen, Hans ,  Leenders, Martinus, Hendrikus, Antonius ,  Liebregts, Paulus, Martinus, Maria ,  Mertens, Jeroen, Johannes, Sophia, Maria ,  Van der Toorn, Jan-Gerard, Cornelis ,  Riepen, Michel

IPC分类号： G03F7/20

CPC分类号： G03F7/2041 ,  G03F7/3085 ,  G03F7/70058 ,  G03F7/70341 ,  G03F7/70825 ,  G03F7/70875 ,  G03F7/70916 ,  G03F2007/2067 ,  H01L21/0274 ,  H01L21/67098

摘要： An immersion lithographic apparatus is provided with a barrier member which defines a space for containing liquid between the projection system and the substrate. In order to minimize the crossing of the edge of the substrate which is being imaged (which can lead to inclusion of bubbles in the immersion liquid), the cross-sectional area of the space in a plane parallel to the substrate is made as small as possible. The smallest theoretical size is the size of the target portion which is imaged by the projection system. In some embodiments the shape of the final element of the projection system is also changed to have a similar size and/or shape in a cross-section parallel to the substrate to that of the target portion.

摘要翻译： 浸没式光刻设备设置有阻挡构件，该阻挡构件限定用于在投影系统和衬底之间容纳液体的空间。 为了最小化正在成像的衬底边缘的交叉（其可以导致在浸没液体中包含气泡），平行于衬底的平面中的空间的横截面面积被制成与 可能。 最小的理论尺寸是由投影系统成像的目标部分的尺寸。 在一些实施例中，投影系统的最终元件的形状也被改变为在平行于衬底的横截面中具有与目标部分的横截面类似的尺寸和/或形状。

公开(公告)号：EP1837705A2

公开(公告)日：2007-09-26

申请号：EP07013766.6

申请日：2006-04-26

申请人： ASML Netherlands B.V.

发明人： Streefkerk, Bob ,  Donders, Sjoerd, Nicolaas, Lambertus ,  De Graaf, Roelof, Frederik ,  Hoogendam, Christiaan, Alexander ,  Jansen, Hans ,  Leenders, Martinus, Hendrikus, Antonius ,  Liebregts, Paulus, Martinus, Maria ,  Mertens, Jeroen, Johannes, Sophia, Maria ,  Van der Toorn, Jan-Gerard, Cornelis ,  Riepen, Michel

IPC分类号： G03F7/20

CPC分类号： G03F7/2041 ,  G03F7/3085 ,  G03F7/70058 ,  G03F7/70341 ,  G03F7/70825 ,  G03F7/70875 ,  G03F7/70916 ,  G03F2007/2067 ,  H01L21/0274 ,  H01L21/67098

摘要： An immersion lithographic apparatus is provided with a barrier member which defines a space for containing liquid between the projection system and the substrate. In order to minimize the crossing of the edge of the substrate which is being imaged (which can lead to inclusion of bubbles in the immersion liquid), the cross-sectional area of the space in a plane parallel to the substrate is made as small as possible. The smallest theoretical size is the size of the target portion which is imaged by the projection system. In some embodiments the shape of the final element of the projection system is also changed to have a similar size and/or shape in a cross-section parallel to the substrate to that of the target portion.

摘要翻译： 浸没式光刻设备设置有阻挡构件，其在投影系统和基板之间限定用于容纳液体的空间。 为了最小化正在成像的衬底的边缘（其可能导致在浸没液体中包含气泡）的边缘的交叉，平行于衬底的平面中的空间的横截面积被制成小到 可能。 最小的理论尺寸是由投影系统成像的目标部分的尺寸。 在一些实施例中，投影系统的最终元件的形状也被改变为在平行于基底的截面与目标部分的横截面上具有相似的尺寸和/或形状。

公开(公告)号：EP1666973A1

公开(公告)日：2006-06-07

申请号：EP05257182.5

申请日：2005-11-22

申请人： ASML Netherlands B.V.

发明人： Baselmans, Johannes Jacobus Matheus ,  Donders, Sjoerd Nicolaas Lambertus ,  Hoogendam, Christiaan Alexander ,  Mertens, Jeroen Johannes Sophia Maria ,  Mulkens, Johannes Catharinus Hubertus ,  Streefkerk, Bob

IPC分类号： G03F7/20

CPC分类号： G03F7/70341

摘要： An immersion lithographic apparatus is disclosed which includes a liquid supply system having an inlet (24) configured to supply a liquid to a space between a projection system of the lithographic apparatus and a substrate and an outlet (26) configured to remove at least part of the liquid, the liquid supply system configured to rotate the inlet, the outlet, or both, about an axis substantially perpendicular to an exposure plane of the substrate (W).

摘要翻译： 公开了一种浸没式光刻设备，其包括液体供应系统，该液体供应系统具有被配置为将液体供应到光刻设备的投影系统和衬底之间的空间的入口（24）和被配置为去除至少部分 所述液体，所述液体供应系统被配置成围绕基本上垂直于所述基底（W）的暴露平面的轴线旋转所述入口，所述出口或两者。

公开(公告)号：EP1598705A1

公开(公告)日：2005-11-23

申请号：EP05252882.5

申请日：2005-05-11

申请人： ASML Netherlands B.V.

发明人： Streefkerk, Bob ,  Donders, Sjoerd Nicolaas Lambertus ,  Loopstra, Erik Roelof ,  Mulkens, Johannes Catharinus Hubertus

IPC分类号： G03F7/20

CPC分类号： G03F7/70875 ,  B05C9/12 ,  G03F7/70341

摘要： A lithographic projection apparatus is disclosed in which a liquid supply system (LSS) provides an immersion liquid between a final element of the projection system (PL) and the substrate (W). An active drying station (ADS) is provided for actively removing immersion liquid from the substrate (W) or other objects after immersion of the substrate.

摘要翻译： 公开了一种光刻投影设备，其中液体供应系统（LSS）在投影系统（PL）的最终元件和衬底（W）之间提供浸没液体。 提供有源干燥站（ADS），用于在基底浸没之后主动地从基底（W）或其他物体移除浸没液体。

公开(公告)号：EP1528433A3

公开(公告)日：2005-05-18

申请号：EP04256585.3

申请日：2004-10-26

申请人： ASML Netherlands B.V.

发明人： Hoogendam, Christiaan Alexander ,  Streefkerk, Bob ,  Mulkens, Johannes Catharinus Hubertus ,  Bijlaart, Erik Theodorus Maria ,  Kolesnychenko, Aleksey Yurievich ,  Loopstra, Erik Roelof ,  Mertens, J.J.S.M. ,  Slaghekke, Bernardus Antonius ,  Tinnemans, P.A.J. ,  Van Santen, Helmar

IPC分类号： G03F7/20

CPC分类号： G03F7/70808 ,  G03F7/70341 ,  G03F7/70866

摘要： Liquid is supplied to a reservoir (10) between the final element of the projection system (PS) and the substrate by an inlet (21,22). An overflow removes the liquid above a given level. The overflow is arranged above the inlet and thus the liquid is constantly refreshed and the pressure in the liquid remains substantially constant.

摘要翻译： 通过入口（21,22）将液体供应到投影系统（PS）的最终元件和基板之间的储存器（10）。 溢出将液体移出给定水平以上。 溢流口布置在入口上方，因此液体不断地更新并且液体中的压力保持基本恒定。