公开(公告)号：EP2150855A1

公开(公告)日：2010-02-10

申请号：EP08716358.0

申请日：2008-03-07

申请人： Carl Zeiss SMS GmbH

发明人： ARNZ, Michael ,  KLOSE, Gerd

IPC分类号： G03F7/20

CPC分类号： G03F7/70633

摘要： A method is provided for determining the relative overlay shift of stacked layers, said method comprising the steps of: a) providing a reference image including a reference pattern that comprises first and second pattern elements; b) providing a measurement image of a measurement pattern, which comprises a first pattern element formed by a first one of the layers and a second pattern element formed by a second one of the layers; c) weighting the reference or measurement image such that a weighted first image is generated, in which the first pattern element is emphasized relative to the second pattern element; d) determining the relative shift of the first pattern element on the basis of the weighted first image and of the measurement or reference image not weighted in step c); e) weighting the reference or measurement image such that a weighted second image is generated, in which the second pattern element is emphasized relative to the first pattern element; f) determining the relative shift of the second pattern element on the basis of the weighted second image and of the measurement or reference image not weighted in step e); g) determining the relative overlay shift on the basis of the relative shifts determined in steps d) and f).

公开(公告)号：EP1943660B1

公开(公告)日：2009-03-04

申请号：EP05801831.8

申请日：2005-10-28

申请人： Carl Zeiss SMS GmbH

发明人： PLATZGUMMER, Elmar ,  KNIPPELMEYER, Rainer

IPC分类号： H01J37/04 ,  H01J37/317

CPC分类号： H01J37/3177 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/045 ,  H01J37/3023 ,  H01J2237/0435 ,  H01J2237/30472 ,  H01J2237/31754 ,  H01J2237/31774

摘要： A charged particle beam exposure system has a blanking aperture array (31) having groups of apertures (53) controlled by shift registers (75), wherein different inputs (C) to the shift registers influence a different number of apertures. Charged particle beamlets traversing the apertures are scanned across a charged particle sensitive substrate in synchronism with a clock signal of the shift registers.

摘要翻译： 带电粒子束曝光系统具有具有由移位寄存器（75）控制的多组孔（53）的消隐孔径阵列（31），其中移位寄存器的不同输入（C）影响不同数量的孔径。 与移位寄存器的时钟信号同步地通过带电粒子敏感衬底扫描穿过孔的带电粒子小射束。

公开(公告)号：EP1922587A1

公开(公告)日：2008-05-21

申请号：EP06777152.7

申请日：2006-09-02

申请人： Carl Zeiss SMS GmbH

发明人： GREIF-WÜSTENBECKER, Jörn Dr. ,  BÖHME, Beate ,  STRÖSSNER, Ulrich ,  TOTZECK, Michael ,  KAMENOV, Vladimir Dr. ,  DITTMANN, Olaf Dr. ,  GRUNER, Toralf ,  KRÄHMER, Daniel Dr. ,  GEH, Bernd

IPC分类号： G03F7/20

CPC分类号： G03F7/70666 ,  G03F7/70308

摘要： The invention relates to a method for determining intensity distribution in the focal plane (6) of a projection exposure arrangement, wherein a large aperture imaging system (7, 8) is emulated and a light from a sample is represented on a local resolution detector by means of an emulation imaging system. A device for carrying out said method and emulated devices are also disclosed. Said invention makes it possible to improve a reproduction quality since the system apodisation is taken into consideration. The inventive method consists in determining the integrated amplitude distribution in an output pupil, in combining said integrated amplitude distribution with a predetermined apodisation correction and in calculating a corrected apodisation image according to the modified amplitude distribution.

公开(公告)号：EP1875307A1

公开(公告)日：2008-01-09

申请号：EP06706655.5

申请日：2006-02-04

申请人： Carl Zeiss SMS GmbH ,  Synopsys GmbH

发明人： HARNISCH, Wolfgang ,  ZIBOLD, Axel ,  BÖHM, Klaus ,  KALUS, Christian ,  SCHMÖLLER, Thomas

IPC分类号： G03F1/00 ,  G03F7/20

CPC分类号： G03F1/84 ,  G03F7/7065 ,  G03F7/70666

摘要： The invention relates to a mask inspection method that can be used for the design and production of masks, in order to detect relevant weak points early on and to correct the same. According to said method for mask inspection, an aerial image simulation, preferably an all-over aerial image simulation, is carried out on the basis of the mask design converted into a mask layout, in order to determine a list of hot spots. The mask/test mask is analysed by means of an AIMS tool, whereby real aerial images are produced and compared with the simulated aerial images. The determined differences between the aerial images are used to improve the mask design. The inventive arrangement enables a method to be carried out for mask inspection for mask design and mask production. The use of the AIMS tool directly in the mask production process essentially accelerates the mask production, while reducing the error rate and cost.

公开(公告)号：EP1680699A1

公开(公告)日：2006-07-19

申请号：EP04797515.6

申请日：2004-11-02

申请人： Carl Zeiss SMS GmbH

发明人： BÖHM, Klaus ,  SCHÄFFER, Peter ,  HARNISCH, Wolfgang ,  ENGEL, Thomas ,  ZIBOLD, Axel ,  GEH, Bernd

IPC分类号： G02B26/00 ,  G02B5/00 ,  G02B26/08

CPC分类号： G03F7/701 ,  G02B5/005 ,  G02B21/24 ,  G02B26/007

摘要： The invention relates to the use of two-dimensional arrays comprising individually triggerable elements for creating diaphragms in beam paths of optical devices. At least one two-dimensional array comprising individually triggerable elements for creating diaphragms and/or filters is disposed in the optical imaging and/or illuminating beam path of the diaphragm array and/or filter array for optical devices, the shape, position, and/or optical properties of which can be modified, and is connected to a control unit for triggering the individual elements. The inventive technical solution allows diaphragms and/or filters to be modified very quickly regarding the geometry, optical properties, and/or position thereof by electronically triggering the same. Said modifications can also be done online as an optical fine-tuning step during the measurement and adjustment process. Furthermore, using said systems makes it possible to dispense with the expensive and time-consuming production of diaphragms having geometrical shapes.

公开(公告)号：EP1543373A2

公开(公告)日：2005-06-22

申请号：EP03785604.4

申请日：2003-09-22

申请人： Carl Zeiss SMS GmbH

发明人： BISCHOFF, Jörg ,  BRUNNER, Robert ,  BURKHARDT, Matthias ,  ERDMANN, Lars ,  STEINER, Reinhard

IPC分类号： G02B27/48

CPC分类号： G02B27/106 ,  G02B21/06 ,  G02B27/123 ,  G02B27/126 ,  G02B27/144 ,  G02B27/145

摘要： The invention relates to an lighting device comprising a beam multiplication device (1) which divides a coherent beam (18) into a plurality of partial beams (20, 21) and combines said partial beams to form a bundle of rays (26) once they have followed paths having different optical lengths, the partial beams (27, 28, 29, 30) diverging in said bundle of rays. Said lighting device also comprises a micro-optical system (3) which is arranged downstream from the beam multiplication device (1) and comprises a plurality of optical elements (19) arranged in a grid-type manner. Said bundle of rays (26) hits the micro-optical system (3), and the partial beams (27, 28, 29, 30) of the bundle of rays (26) thus hit each optical element (19) at different angles, in such a way that a plurality of illumination partial beams (M1, M2, M3, M4) irradiate from each optical element (19) in different diffusion directions and can be used to illuminate an object field (31).

公开(公告)号：EP1521109A1

公开(公告)日：2005-04-06

申请号：EP04021936.2

申请日：2004-09-15

申请人： Carl Zeiss SMS GmbH

发明人： Menck, Alexander, Dr. ,  Grau, Dominik

IPC分类号： G02B26/02

CPC分类号： G02B26/02

摘要： Es wird bereitgestellt ein variabler Abschwächer für ein elektromagnetisches Strahlenbündel (4), das sich entlang eines Strahlengangs ausbreitet, wobei der Abschwächer im Strahlengang zwei, in Ausbreitungsrichtung des Strahlenbündels (4) gesehen, hintereinander angeordnete Multiaperturblenden (1, 2) aufweist, die relativ zueinander bewegbar sind.

摘要翻译： 两个光栅具有玻璃基板（1,2）。 在每个基板的前表面（5）上形成规则的条状或铬氧化物区域（6），以完全阻挡光的透射。 氧化铬的涂层可以形成有允许透射光束（4）的一部分的圆形孔（7）的规则阵列。 光束可以通过波长为193nm的准分子激光器来产生，选择两个光栅之间的距离（D）以产生期望的分散角，例如， 2 mrad 在例如距离（Z）下实现光束的完全混合以产生均匀照明的场。 距离光栅50厘米。

公开(公告)号：EP1494059A1

公开(公告)日：2005-01-05

申请号：EP04015052.6

申请日：2004-06-26

申请人： Carl Zeiss SMS GmbH

发明人： Engel, Thomas ,  Lück, Wolfgang

IPC分类号： G02B21/24

CPC分类号： G02B21/244

摘要： Die Erfindung bezieht sich auf ein Verfahren zum automatischen Fokussieren bei der Abbildung eines Objektes mittels einer Abbildungsoptik auf eine Empfangseinrichtung, die eine aus einer Vielzahl von Sensorelementen gebildete Empfangsfläche aufweist. Die Erfindung ist insbesondere zur Scharfeinstellung bei der Mikroskopie von Objektstrukturen, wie Kanten und Konturen auf einer Objektseite, nutzbar.
Erfindungsgemäß ist vorgesehen, daß

der Abstand zwischen der Abbildungsoptik und dem Objektiv mehrfach um einen vorgegebenen Betrag verändert und nach jeder Veränderung eine Abbildung der Objektstruktur gewonnen wird,
für jede der so gewonnenen Abbildungen die Anzahl x der Sensorelemente bestimmt wird, die an der Abbildung beteiligt sind,
diese Anzahl x dem Abstand zugeordnet wird, bei dem die betreffende Abbildung gewonnen wurde und
als optimierter Fokusabstand z F der Abstand eingestellt oder beibehalten wird, bei dem die Anzahl x der an der Abbildung beteiligten Sensorelemente am kleinsten ist.

摘要翻译： 该方法包括在具有包括多个传感器元件的接收表面的接收器中使用聚焦透镜。 物体的位置和焦点相对于彼此的位置是变化的，并且对象结构被成像。 对于每个图像确定所获得的图像中使用的传感器元件的数量。 将传感器元件的数量最小的距离设定为焦距。 包括用于执行该方法的装置的独立权利要求。

公开(公告)号：EP1430354A2

公开(公告)日：2004-06-23

申请号：EP02800132.9

申请日：2002-09-27

申请人： Carl Zeiss SMS GmbH

发明人： ERDMANN, Lars ,  STEINER, Reinhard ,  BRUNNER, Robert ,  BURKHARDT, Matthias ,  BISCHOFF, Jörg

IPC分类号： G02B27/44 ,  G02B27/48

CPC分类号： G02B27/4244 ,  G02B27/425 ,  G02B27/48

摘要： The invention relates to a lighting system comprising a coherence reducer (1) which is provided with a mirror (2). Said coherence reducer introduces different phase shifts into a supplied coherent beam cluster (10) by means of the mirror (2), according to the position in the beam cross-section, and produces an illumination beam cluster (11). The inventive system also comprises an illuminating optical arrangement which is arranged downstream from the coherence reducer (1) and is used to illuminate an object field. Said optical arrangement comprises a micro-optical arrangement (4; 19) having a plurality of optical elements (9; 20) which are arranged in the form of a raster, and an imaging optical arrangement (5) which is arranged downstream from the micro-optical arrangement (4; 19). According to the invention, the mirror comprises an element (2) having a surface which is divided into a plurality of parallel partial surfaces (8) which are staggered in the perpendicular direction in relation to their surface. The supplied beam cluster (10) is reflected off the partial surfaces (8) of the mirror in such a way that partial illumination beam clusters (11) project from the partial surfaces (8) of the mirror, together forming the illumination beam cluster having the different phase shifts.

公开(公告)号：EP1753010B1

公开(公告)日：2012-12-05

申请号：EP05017318.6

申请日：2005-08-09

申请人： Carl Zeiss SMS GmbH

发明人： Platzgummer, Elmar, Dr. Dipl.-Ing. ,  Stengl, Gerhard, Dr. Dipl.-Ing. ,  Falkner, Helmut

IPC分类号： H01J37/317 ,  H01J37/12 ,  B82Y10/00

CPC分类号： H01J37/12 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/3177