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公开(公告)号：EP2563947A1
公开(公告)日：2013-03-06
申请号：EP11721856.0
申请日：2011-04-29
申请人： Corning Incorporated
发明人： SCHREIBER, Horst , WANG, Jue
CPC分类号： G02B5/283 , B82Y10/00 , B82Y40/00 , C03C17/3636 , C03C17/40 , C03C2218/32 , C23C14/22 , C23C14/5833 , C23C14/5873 , G02B5/0891 , G03F1/24
摘要： The disclosure is directed to multilayer Mo/Si coatings for reflective mirrors used in extreme ultraviolet lithographic systems and to a method of making such mirrors using plasma ion assisted deposition (PIAD) techniques. The coating are deposited on a substrate suitable for EUV lithography, and are Mo/Si coating consisting of 40-100 Mo/Si periods, each period consisting on a Mo layer followed by a Si layer. Each of the individual Mo and Si layers is deposited to a specified or target thickness in the range of 2nm to 5nm, and the thicknesses are controlled to 0.1nm. A plasma from a plasma source is used to densify and smooth the substrate prior to deposition of the coating, and each layer of the coating is plasma densified and smoothed.
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32.发明授权METHOD OF MAKING A COATED ARTICLE WITH OXIDATION GRADED LAYER PROXIMATE IR REFLECTING LAYER(S) 有权制造方法涂覆的物体，用梯度接近于（A）红外反射层（DE）
公开(公告)号：EP1753703B1
公开(公告)日：2012-03-28
申请号：EP05738839.9
申请日：2005-04-26
申请人： GUARDIAN INDUSTRIES CORP. , Centre Luxembourgeois de Recherches pour le Verre et la Céramique S.A. (C.R.V.C.)
CPC分类号： C23C14/5833 , C03C17/36 , C03C17/3618 , C03C17/3639 , C03C17/3644 , C03C17/3652 , C03C17/366 , C03C17/3689 , C03C17/3694 , C03C23/0055 , C03C2217/78 , C03C2218/322 , C23C14/08 , C23C14/185 , C23C14/5853
摘要： A coated article is provided that may be heat treated in certain example embodiments. A grader layer (e.g., contact layer or other suitable layer) is formed by initially sputter-depositing a layer, and thereafter ion beam treating the sputter-deposited layer with at least reactive gas ions in order to form a graded layer. In certain example embodiments, the result is a coated article that has improved visible transmission and/or durability, without sacrificing optional heat treatability.
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公开(公告)号：EP1994196A1
公开(公告)日：2008-11-26
申请号：EP07758228.6
申请日：2007-03-09
发明人： SFERLAZZO, Piero , MAO, Ming , CHEN, Jinliang , FELSENTHAL, David , HIERONYMI, Robert, Gabriel , EROR, Miroslav
CPC分类号： C23C14/352 , C23C14/505 , C23C14/568 , C23C14/5833
摘要： The present invention relates to a sputter deposition system 10 and to methods of use thereof for processing substrates 12 using planetary sputter deposition methods. The sputter deposition system 10 includes a deposition chamber 14 having an azimuthal axis 16. A rotatable member 30 and 32 is situated in the chamber 14 and includes a plurality of magnetrons 34 provided thereon. Each magnetron 34 includes a corresponding one of a plurality of sputtering targets 36. The rotatable member 30, 32 is configured to position each of the magnetrons 34 to direct sputtered material from the corresponding one of the sputtering targets 36 to a deposition zone 50 defined in the deposition chamber 14. A transport mechanism 66 is situated in the deposition chamber 14 and includes an arm 68 rotatable about the azimuthal axis 16. A substrate holder 72 is attached to the arm 68 of the transport mechanism 66 and supports the substrate 12 as the arm 68 rotates the substrate holder 72 to intersect the deposition zone 50 for depositing sputtered material on the substrate 12.
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公开(公告)号：EP1816233A2
公开(公告)日：2007-08-08
申请号：EP07008531.1
申请日：2001-05-22
CPC分类号： C23C14/5833 , C23C14/58 , C23C14/5873 , C23C16/56 , C23F4/00 , H01C17/2404 , H03H3/04 , H03H2003/0414
摘要： Erfindungsgemäß wird ein Verfahren zur Herstellung einer Schicht mit einem lokal angepaßtem bzw. vorgegebenen Schichtdickenprofil bereitgestellt, das die folgenden Schritte umfaßt:
a) zumindest eine Schicht wird auf ein Substrat aufgebracht,
b) ein Abtragsprofil wird für die aufgebrachten Schicht bestimmt, und
c) zumindest ein Ionenstrahl wird zumindest einmal über die Schicht geführt, so daß am Ort des Ionenstrahls eine lokale Ätzung der Schicht entsprechend dem Abtragsprofil erfolgt und eine Schicht mit einem lokal angepaßtem bzw. vorgegebenen Schichtdickenprofil erzeugt wird.摘要翻译： 制备具有局部适应和/或预定义的层厚度分布的层包括将层施加到基底上; 确定应用层的移除轮廓; 并引导离子束一次在层上，使得该层在对应于去除轮廓的离子束的位置局部蚀刻，并且产生具有局部适应和/或预定义的层厚度轮廓的层。 优选地，离子束的扩散大于1，优选大于5mm，或小于100mm，优选小于50mm。 离子束是具有高斯电流密度分布的氩离子束。 离子束在层上的轨迹上被引导，并且轨迹距离小于梁的半宽度扩展。
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35.发明公开COATED ARTICLE HAVING LOW-E COATING WITH ION BEAM TREATED IR REFLECTING LAYER AND CORRESPONDING METHOD 审中-公开用离子束处理红外反射层及相应方法LOW-E涂层涂覆制品
公开(公告)号：EP1784521A2
公开(公告)日：2007-05-16
申请号：EP05803720.1
申请日：2005-07-15
CPC分类号： C03C17/36 , B32B17/10036 , B32B17/10174 , B32B17/10761 , C03C17/002 , C03C17/3618 , C03C17/3626 , C03C17/3639 , C03C17/3644 , C03C17/3652 , C03C17/366 , C03C17/3681 , C03C17/3694 , C03C2217/78 , C03C2218/154 , C03C2218/32 , C23C14/0652 , C23C14/185 , C23C14/3442 , C23C14/35 , C23C14/5833 , C23C14/586
摘要： A coated article is provided that may be used as a vehicle windshield, insulating glass (IG) window unit, or the like. An ion beam is used to treat an infrared (IR) reflecting layer(s) of such a coated article. Advantageously, this has been found to improve sheet resistance (RS) properties, emittance, solar control properties, and/or durability of the coated article.
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36.发明公开
公开(公告)号：EP1759032A1
公开(公告)日：2007-03-07
申请号：EP05763278.8
申请日：2005-06-22
发明人： VEERASAMY, Vijayen
CPC分类号： C23C14/5833 , B32B17/10036 , B32B17/10174 , B32B17/10761 , C03C17/36 , C03C17/3626 , C03C17/3639 , C03C17/3644 , C03C17/366 , C03C17/3681 , C03C17/3694 , C03C23/0055 , C03C2217/78 , C03C2218/154 , C03C2218/326 , C23C14/0652 , C23C14/586
摘要： A coated article is provided that may be used as a vehicle windshield, insulating glass (IG) window unit, or the like. Ion beam treatment is performed on a layer(s) of the coating. For example, an overcoat layer (e.g., of silicon nitride) of a low-E coating may be ion beam treated in a manner so as to cause the ion beam treated layer to include (a) nitrogen-doped Si 3 N 4 , and/or (b) nitrogen graded silicon nitride. It has been found that this permits durability of the coated article to be improved.
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37.发明公开COATED ARTICLE WITH OXIDATION GRADED LAYER PROXIMATE IR REFLECTING LAYER(S) AND CORRESPONDING METHOD 有权制造方法涂覆的物体，用梯度接近于（A）红外反射层（DE）
公开(公告)号：EP1753703A1
公开(公告)日：2007-02-21
申请号：EP05738839.9
申请日：2005-04-26
CPC分类号： C23C14/5833 , C03C17/36 , C03C17/3618 , C03C17/3639 , C03C17/3644 , C03C17/3652 , C03C17/366 , C03C17/3689 , C03C17/3694 , C03C23/0055 , C03C2217/78 , C03C2218/322 , C23C14/08 , C23C14/185 , C23C14/5853
摘要： A coated article is provided that may be heat treated in certain example embodiments. A grader layer (e.g., contact layer or other suitable layer) is formed by initially sputter-depositing a layer, and thereafter ion beam treating the sputter-deposited layer with at least reactive gas ions in order to form a graded layer. In certain example embodiments, the result is a coated article that has improved visible transmission and/or durability, without sacrificing optional heat treatability.
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公开(公告)号：EP0992606B1
公开(公告)日：2005-12-07
申请号：EP99307657.9
申请日：1999-09-28
申请人： ROLLS-ROYCE PLC
CPC分类号： C23C14/5833 , C23C14/165 , C23C14/3407 , C23C14/35 , H01J37/34 , H01J37/342
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公开(公告)号：EP1115950B1
公开(公告)日：2003-11-05
申请号：EP99946027.2
申请日：1999-08-26
发明人： RÜCKERT, Hans , SCHOOF, Ulrich
CPC分类号： C23C14/5833 , B05C11/025 , D21H25/12
摘要： Known doctor rods (1) used as dosing elements in coating devices have a cylindrical steel base body on whose cover surface a chromium or ceramic layer of hard material is applied. According to the invention, the cracks and craters in the layer of hard material are closed by a joint which is produced by means of an ion implantation process, by the hard material reacting with the ions applied in a plasma. The improved doctor rods have a longer service life than known doctor rods.
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40.发明公开Hexagonal boron nitride film with low dielectric constant, layer dielectric film and method of production thereof, and plasma CVD apparatus 有权具有与介电涂层和方法，用于其生产的低介电常数膜六边形氮化硼膜，等离子体CVD装置
公开(公告)号：EP1167291A1
公开(公告)日：2002-01-02
申请号：EP01114805.3
申请日：2001-06-27
发明人： Sakamoto, Hitoshi, Mitsubishi Heavy Ind., Ltd. , Nishimori, Toshihiko, Mitsubishi Heavy Ind., Ltd. , Sonobe, Hiroshi, Mitsubishi Heavy Ind., Ltd. , Yonekura, Yoshimichi, Mitsubishi Heavy Ind., Ltd. , Yamashita, Nobuki, Mitsubishi Heavy Ind., Ltd.
IPC分类号： C01B21/064
CPC分类号： C23C14/5833 , C04B35/583 , C04B2235/761 , C04B2235/767 , C23C14/0052 , C23C14/0647 , C23C16/342 , C23C16/507 , C23C16/56 , H01L21/318 , H01L21/76828 , H01L21/76829 , H01L21/76835 , H01L23/5329 , H01L2924/0002 , H01L2924/12044 , H01L2924/00
摘要： Provided are a hexagonal boron nitride film having a specific inductance of 3.0 or less, a hexagonal boron nitride film wherein the total content of the bonds between a nitrogen atom and a hydrogen atom and between a boron atom and a hydrogen atom is 4 mol% or less, a hexagonal boron nitride film in which a spacing in the c-axis direction is extended by 5 to 30% but the extension of a spacing in the a-axis direction is limited within 5% and a hexagonal boron nitride film in which the direction of the c-axis is parallel to a substrate. There is also provided a layer dielectric film using each of these hexagonal boron nitride films. Also, there is also provided a method of producing a hexagonal boron nitride film by using an ion deposition method.
摘要翻译： 本发明提供一种六方氮化硼薄膜具有3.0或更小，具体的电感的六方氮化硼薄膜worin氮原子和氢原子之间和硼原子和氢原子之间的键的总含量为4摩尔％或 以下，六方晶氮化硼薄膜，其中在c轴方向上的间隔由5延长至30％，但在a轴方向上的间隔的延长为5％和六方氮化硼内限制膜，其中所述 c轴的方向平行于基片。 因此本发明提供一种层电介质膜，使用每个六边形氮化硼论文膜构成。 因此，有由此薄膜通过使用离子沉积法提供了一种生产的六方氮化硼的制造方法。
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