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    Antihalation compositions
    12.
    发明公开
    Antihalation compositions 失效
    Antireflexionszusammensetzungen。

    公开(公告)号：EP0542008A1

    公开(公告)日：1993-05-19

    申请号：EP92118070.9

    申请日：1992-10-22

    Applicant: SHIPLEY COMPANY INC.

    Inventor： Thackeray, James W. ,  Orsula, George W.

    IPC: G03F7/11 ,  G03F7/40 ,  G03F7/09

    CPC classification number: G03F7/091 ,  G03F7/038 ,  G03F7/38

    Abstract: Antihalation compositions and methods for reducing the reflection of exposure radiation of a photoresist overcoated said compositions. The antihalation compositions of the invention comprise a resin binder and material capable of causing a thermally induced crosslinking reaction of the resin binder.

    Abstract translation: 用于减少光致抗蚀剂外涂层的曝光辐射的反射的抗晕化组合物和方法。 本发明的防光组合物包括树脂粘合剂和能够引起树脂粘合剂的热诱导交联反应的材料。

    Photoresist pattern fabrication employing chemically amplified metalized material
    13.
    发明公开
    Photoresist pattern fabrication employing chemically amplified metalized material 失效
    使用化学放大金属化材料的光电子图案制造

    公开(公告)号：EP0352739A3

    公开(公告)日：1991-09-11

    申请号：EP89113699.6

    申请日：1989-07-25

    Applicant: SHIPLEY COMPANY INC.

    Inventor： Thackeray, James W. ,  Fine, Stephen A.

    IPC: G03F7/004 ,  G03F7/022 ,  G03F7/09 ,  G03F7/38 ,  G03F7/075

    CPC classification number: G03F7/022 ,  G03F7/0041 ,  G03F7/0755 ,  G03F7/09 ,  G03F7/265

    Abstract: The present invention is directed to a method for the formation and dry development of photoresists treated only in a thin layer ( i.e. , approx. 2000 Angstroms thick) so as to be treated with an organometallic material. Treatment of this thin layer of the resist formulation in the process of the present invention is preferably accomplished by the vapor phase exposure of the resist formulation to an organometallic material such as a silylating compound capable of reacting with the resist formulation. The resist formulation also contains a photoacid generator, capable of releasing an acid which either causes the hydrolysis of the exposed portions of the resist that were created with organometallic vapor, or prevents the reaction of the organometallic vapor with the exposed portion of the resist.

    Radiation sensitive compositions and methods
    16.
    发明公开
    Radiation sensitive compositions and methods 失效
    Strahlungsempfindlic Zusammensetzungen und Verfahren。

    公开(公告)号：EP0537524A1

    公开(公告)日：1993-04-21

    申请号：EP92116406.7

    申请日：1992-09-24

    Applicant: SHIPLEY COMPANY INC.

    Inventor： Thackeray, James W. ,  Lamola, Angelo A.

    IPC: G03F7/004

    CPC classification number: G03F7/0382 ,  G03F7/004 ,  G03F7/0045 ,  G03F7/0226 ,  G03F7/038 ,  G03F7/039 ,  G03F7/0392 ,  G03F7/40

    Abstract: The present invention provides radiation sensitive compositions and methods that comprise novel means for providing relief images of enhanced resolution. In one aspect the invention provides a method for controlling diffusion of photogenerated acid comprising adding a polar compound to a radiation sensitive composition and applying a layer of the composition to a substrate; exposing the composition layer to activating radiation whereby a latent image is generated comprising a distribution of acid moieties complexed with the polar compound; and treating the exposed composition layer to provide an activating amount of acid.

    Abstract translation: 本发明提供辐射敏感组合物和方法，其包括用于提供增强分辨率的浮雕图像的新型装置。 在一个方面，本发明提供了一种控制光生酸扩散的方法，包括将极性化合物加入到辐射敏感组合物中，并将该组合物的一层施加到基底上; 将组合物层暴露于激活辐射，由此产生包含与极性化合物络合的酸部分的分布的潜像; 并处理暴露的组合物层以提供活化量的酸。

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