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    MICRO-MIROIR OPTIQUE A PIVOT, MATRICE DE TELS MICRO-MIROIRS ET PROCEDE DE REALISATION DUDIT MICRO-MIROIR.
    11.
    发明公开
    MICRO-MIROIR OPTIQUE A PIVOT, MATRICE DE TELS MICRO-MIROIRS ET PROCEDE DE REALISATION DUDIT MICRO-MIROIR. 审中-公开
    倾斜光学微镜，这样的微小反射镜和相关方法矩阵排列

    公开(公告)号：EP1390793A2

    公开(公告)日：2004-02-25

    申请号：EP02704815.6

    申请日：2002-02-13

    Applicant: Teem Photonics

    Inventor： VALETTE, Serge

    IPC: G02B26/08

    CPC classification number: B81B3/0062 ,  B81B2201/045 ,  B81B2203/0181 ,  B81B2203/058 ,  G02B26/0841

    Abstract: The invention concerns a micromirror comprising a fixed part (31), a mobile part (41, 48) including reflecting means (48) and articulating means linking the mobile part to the fixed part. Said micromirror is characterised in that the articulating means are formed by a pivot (47) located beneath the mobile part between the latter and the fixed part and designed to enable the mobile part to move along axes of rotation contained in the mobile part and passing through an axis of the pivot, and wherein the fixed part comprises at least a cavity (36) opposite at least a zone of one end of the mobile part. The invention also concerns an array of pivoting micromirrors and a method for making such micromirrors. Said micromirrors are useful in optical routing or image projection systems.

    Method of manufacturing a mirror structure
    15.
    发明公开
    Method of manufacturing a mirror structure 有权
    Verfahren zur Herstellung einer Spiegelstruktur

    公开(公告)号：EP1193528A2

    公开(公告)日：2002-04-03

    申请号：EP01307619.5

    申请日：2001-09-07

    Applicant: Xerox Corporation

    Inventor： Rosa, Michel ,  Peeters, Eric

    IPC: G02B26/08 ,  B81B3/00

    CPC classification number: G02B6/3518 ,  B81B2201/045 ,  B81B2203/04 ,  B81C1/00666 ,  G02B6/3556 ,  G02B6/358 ,  G02B6/3584 ,  G02B26/0841

    Abstract: Optical cross-connect systems (100) involve the general concept of a two dimensional array (104) of microelectromechanical system (MEMS) tilt mirrors (106) being used to direct light coming from a first optical fiber (110) to a second optical fiber (111). Each MEMS tilt mirror (106) in the two dimensional array (104) can tilt about two non-colinear axes (x,y) and is suspended by a plurality of suspension arms (450) attached to a silicon on insulator substrate.

    Abstract translation: 光学交叉连接系统（100）涉及用于将来自第一光纤（110）的光引导到第二光纤的微机电系统（MEMS）倾斜镜（106）的二维阵列（104）的一般概念 （111）。 二维阵列（104）中的每个MEMS倾斜镜（106）可以围绕两个非共线轴线（x，y）倾斜，并且由连接到绝缘体上硅衬底上的多个悬臂（450）悬挂。

    MICROMACHINE AND METHOD OF MANUFACTURING THE SAME
    16.
    发明公开
    MICROMACHINE AND METHOD OF MANUFACTURING THE SAME 有权
    MIKROGERÄTUND VERFAHREN ZUR HERSTELLUNG EINESMIKROGERÄTS

    公开(公告)号：EP1041036A1

    公开(公告)日：2000-10-04

    申请号：EP99947884.5

    申请日：1999-10-13

    Applicant: SEIKO EPSON CORPORATION

    Inventor： KAMIJIMA, Shunji Seiko Epson Corporation ,  YONEKUBO, Masatoshi Seiko Epson Corporation ,  TAKEDA, Takashi Seiko Epson Corporation ,  NISHIKAWA, Takao Seiko Epson Corporation

    IPC: B81B1/00

    CPC classification number: B81C1/00182 ,  B81B2201/045 ,  B81C2201/034 ,  G02B26/02

    Abstract: A micromachine and a manufacturing method according to the present invention are suitable for a micromachine that has a dynamic first microstructured portion serving as a drive portion, and a static second microstructured portion adapted to perform a switching function and functions to be performed as an optical element. The second microstructured portion can be manufactured at least without complex steps, such as a silicon process, by forming a static second microstructure on the dynamic first microstructured portion or in such a way as to be overlaid thereon by mold transfer. Thus, the microstructured portion of a complex shape can be easily formed with good reproducibility. This contributes to increased productivity thereof.
    Especially, when a plurality of elements are arranged in an array, similarly as in the case of a spatial light modulator, the stable reproduction thereof is achieved by the mold transfer. Thus, as compared with the case of manufacturing all elements in a silicon process, the probability of an occurrence of a defect is very low. Consequently, this contributes to improved yield of micromachines.

    Abstract translation: 根据本发明的微加工机和制造方法适用于具有用作驱动部分的动态第一微结构部分的微机械，以及适于执行切换功能的静态第二微结构部分，并且用作光学元件 。 可以通过在动态第一微结构化部分上形成静态第二微结构，或以通过模转移覆盖在其上的方式，至少不需要复杂的步骤，例如硅工艺来制造第二微结构部分。 因此，可以容易地以良好的再现性形成复杂形状的微结构化部分。 这有助于提高其生产率。 特别地，当多个元件以阵列布置时，类似于空间光调制器的情况，其通过模转印实现其稳定再现。 因此，与在硅工艺中制造所有元件的情况相比，缺陷发生的可能性非常低。 因此，这有助于提高微机械的产量。

    Capacitive MEMS device with programmable offset voltage control
    18.
    发明公开
    Capacitive MEMS device with programmable offset voltage control 审中-公开
    具有可编程偏移电压控制的电容的MEMS器件

    公开(公告)号：EP2058276A3

    公开(公告)日：2012-08-29

    申请号：EP08153688.0

    申请日：2008-03-31

    Applicant: QUALCOMM MEMS Technologies, Inc.

    Inventor： Felnhofer, Daniel ,  Gousev, Evgeni

    IPC: G02B26/08 ,  G02B26/00 ,  B81B3/00 ,  G11C23/00

    CPC classification number: B81B3/0086 ,  B81B2201/045 ,  G02B26/001 ,  G11C23/00

    Abstract: A capacitive MEMS device is formed having a material between electrodes that traps and retains charges. The material can be realized in several configurations. It can be a multilayer dielectric stack with regions of different band gap energies or band energy levels. The dielectric materials can be trappy itself, i.e. when defects or trap sites are pre-fabricated in the material. Another configuration involves a thin layer of a conductive material with the energy level in the forbidden gap of the dielectric layer. The device may be programmed (i.e. offset and threshold voltages pre-set) by a method making advantageous use of charge storage in the material, wherein the interferometric modulator is pre-charged in such a way that the hysteresis curve shifts, and the actuation voltage threshold of the modulator is significantly lowered. During programming phase, charge transfer between the electrodes and the materials can be performed by applying voltage to the electrodes (i.e. applying electrical field across the material) or by UV-illumination and injection of electrical charges over the energy barrier. The interferometric modulator may then be retained in an actuated state with a significantly lower actuation voltage, thereby saving power.

    Methods and apparatus for actuating displays
    19.
    发明公开
    Methods and apparatus for actuating displays 有权
    VERFAHREN UND VORRICHTUNG ZURBETÄTIGUNGVON ANZEIGEN

    公开(公告)号：EP2287110A2

    公开(公告)日：2011-02-23

    申请号：EP10176478.5

    申请日：2006-02-23

    Applicant: Pixtronix Inc.

    Inventor： Hagood, Nesbitt W. ,  Steyn, Jasper Lodewyk

    IPC: B81B3/00 ,  G02B26/04 ,  G09G3/22 ,  B81B7/04 ,  G02B26/08

    CPC classification number: G09G3/3433 ,  B81B3/0054 ,  B81B2201/032 ,  B81B2201/038 ,  B81B2201/045 ,  B81B2203/051 ,  G02B26/02 ,  G02B26/0841 ,  G09G2300/0809 ,  G09G2310/0262

    Abstract: A display apparatus comprises a modulator for selectively interacting with light in an optical path to form an image on the display apparatus. A controllable first electrostatic actuator provides a first mechanical support for the modulator, the first mechanical support providing a supportive connection from a first location on the modulator to a surface over which the modulator is supported. A second mechanical support provides a supportive connection from a second location on the modulator to the surface. The first electrostatic actuator drives the modulator in a plane substantially parallel to the surface.

    Abstract translation: 显示装置包括用于选择性地与光路中的光相互作用以在显示装置上形成图像的调制器。 可调节的第一静电致动器为调制器提供第一机械支撑，第一机械支撑件提供从调制器上的第一位置到支撑调制器的表面的支撑连接。 第二机械支撑件提供从调制器上的第二位置到表面的支撑连接。 第一静电致动器驱动调制器在大致平行于表面的平面中。

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