公开(公告)号：EP4187724B1

公开(公告)日：2024-06-05

申请号：EP21211527.3

申请日：2021-11-30

IPC分类号： H01S3/03 ,  H01S3/038 ,  H01S3/041 ,  H01S3/0975 ,  H01S3/04 ,  H01S3/0971 ,  H01S3/223 ,  H01S3/097

CPC分类号： H01S3/0315 ,  H01S3/041 ,  H01S3/038 ,  H01S3/0407 ,  H01S3/2232 ,  H01S3/0971 ,  H01S3/09702

公开(公告)号：EP4187724A1

公开(公告)日：2023-05-31

申请号：EP21211527.3

申请日：2021-11-30

申请人： Kern Technologies, LLC

发明人： WEIHER, Keith L ,  KERN, Gerald L ,  COLBY, Jacob D ,  JACKSON, Paul E

IPC分类号： H01S3/03 ,  H01S3/038 ,  H01S3/041 ,  H01S3/0975 ,  H01S3/04 ,  H01S3/0971 ,  H01S3/223 ,  H01S3/097

摘要： A radio frequency, RF, slab laser comprising a live electrode (102) and a ground electrode (108) whose inwardly facing surfaces face each other to form a gap for forming a plasma discharge when the live electrode is supplied with a suitable RF drive signal. The electrodes are enclosed in a vacuum space by a vacuum housing (114) with an access aperture (116). The access aperture is sealed with a vacuum flange (70) that comprises an electrically insulating connector. A plurality of hollow conductors (62) are arranged to extend through the vacuum flange into the vacuum space and connect with the live electrode. The hollow conductors connect to the live electrode to supply it with its RF drive signal and also coolant fluid which is distributed through fluid circulation channels (80a, 80b). Coolant fluid is supplied to the live electrode through certain ones of the hollow conductors and taken out by others.

公开(公告)号：EP2712471A1

公开(公告)日：2014-04-02

申请号：EP12718545.2

申请日：2012-04-23

申请人： Coherent, Inc.

发明人： DEMARIA, Anthony, J. ,  AUSTIN, R., Russel

IPC分类号： H01S3/03 ,  H01S3/223 ,  H01S3/038 ,  H01S3/081 ,  H01S3/0975 ,  H01S3/032 ,  H01S3/036

CPC分类号： H01S3/038 ,  H01S3/0305 ,  H01S3/0315 ,  H01S3/036 ,  H01S3/0385 ,  H01S3/0816 ,  H01S3/0975 ,  H01S3/2232

摘要： A gas-discharge waveguide CO2 laser has a Z-shaped folded waveguide formed by three ceramic tubes. Ends of the adjacent tubes are shaped and fitted together to form a common aperture. The tubes are held fitted together by spaced-apart parallel discharge electrodes. Four mirrors are arranged to form a laser-resonator having a longitudinal axis extending through the tubes.

公开(公告)号：EP2565994A1

公开(公告)日：2013-03-06

申请号：EP11007186.7

申请日：2011-09-05

申请人： ALLTEC Angewandte Laserlicht Technologie Gesellschaft mit beschränkter Haftung

发明人： Armbruster, Kevin L. ,  Gilmartin, Brad D. ,  Kueckendahl, Peter J. ,  Richard, Bernard J. ,  Ryan, Daniel J.

IPC分类号： H01S3/03 ,  H01S3/07 ,  H01S3/23 ,  H01S3/00 ,  H01S3/041 ,  H01S3/0975 ,  H01S3/223 ,  B23K26/06 ,  B23K26/08

CPC分类号： G02B26/10 ,  B23K26/00 ,  B23K26/0608 ,  B23K26/082 ,  B23K26/142 ,  B23K26/702 ,  B23K26/703 ,  H01S3/0071 ,  H01S3/03 ,  H01S3/041 ,  H01S3/076 ,  H01S3/0975 ,  H01S3/2232 ,  H01S3/2383

摘要： The invention relates to a laser device comprising at least two laser units (10), which are stacked in layers, each laser unit being configured to emit a laser beam, and each laser unit comprising a plurality of resonator tubes (12) for a gas to be excited, the resonator tubes being in fluidic communication with each other and forming a common tubular space, connecting elements (20,21) for connecting adjacent resonator tubes, excitation means (70) for the resonator tubes for exciting the gas in the resonator tubes for generating a laser light, mirrors (22) arranged in the connecting elements for reflecting the laser light between the resonator tubes, and a partially reflecting output coupler (42) for coupling out a laser beam. The invention also relates to a method for marking an object.

摘要翻译： 本发明涉及一种激光装置，其包括层叠的至少两个激光单元（10），每个激光单元被配置为发射激光束，并且每个激光单元包括多个用于气体的谐振管（12） 要激励谐振器管彼此流体连通并形成共同的管状空间，用于连接相邻谐振器管的连接元件（20,21），用于谐振器管的激励装置（70），用于激励谐振器中的气体 用于产生激光的管，布置在连接元件中的用于在谐振器管之间反射激光的反射镜（22）和用于耦合出激光束的部分反射输出耦合器（42）。 本发明还涉及一种用于标记物体的方法。

公开(公告)号：EP1323216A4

公开(公告)日：2006-03-22

申请号：EP01977198

申请日：2001-09-25

申请人： CYMER INC

发明人： MYERS DAVID W ,  BESAUCELE HERVE A ,  ERSHOV ALEXANDER I ,  PARTLO WILLIAM N ,  SANDSTROM RICHARD L ,  DAS PALASH P ,  ANDERSON STUART L ,  FOMENKOV IGOR V ,  UJAZDOWSKI RICHARD C ,  PAN XIAOJIANG J ,  ONKELS ECKEHARD D ,  NESS RICHARD M ,  BROWN DANIEL J W

IPC分类号： H01S3/225 ,  G01J9/00 ,  G03F7/20 ,  H01S3/00 ,  H01S3/03 ,  H01S3/036 ,  H01S3/038 ,  H01S3/04 ,  H01S3/041 ,  H01S3/08 ,  H01S3/0943 ,  H01S3/097 ,  H01S3/0971 ,  H01S3/0975 ,  H01S3/102 ,  H01S3/104 ,  H01S3/105 ,  H01S3/1055 ,  H01S3/11 ,  H01S3/13 ,  H01S3/131 ,  H01S3/134 ,  H01S3/137 ,  H01S3/139 ,  H01S3/22 ,  H01S3/223 ,  H01S3/23

CPC分类号： H01S3/2366 ,  G01J9/00 ,  G03F7/70025 ,  G03F7/70041 ,  G03F7/70333 ,  G03F7/70483 ,  G03F7/70575 ,  G03F7/70933 ,  H01S3/0057 ,  H01S3/02 ,  H01S3/03 ,  H01S3/036 ,  H01S3/038 ,  H01S3/0385 ,  H01S3/0387 ,  H01S3/0404 ,  H01S3/041 ,  H01S3/08004 ,  H01S3/08009 ,  H01S3/08036 ,  H01S3/0943 ,  H01S3/097 ,  H01S3/09702 ,  H01S3/09705 ,  H01S3/0971 ,  H01S3/0975 ,  H01S3/104 ,  H01S3/105 ,  H01S3/1055 ,  H01S3/1305 ,  H01S3/134 ,  H01S3/137 ,  H01S3/139 ,  H01S3/22 ,  H01S3/2207 ,  H01S3/223 ,  H01S3/225 ,  H01S3/2251 ,  H01S3/2256 ,  H01S3/2258 ,  H01S3/2333

摘要： An injection seeded modular gas discharge laser system capable of producing high quality pulsed laser beams at pulse rates of about 4,000 Hz or greater and at pulse energies of about 5 mJ or greater. Two separate discharge chambers (10A, 12A) are provided, one of which is a part of a master oscillator (10) producing a very narrow band seed beam which is amplified in the second discharge chamber (12). The chambers (10A, 12A) can be controlled separately permitting separate optimization of wavelength parameters in the master oscillator (10) and optimization of pulse energy parameters in the amplifying chamber (12A). A preferred embodiment in an ArF excimer laser system configured as a MOPA and specifically designed for use as a light source for integrated circuit lithography. In the preferred MOPA embodiment, each chamber (10A, 12A) comprises a single tangential fan (10A, 10) providing sufficient gas flow (11) to permit operation at pulse rates of 4,000 Hz or greater by clearing debris from the discharge region in less time than the approximately 0.25 milliseconds between pulses. The master oscillator (10) is equipped with a line narrowing package (16, 16A) having a very fast tuning mirror capable of controlling centerline wavelength on a pulse-to-pulse basis at repetition rates of 4,000 Hz or greater to a precision of less than 0.2 pm.

公开(公告)号：EP1438774A4

公开(公告)日：2006-03-08

申请号：EP02797839

申请日：2002-08-28

申请人： CYMER INC

发明人： KNOWLES DAVID S ,  BROWN DANIEL J W ,  BESAUCELE HERVE A ,  MYERS DAVID W ,  ERSHOV ALEXANDER I ,  PARTLO WILLIAM N ,  SANDSTROM RICHARD L ,  DAS PLASH P ,  ANDERSON STUART L ,  FOMENKOV IGOR V ,  UJAZDOWSKI RICHARD C ,  ONKELS ECKEHARD D ,  NESS RICHARD M ,  SMITH SCOTT T ,  HULBURD WILLIAM G ,  OICLES JEFFREY

IPC分类号： H01S1/00 ,  H01S3/225 ,  G01J1/42 ,  G01J9/00 ,  G03F7/20 ,  H01S3/00 ,  H01S3/03 ,  H01S3/036 ,  H01S3/038 ,  H01S3/04 ,  H01S3/041 ,  H01S3/08 ,  H01S3/0943 ,  H01S3/097 ,  H01S3/0971 ,  H01S3/0975 ,  H01S3/102 ,  H01S3/104 ,  H01S3/105 ,  H01S3/1055 ,  H01S3/11 ,  H01S3/13 ,  H01S3/131 ,  H01S3/134 ,  H01S3/137 ,  H01S3/139 ,  H01S3/22 ,  H01S3/223 ,  H01S3/23

CPC分类号： G01J1/4257 ,  G03F7/70025 ,  G03F7/70041 ,  G03F7/70333 ,  G03F7/70483 ,  G03F7/70575 ,  G03F7/70933 ,  H01S3/005 ,  H01S3/0057 ,  H01S3/02 ,  H01S3/03 ,  H01S3/036 ,  H01S3/038 ,  H01S3/0385 ,  H01S3/0387 ,  H01S3/0404 ,  H01S3/041 ,  H01S3/08004 ,  H01S3/08009 ,  H01S3/08036 ,  H01S3/0943 ,  H01S3/097 ,  H01S3/09702 ,  H01S3/09705 ,  H01S3/0971 ,  H01S3/0975 ,  H01S3/104 ,  H01S3/105 ,  H01S3/1055 ,  H01S3/1305 ,  H01S3/134 ,  H01S3/137 ,  H01S3/139 ,  H01S3/22 ,  H01S3/2207 ,  H01S3/223 ,  H01S3/225 ,  H01S3/2251 ,  H01S3/2256 ,  H01S3/2258 ,  H01S3/2333 ,  H01S3/2366

摘要： An injection seeded modular gas discharge laser system (2) capable of producing high quality pulsed beams at pulse rates of about 4,000 Hz or greater and at pulse energies of about 5 mJ or greater. Two separate discharge chambers are provided, one of which is a part of a master oscillator (10) producing a very narrow band seed beam, which is amplified (12) in the second discharge chamber. The chambers can be controlled separately permitting separate optimization of wavelength parameters in the master oscillator and optimization of pulse energy parameters in the amplifying chamber. A preferred embodiment in the ArF excimer laser system configured as a MOPA and specifically designed for use as a light source for integrated circuit lithography. In the preferred MOPA embodiment, each chamber comprises a single tangential fan (10A) providing sufficient gas flow to permit operation at pulse rates of 4,000 Hz or greater by cleaning debris from the discharge region in less time that the approximately 0.25 milliseconds between pulses. The masters oscillation is equipped with a line narrowing package having a very fast tuning mirror capable of controlling centerline wavelength on a pulse-to-pulse basis at repetition rates of 4000 Hz or greater to a precision of less than 0.2 pm.

摘要翻译： 一种注入模块化气体放电激光系统（2），能够以大约4,000Hz或更高的脉冲速率和大约5mJ或更大的脉冲能量产生高质量脉冲束。 提供两个独立的放电室，其中一个是主振荡器（10）的一部分，产生非常窄带的种子束，其在第二放电室中放大（12）。 这些室可以分开控制，允许主振荡器中的波长参数的单独优化和放大室中的脉冲能量参数的优化。 ArF准分子激光器系统中的一个优选实施例被配置为MOPA，并被专门设计用作集成电路光刻的光源。 在优选的MOPA实施例中，每个腔室包括单个切向风扇（10A），其提供足够的气流以允许在脉冲之间大约0.25毫秒的更短时间内通过清洁来自放电区域的碎片以4,000Hz或更高的脉冲速率进行操作。 主振荡装备有线变窄组件，其具有非常快速的调谐镜，其能够以重复率4000Hz或更大的脉冲到脉冲的基础上控制中心线波长，精度小于0.2μm。

公开(公告)号：EP1217700B1

公开(公告)日：2004-10-13

申请号：EP01129143.2

申请日：2001-12-06

申请人： Tulip, John

发明人： Tulip, John

IPC分类号： H01S3/038 ,  H01S3/0975

CPC分类号： H01S3/0315 ,  H01S3/038 ,  H01S3/0818 ,  H01S3/0975

公开(公告)号：EP0820132B1

公开(公告)日：2004-01-14

申请号：EP97305404.2

申请日：1997-07-18

申请人： CANON KABUSHIKI KAISHA ,  Ohmi, Tadahiro

发明人： Ohmi, Tadahiro ,  Tanaka, Nobuyoshi, c/o Canon Kabushiki Kaisha ,  Hirayama, Masaki

IPC分类号： H01S3/0975 ,  H01S3/225 ,  H01S3/08

CPC分类号： H01S3/0975 ,  H01S3/08 ,  H01S3/225

公开(公告)号：EP0911922B1

公开(公告)日：2002-09-11

申请号：EP98120243.5

申请日：1998-10-26

申请人： TRUMPF LASERTECHNIK GmbH

发明人： Schlüter, Holger

IPC分类号： H01S3/03 ,  H01S3/08 ,  H01S3/0975 ,  H01S3/07

CPC分类号： H01S3/08059 ,  H01S3/02 ,  H01S3/0315 ,  H01S3/076 ,  H01S3/0975

公开(公告)号：EP0802593B1

公开(公告)日：2001-10-17

申请号：EP97302394.8

申请日：1997-04-08

申请人： The Domino Corporation

发明人： Sutter, Leroy Vernon

IPC分类号： H01S3/0975

CPC分类号： H01S3/0975