公开(公告)号：EP1963812B1

公开(公告)日：2011-11-30

申请号：EP06829651.6

申请日：2006-12-15

申请人： Carl Zeiss SMS GmbH

发明人： GREIF-WÜSTENBECKER, Jörn ,  STRÖSSNER, Ulrich

IPC分类号： G01M11/02

CPC分类号： G01M11/0285 ,  G03F7/705 ,  G03F7/70566 ,  G03F7/70591 ,  G03F7/7085

摘要： The invention relates to a method for analysing the imaging behaviour of a first optical imaging element, whereby an object is imaged into an image plane by a second optical imaging element and light in the image plane is detected in a spatially resolved manner, the two optical imaging elements differing in terms of at least one imaging characteristic. Values are determined for the intensity and for at least one second characteristic of the light, said values being then stored in image points, and processed in an emulation step. An emulation image is produced, emulating the imaging of the object by the first optical imaging element, taking into account the influence of the second characteristic. A series of images is produced by dividing a range of values of the second characteristic into subdomains, associating an image with each subdomain, and associating the corresponding intensity value with the image points of each image, in case the value of the second characteristic, associated with the image point, falls in the subdomain associated with the respective image. Otherwise, a pre-determined intensity value is associated therewith. The series of images is converted into a series of intermediate images in the emulation step. A constant value of the second characteristic is used in the emulation for each intermediate image, said value originating from the respective subdomain and differing from the values of the second characteristic for the other intermediate images. The intermediate images are then combined to form an emulation image.

公开(公告)号：EP1892748B1

公开(公告)日：2011-10-19

申请号：EP07022228.6

申请日：2003-02-25

申请人： Carl Zeiss NTS GmbH ,  Carl Zeiss SMS GmbH

发明人： Koops, Hans, W., P. ,  Hoffrogge, Peter

IPC分类号： H01J37/305 ,  H01J37/301 ,  H01J37/18

CPC分类号： H01J37/18 ,  H01J37/3056 ,  H01J2237/006 ,  H01J2237/162 ,  H01J2237/166 ,  H01J2237/31744

公开(公告)号：EP2368152A1

公开(公告)日：2011-09-28

申请号：EP09778702.2

申请日：2009-09-24

申请人： Carl Zeiss SMS GmbH

发明人： BUDACH, Michael

IPC分类号： G03F1/00 ,  G01Q40/02

CPC分类号： G03F1/74 ,  G01Q30/06 ,  G01Q80/00 ,  G03F1/84 ,  H01J2237/2817 ,  Y10T29/49718

摘要： The invention relates to a method for determining a repair shape (60, 260) of a defect (30, 200) on or in the vicinity of an edge (32, 232) of a substrate (100), comprising the steps of scanning the defect (30, 200) using a scanning probe microscope for determining a three-dimensional contour (40, 240) of the defect (30, 200), scanning the defect (30, 200) using a scanning electron microscope for determining the course (50, 250) of the at least one edge (32, 232) of the substrate (100), and determining the repair shape (60, 260) of the defect (30, 200) from a combination of the three-dimensional contour (40, 240) and the course (50, 250) of the at least one edge (32, 232).

摘要翻译： 在确定的缺陷的修复形式或接近上的基板的边缘。 缺陷可以用扫描探针显微镜来确定矿缺陷的三维轮廓进行扫描。 缺陷可以用扫描粒子显微镜确定性矿的基板的至少一个边缘的形状来扫描。 缺陷的修复形式可以从三维轮廓的组合，并且所述至少一个边缘的形状来确定的开采。

公开(公告)号：EP2257853A2

公开(公告)日：2010-12-08

申请号：EP09715092.4

申请日：2009-02-24

申请人： Carl Zeiss SMS GmbH

发明人： BUDACH, Michael ,  BRET, Tristan ,  EDINGER, Klaus ,  HOFMANN, Thorsten

IPC分类号： G03F1/00

CPC分类号： G03F1/74 ,  C23C16/047 ,  H01J37/304 ,  H01J37/3056 ,  H01J2237/24495 ,  H01J2237/30466 ,  H01J2237/30483 ,  H01J2237/31732 ,  H01J2237/31744

摘要： The present invention relates to a method for processing an object with miniaturized structures, having the steps of : feeding a reaction gas onto a surface of the object; processing the object by directing an energetic beam onto a processing site in a region, which is to be processed, on the surface of the object, in order to deposit material on the object or to remove material from the object, detecting interaction products of the beam with the object, and deciding whether the processing of the object must be continued or can be terminated with the aid of information which is obtained from the detected interaction products of the beam with the object, the region to be processed being subdivided into a number of surface segments, and the interaction products detected upon the beam striking regions of the same surface segment being integrated to form a total signal in order to determine whether processing of the object must be continued or can be terminated.

公开(公告)号：EP1875307B1

公开(公告)日：2009-08-05

申请号：EP06706655.5

申请日：2006-02-04

申请人： Carl Zeiss SMS GmbH ,  Synopsys GmbH

发明人： HARNISCH, Wolfgang ,  ZIBOLD, Axel ,  BÖHM, Klaus ,  KALUS, Christian ,  SCHMÖLLER, Thomas

IPC分类号： G03F1/00 ,  G03F7/20

CPC分类号： G03F1/84 ,  G03F7/7065 ,  G03F7/70666

摘要： The invention relates to a mask inspection method that can be used for the design and production of masks, in order to detect relevant weak points early on and to correct the same. According to said method for mask inspection, an aerial image simulation, preferably an all-over aerial image simulation, is carried out on the basis of the mask design converted into a mask layout, in order to determine a list of hot spots. The mask/test mask is analysed by means of an AIMS tool, whereby real aerial images are produced and compared with the simulated aerial images. The determined differences between the aerial images are used to improve the mask design. The inventive arrangement enables a method to be carried out for mask inspection for mask design and mask production. The use of the AIMS tool directly in the mask production process essentially accelerates the mask production, while reducing the error rate and cost.

公开(公告)号：EP1943660A1

公开(公告)日：2008-07-16

申请号：EP05801831.8

申请日：2005-10-28

申请人： Carl Zeiss SMS GmbH

发明人： PLATZGUMMER, Elmar ,  KNIPPELMEYER, Rainer

IPC分类号： H01J37/04 ,  H01J37/317

CPC分类号： H01J37/3177 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/045 ,  H01J37/3023 ,  H01J2237/0435 ,  H01J2237/30472 ,  H01J2237/31754 ,  H01J2237/31774

摘要： A charged particle beam exposure system has a blanking aperture array (31) having groups of apertures (53) controlled by shift registers (75), wherein different inputs (C) to the shift registers influence a different number of apertures. Charged particle beamlets traversing the apertures are scanned across a charged particle sensitive substrate in synchronism with a clock signal of the shift registers.

公开(公告)号：EP1616222B1

公开(公告)日：2007-03-21

申请号：EP04728345.2

申请日：2004-04-20

申请人： Carl Zeiss SMS GmbH

发明人： DOBSCHAL, Hans-Jürgen ,  HARNISCH, Wolfgang ,  SCHERÜBL, Thomas ,  ROSENKRANZ, Norbert ,  SEMMLER, Ralph

IPC分类号： G03F1/00

CPC分类号： B82Y10/00 ,  B82Y40/00 ,  G01N21/956 ,  G03F1/24 ,  G03F1/84

摘要： The invention relates to an arrangement for inspecting objects, especially masks in microlithography. Said masks are disposed in a vacuum chamber. A converter converts illuminating radiation emitted from the object into radiation of a higher wave length. A sensor is also provided for recording images. The sensor is disposed outside the vacuum chamber and is arranged as an optical interface between the vacuum chamber to the sensor of the converter or at least one part of an image lens is arranged as a window in the vacuum chamber.

公开(公告)号：EP1631809B1

公开(公告)日：2006-11-29

申请号：EP04739798.9

申请日：2004-06-11

申请人： Carl Zeiss SMS GmbH

发明人： ENGEL, Thomas ,  GROSS, Herbert

IPC分类号： G01M11/02

CPC分类号： G01M11/0257

摘要： The invention relates to a method for determining the image quality of an optical imaging system and to the use of the inventive method for determining the influence of samples on the amplitude distribution and on the phase front distribution of the illuminating light of which the amplitude distribution, in particular, is known. The invention comprises the following steps: adjusting the subassemblies relative to one another whereby making it possible to project images of a sample onto the detection device; recording a number of images of the sample from different planes of reference near the best focus plane; improving the image quality by image processing, particularly by reducing the noise in order to compare local sensitivity differences of the detection device and to center the intensity concentration points at a predetermined location in the images; computational linking of locally resolved image information, of the set values and system values related to the optical imaging system, and of information concerning the sample with the aim of determining characteristic numbers that are characteristic of the wave front deformation caused by the imaging system, and; outputting the characteristic numbers and assigning them to the imaging system in order to describe the image quality.

摘要翻译： 本发明涉及一种用于确定光学成像系统的图像质量的方法以及本发明的方法用于确定样本对幅度分布和照明光的相位正面分布的影响，其幅度分布， 特别是已知的。 本发明包括以下步骤：相对于彼此调整子组件，从而使得能够将样本的图像投影到检测装置上; 在最佳聚焦平面附近从不同参考平面记录样本的多个图像; 通过图像处理改善图像质量，特别是通过降低噪声以比较检测装置的局部灵敏度差异并将强度集中点居中在图像中的预定位置处; 计算局部解析的图像信息的计算链接，与光学成像系统有关的设定值和系统值以及与样本有关的信息的计算链接，目的是确定成像系统引起的波阵面变形的特征数字，以及 ; 输出特征数并将它们分配给成像系统以描述图像质量。

公开(公告)号：EP1644775A2

公开(公告)日：2006-04-12

申请号：EP04740612.9

申请日：2004-07-03

申请人： Carl Zeiss SMS GmbH

发明人： SEITZ, Holger ,  WINDPASSINGER, Roman

IPC分类号： G03F1/00

CPC分类号： G03F1/84 ,  G03F1/70 ,  G03F7/70666

摘要： The invention relates to a method for analysing objects in microlithography, preferably masks with the aid of aerial image measurement systems (AIMS) comprising at least two imaging stages wherein a detected image is corrected by means of a correction filter with respect to the dynamic systems behaviour of a second imaging stage or another imaging stage, the lighting of the object being carried out by incident and/or transmitted light. The resulted correction is such that corrected output quantities correspond to the image of a photolithography stepper or scanner, said correction being made by reconvolution and the measured correction values being taken into account for the correction.

公开(公告)号：EP1631809A1

公开(公告)日：2006-03-08

申请号：EP04739798.9

申请日：2004-06-11

申请人： Carl Zeiss SMS GmbH

发明人： ENGEL, Thomas ,  GROSS, Herbert

IPC分类号： G01M11/02

CPC分类号： G01M11/0257

摘要： The invention relates to a method for determining the image quality of an optical imaging system and to the use of the inventive method for determining the influence of samples on the amplitude distribution and on the phase front distribution of the illuminating light of which the amplitude distribution, in particular, is known. The invention comprises the following steps: adjusting the subassemblies relative to one another whereby making it possible to project images of a sample onto the detection device; recording a number of images of the sample from different planes of reference near the best focus plane; improving the image quality by image processing, particularly by reducing the noise in order to compare local sensitivity differences of the detection device and to center the intensity concentration points at a predetermined location in the images; computational linking of locally resolved image information, of the set values and system values related to the optical imaging system, and of information concerning the sample with the aim of determining characteristic numbers that are characteristic of the wave front deformation caused by the imaging system, and; outputting the characteristic numbers and assigning them to the imaging system in order to describe the image quality.