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43 条记录 (耗时 0.016 秒)

    PLASMA TREATMENT OF SUBSTRATES
    21.
    发明公开
    PLASMA TREATMENT OF SUBSTRATES 审中-公开
    等离子体处理基质的

    公开(公告)号：EP2777367A1

    公开(公告)日：2014-09-17

    申请号：EP12781043.0

    申请日：2012-11-02

    申请人： Dow Corning France ,  Centre National de la Recherche Scientifique (CNRS)

    发明人： GAUDY, Thomas ,  DESCAMPS, Pierre ,  LEEMPOEL, Patrick ,  KAISER, Vincent ,  ASAD, Syed Salman ,  MASSINES, Francoise

    IPC分类号： H05H1/00 ,  H05H1/42 ,  H05H1/48

    CPC分类号： C23C16/50 ,  H05H1/2406 ,  H05H1/42 ,  H05H1/48 ,  H05H2001/2418 ,  H05H2245/123

    摘要： An apparatus for plasma treating a substrate comprises a high voltage source of frequency 3kHz to 30kHz connected to at least one needle electrode (11) positioned within a channel (16) inside a dielectric housing (14) having an inlet for process gas and an outlet. The channel (16) has an entry (16a) which forms the said inlet for process gas and an exit (16e) into the dielectric housing arranged so that process gas flows from the inlet through the channel (16) past the electrode (11) to the outlet of the dielectric housing. The apparatus includes means for introducing an atomised surface treatment agent in the dielectric housing, and support means (27, 28) for the substrate (25) adjacent to the outlet of the dielectric housing. The needle electrode (11) extends from the channel entry (16a) to a tip (11t) close to the exit (16e) of the channel and projects outwardly from the channel (16) so that the tip (11t) of the needle electrode is positioned in the dielectric housing close to the exit (16e) of the channel at a distance outside the channel of at least 0.5mm up to 5 times the hydraulic diameter of the channel. The channel (16) has a ratio of length to hydraulic diameter greater than 10:1.

    PLASMA CVD APPARATUS
    23.
    发明公开
    PLASMA CVD APPARATUS 有权
    PLASMA-CVD-VORRICHTUNG

    公开(公告)号：EP2653586A1

    公开(公告)日：2013-10-23

    申请号：EP11848774.3

    申请日：2011-11-25

    申请人： Kabushiki Kaisha Kobe Seiko Sho

    发明人： TAMAGAKI, Hiroshi ,  OKIMOTO, Tadao

    IPC分类号： C23C16/503 ,  C23C16/54 ,  H05H1/46

    CPC分类号： C23C16/50 ,  C23C16/4588 ,  C23C16/503 ,  C23C16/54 ,  H01J37/32018 ,  H01J37/32568 ,  H01J37/32669 ,  H01J37/32752 ,  H01J37/32761 ,  H01J37/3277 ,  H01J2237/3321 ,  H05H1/46 ,  H05H2245/123

    摘要： A plasma CVD apparatus according to the present invention is provided with: a vacuum chamber 4; a pair of deposition rollers 2, 2, each of which is disposed in the vacuum chamber 4, and has a substrate W wound thereon, the substrate on which a coating is deposited; and magnetic field generating sections 8, 15, each of which forms a deposition area where the coating is deposited on the substrate W wound on each deposition roller 2 by generating a magnetic field that generates plasma on the surface of each deposition roller 2. The pair of deposition rollers 2, 2 are composed of a first deposition roller 2, and a second deposition roller 2, which is disposed at an interval from the first deposition roller 2 such that the shaft core of the second deposition roller is parallel to that of the first deposition roller 2. The magnetic field generating sections 8, 15 are disposed such that a first deposition area 19, as the deposition area, is formed in a space 3 between the pair of deposition rollers 2, 2, and that a second deposition area 20 is formed in a region adjacent to the surface of the deposition roller 2 and other than the space 3.

    摘要翻译： 根据本发明的等离子体CVD装置具有：真空室4; 一对沉积辊2,2，其分别设置在真空室4中，并具有卷绕在其上的基板W，沉积有涂层的基板; 以及磁场产生部分8,15，每个磁场产生部分通过在每个沉积辊2的表面上产生产生等离子体的磁场形成沉积区域，其中涂层沉积在卷绕在每个沉积辊2上的基板W上。 的沉积辊2,2由第一沉积辊2和第二沉积辊2组成，第二沉积辊2与第一沉积辊2间隔设置，使得第二沉积辊的轴芯平行于 第一沉积辊2.磁场产生部分8,15被布置成使得作为沉积区域的第一沉积区域19形成在一对沉积辊2,2之间的空间3中，并且第二沉积区域 20形成在与沉积辊2的表面相邻的区域中，而不是空间3。

    COATING FORMING DEVICE, AND METHOD FOR PRODUCING COATING FORMING MATERIAL
    24.
    发明公开
    COATING FORMING DEVICE, AND METHOD FOR PRODUCING COATING FORMING MATERIAL 有权
    BESCHICHTUNGSFORMUNGSVORRICHTUNG SOWIE VERFAHREN ZUR HERSTELLUNG EINES BESCHICHTUNGSFORMUNGSMATERIALS

    公开(公告)号：EP2543443A1

    公开(公告)日：2013-01-09

    申请号：EP11750780.6

    申请日：2011-03-03

    申请人： Imagineering, Inc.

    发明人： IKEDA Yuji

    IPC分类号： B05B5/06 ,  B05C9/10 ,  B05D3/04

    CPC分类号： B05B7/228 ,  B05B5/0533 ,  B05B7/205 ,  B05B12/084 ,  B05B13/0228 ,  B05C9/14 ,  B05C11/1005 ,  B05C17/00546 ,  B05D1/02 ,  B05D3/141 ,  H05H1/46 ,  H05H1/52 ,  H05H2001/463 ,  H05H2245/123

    摘要： A coat forming apparatus 100 includes a droplet supply unit 110 and an active species supply unit 120. The droplet supply unit 110 is adapted to spray or drop a droplet for coat forming toward an object 116. The active species supply unit 120 is adapted to supply an active species to be brought into contact with the droplet moving from the droplet supply unit 110 toward the object 116. The coating is formed on a surface of the object 116 by the droplet that has been brought into contact with the active species.

    摘要翻译： 涂层形成装置100包括液滴供给单元110和活性物质供应单元120.液滴供应单元110适于向物体116喷射或滴落用于涂层成形的液滴。活性物质供应单元120适于供应 与从液滴供给单元110朝向物体116移动的液滴接触的活性物质。涂层通过与活性物质接触的液滴形成在物体116的表面上。

    VORRICHTUNG ZUR ERZEUGUNG EINES PLASMAS UND HANDGERÄT MIT DER VORRICHTUNG
    29.
    发明公开
    VORRICHTUNG ZUR ERZEUGUNG EINES PLASMAS UND HANDGERÄT MIT DER VORRICHTUNG 审中-公开
    梵蒂冈

    公开(公告)号：EP2948991A1

    公开(公告)日：2015-12-02

    申请号：EP14704656.9

    申请日：2014-01-08

    申请人： Relyon Plasma Gmbh ,  EPCOS AG

    发明人： NETTESHEIM, Stefan ,  KORZEC, Dariusz ,  BURGER, Dominik

    IPC分类号： H01L41/107 ,  H05H1/24 ,  H01L41/312 ,  H01L41/313

    CPC分类号： H05H1/24 ,  H01L41/053 ,  H01L41/107 ,  H05H2001/2481 ,  H05H2240/10 ,  H05H2245/123

    摘要： The invention relates to an apparatus (1) for producing a plasma (P), comprising a control circuit (3) which is electrically connected to a piezoelectric transformer in order to excite the piezoelectric transformer (5). The invention further relates to a hand-held device (100) that uses the apparatus (1). The piezoelectric transformer (5) is constructed of several layers (S1, S2,..., SN). The control circuit (3) is implemented on a circuit board (7), and the piezoelectric transformer (5) is held over the circuit board (7) by means of a region (6B) of a first end (6). A high voltage is applied to a second free end (8) of the piezoelectric transformer (5), wherein the plasma (P) is produced at atmospheric pressure.

    摘要翻译： 一种用于制造等离子体的装置，包括电连接到压电变压器以激励压电变压器的控制电路。 使用该装置的手持式装置。 压电变压器由几层构成。 控制电路在电路板上实现，并且压电变压器通过第一端的区域保持在电路板上。 高压被施加到压电变压器的第二自由端。 等离子体在大气压下产生。