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    SELF-ALIGNING CONTACTS FOR STACKED ELECTRONICS
    21.
    发明公开
    SELF-ALIGNING CONTACTS FOR STACKED ELECTRONICS 审中-公开
    SELBSTAUSRICHTENDE KONTAKTEFÜRGESTAPELTE ELEKTRONIK

    公开(公告)号：EP1556738A2

    公开(公告)日：2005-07-27

    申请号：EP03770766.8

    申请日：2003-10-14

    申请人： NORTHROP GRUMMAN CORPORATION

    发明人： CLARK, Stewart, A.

    IPC分类号： G03F7/00 ,  G03F7/20

    CPC分类号： G03F7/0035 ,  G03F7/2008

    摘要： A method for providing self-aligned contact pads along an edge face of stacked electronics utilizes reflected light from the metal contact leads to define their location. A thin layer of light sensitive polymer is applied over the edge face, at which incident light is directed. A solvent developer is applied which dissolves the polymer where the reflected light passed. In a two-pass technique reflected light destroys an inhibitor in the polymer, and that portion of the layer is dissolved by a developer to delineate voids for contact pads. In a wavefront cancellation technique reflected light is 180° out of phase with the first pass of light, the combination not cross-linking molecules in the polymer, and that portion of the layer is dissolved to delineate voids for contact pads. In an alternative embodiment, a laser interrogation technique, a first incident light outside the absorption spectrum is reflected off the metal contacts leads, and a second incident light within the absorption spectrum is directed at the detected locations of the reflected light, those portions of the polymer in turn dissolved by the developer. The above method provides non-mechanical photo-lithographic techniques to accurately delineate voids for contact pads.

    摘要翻译： 用于沿堆叠电子器件的边缘面提供自对准接触焊盘的方法利用来自金属接触引线的反射光来限定它们的位置。 将光敏聚合物薄层施加在入射光引导的边缘面上。 应用溶解了反射光通过的聚合物的溶剂显影剂。 在双程技术中，反射光破坏聚合物中的抑制剂，并且该层的一部分被显影剂溶解以描绘接触垫的空隙。 在波前消除技术中，反射光与第一次通过光相差180°，该组合不会交联聚合物中的分子，并且该层的该部分被溶解以描绘用于接触焊盘的空隙。 在替代实施例中，激光询问技术，吸收光谱外部的第一入射光从金属接触引线反射，并且吸收光谱内的第二入射光指向被检测的反射光的位置， 聚合物又被显影剂溶解。 上述方法提供非机械光刻技术来准确地描绘接触垫的空隙。

    ROLL TO ROLL MASK-LESS LITHOGRAPHY WITH ACTIVE ALIGNMENT
    23.
    发明公开
    ROLL TO ROLL MASK-LESS LITHOGRAPHY WITH ACTIVE ALIGNMENT 审中-公开
    WALZE ZUM WALZEN VON MASKENLOSER LITHOGRAFIE MIT AKTIVER AUSRICHTUNG

    公开(公告)号：EP3061120A1

    公开(公告)日：2016-08-31

    申请号：EP14855840.6

    申请日：2014-09-24

    申请人： Applied Materials, Inc.

    发明人： WHITE, John MacNeill

    IPC分类号： H01L21/02 ,  H01L51/56 ,  H01L27/32

    CPC分类号： G03F7/70716 ,  G03F7/2008 ,  G03F7/2057 ,  G03F7/24 ,  G03F7/70291 ,  G03F7/70508 ,  G03F7/70791 ,  G03F9/7038 ,  G03F9/7088 ,  H01L21/67742 ,  H01L22/20 ,  H01L31/1876 ,  H01L51/0014 ,  H01L51/56 ,  H01L2251/5338

    摘要： Embodiments of the present invention relates to apparatus and methods for a maskless lithography on a flexible substrate with active alignment. In one embodiment, a lithography apparatus includes a cylindrical roller rotatable about a central axis and configured to transfer a flexible substrate on a cylindrical substrate supporting surface. A plurality of printing units, each includes an image sensing device and an imaging printing device, may be positioned facing the substrate supporting surface. The plurality of printing units may capture images of pre-existing patterns and/or markers on the flexible substrate as the flexible substrate is being tramsferred continiously and exposure patterns for each printing unit may be adjusted “on-the-fly” according to the captured image, thus achieving active alignment.

    摘要翻译： 本发明的实施例涉及在具有主动对准的柔性基板上进行无掩模光刻的装置和方法。 在一个实施例中，光刻设备包括可围绕中心轴线旋转并且被配置为将柔性基板传送到圆柱形基板支撑表面上的圆柱形滚柱。 每个包括图像感测装置和成像打印装置的打印单元可以被定位成面向基板支撑表面。 多个打印单元可以在柔性基板被连续地传送的同时在柔性基板上捕获预先存在的图案和/或标记的图像，并且可以根据捕获的“即时”调整每个印刷单元的曝光图案 图像，从而实现主动对准。

    OPTICAL ELEMENTS COMPRISING MAGNETOSTRICTIVE MATERIAL
    24.
    发明公开
    OPTICAL ELEMENTS COMPRISING MAGNETOSTRICTIVE MATERIAL 审中-公开
    光学元件的磁致伸缩材料

    公开(公告)号：EP2841996A1

    公开(公告)日：2015-03-04

    申请号：EP13712509.2

    申请日：2013-03-14

    申请人： Carl Zeiss SMT GmbH

    发明人： HUBER, Peter ,  DIER, Oliver

    IPC分类号： G03F7/20 ,  G02B26/08 ,  G02B27/00 ,  G02B17/06 ,  G21K1/06

    CPC分类号： G02F1/0128 ,  B82Y10/00 ,  G02B5/0816 ,  G02B5/0891 ,  G02B17/06 ,  G02B26/0816 ,  G02B27/0068 ,  G03F7/2008 ,  G03F7/70266 ,  G03F7/70891 ,  G03F7/7095 ,  G03F7/70958 ,  G21K1/062

    摘要： The invention relates to an optical element (21) comprising a substrate (30) and a reflective coating (31). The reflective coating (31) has, in particular for the reflection of EUV radiation, a plurality of layer pairs having alternate layers (33a, 33b) composed of a high refractive index material and a low refractive index material, wherein at least one active layer (34) composed of a magnetostrictive material is formed within the reflective coating (31). The invention also relates to an optical element (21) having a substrate (30) and a reflective coating (31), wherein the optical element (21 ) comprises at least one first active layer comprising a material having positive magnetostriction and at least one second active layer comprising a material having negative magnetostriction, wherein the layer thicknesses and the layer materials of the active layers are chosen such that mechanical stress changes or changes in length of the active layers that are produced by a magnetic field mutually compensate for one another. The invention also relates to an optical arrangement, in particular an EUV lithography apparatus, which comprises at least one such optical element (21).

    LIGHTING APPARATUS FOR PROVIDING LIGHT FOR PROCESSING AN OBJECT
    25.
    发明公开
    LIGHTING APPARATUS FOR PROVIDING LIGHT FOR PROCESSING AN OBJECT 审中-公开
    照明装置，提供光用于加工物体

    公开(公告)号：EP2839344A1

    公开(公告)日：2015-02-25

    申请号：EP13726873.6

    申请日：2013-04-16

    申请人： Koninklijke Philips N.V. ,  Philips GmbH

    发明人： GRONENBORN, Stephan ,  HEUSLER, Gero

    IPC分类号： G03F7/20

    CPC分类号： B41J2/45 ,  B41J2/315 ,  B41J2/455 ,  B41J2/47 ,  B41J2/475 ,  G03F7/2004 ,  G03F7/2008

    摘要： The invention relates to a lighting apparatus (2) for providing light for processing an object (3). A ring of light sources generates processing light for processing the object and an imaging unit (9) images the ring of light sources onto a working plane (16) in which the object is to be processed, wherein the ring of light sources and the imaging unit are configured such that images of the light sources in the working plane are distributed equidistantly in a direction being parallel to a diameter of the imaged ring in the working plane. The ring arrangement allows for a high quality imaging with a relatively small and technically simple optical element. A relatively small lighting apparatus can therefore be provided, which can be used for applications like laser printing.

    IMPROVED LITHOGRAPHIC PROCESS
    28.
    发明授权
    IMPROVED LITHOGRAPHIC PROCESS 有权
    改进方法光刻

    公开(公告)号：EP1692570B1

    公开(公告)日：2011-02-23

    申请号：EP04801253.8

    申请日：2004-12-01

    申请人： American Compass, Inc.

    发明人： JIANG, Kyle ,  JIN, Peng,

    IPC分类号： G03F7/20

    CPC分类号： G03F7/2008 ,  G03F7/20

    摘要： The present invention provides a lithographic process for producing high aspect ratio parts from an epoxy-type negative photoresist comprising the steps of: (i) irradiating a prebaked masked epoxy-type negative photoresist on a substrate with light at a total energy density of from 18,000 to 35,000mJ/cm2, (ii) post-baking the exposed photoresist at elevated temperature, and (iii) developing the exposed photoresist in a solvent, wherein no more than 15 % of the energy density is contributed by light having a wavelength of 400nm or less. The invention also discloses a reciprocating microengine (10) comprising a cylinder (14), piston (12) and crankshaft made by the process.

    Belichtungskopf und Verfahren zur Herstellung von Druckformen
    29.
    发明公开
    Belichtungskopf und Verfahren zur Herstellung von Druckformen 审中-公开

    公开(公告)号：EP2196855A1

    公开(公告)日：2010-06-16

    申请号：EP08105966.9

    申请日：2008-12-10

    申请人： CST GmbH

    发明人： Kesper, Peter

    IPC分类号： G03F7/20

    CPC分类号： G03F7/70291 ,  G03F7/2008 ,  G03F7/7005

    摘要： Die Erfindung betrifft einen Belichtungskopf zum selektiven Belichten einer photosensitiven Schicht (2) einer Druckform (3) mit einem mikroelektromechanischen Spiegelsystem (4) und mit mindestens einer einen Lichtstrahl (6,7) abgebenden Lichtquelle (9,10), wobei der Lichtstrahl (6,7) auf das mikroelektromechanische Spiegelsystem (4) gelenkt ist. Die Aufgabe, einen Belichtungskopf zur Verfügung zu stellen, der einen kompakteren Aufbau ermöglicht, wird dadurch gelöst, dass die Lichtquelle (9,10) eine Leuchtdiode ist. Darüber hinaus betrifft die Erfindung ein Verfahren zur Herstellung von Druckformen, das einen schnelleren Start der Belichtung dadurch ermöglicht, dass der Lichtstrahl (6,7) von einer Leuchtdiode abgegeben wird.

    摘要翻译： 曝光头（1）具有分别发射光束的两个光源（9,10）即LED，其中光束被引导到微机电镜系统（4）。 从各个光源发射的光束的平均波长在350nm和450nm之间。 光源安装在公共载体（11）上。 冷却体（12）固定在载体上以散发由光源传递的热量。 冷却液流过冷却体。 通过用曝光头选择性地曝光感光层，还包括用于制造印版的方法的独立权利要求。