ADDITIVES FOR PRODUCING COPPER ELECTRODEPOSITS HAVING LOW OXYGEN CONTENT
    52.
    发明公开
    ADDITIVES FOR PRODUCING COPPER ELECTRODEPOSITS HAVING LOW OXYGEN CONTENT 审中-公开
    附件用于生产电解铜存款氧含量低

    公开(公告)号:EP2855738A1

    公开(公告)日:2015-04-08

    申请号:EP13793817.1

    申请日:2013-04-15

    发明人: PEARSON, Trevor

    IPC分类号: C25D3/38

    摘要: A copper electroplating bath for producing copper electrodeposits is described, The copper electroplating bath comprises (a) a soluble copper salt, (b) an electrolyte comprising one or more acids, and (c) a grain refining additive comprising an alkyl5 aryl or atkylaryl diamine. The copper electroplating bath can be used for producing eleetroformed copper deposits having low oxygen content,

    NANO-OXIDE PROCESS FOR BONDING COPPER/COPPER ALLOY AND RESIN
    54.
    发明公开
    NANO-OXIDE PROCESS FOR BONDING COPPER/COPPER ALLOY AND RESIN 审中-公开
    NANO-OXID-VERFAHREN ZUM BONDEN EINER KUPFER- / KUPFERLEGIERUNG UND HARZ

    公开(公告)号:EP2531350A2

    公开(公告)日:2012-12-12

    申请号:EP10844927.3

    申请日:2010-11-30

    IPC分类号: B32B7/12 C09D5/00 C08K5/32

    摘要: A method of increasing adhesion between a copper or copper alloy layer and a polymeric resin. The method includes the steps of a) applying a pre-dip composition to the copper layer; b) applying a nano-oxide composition to the treated copper layer, c) applying a post-dip composition to the nano-oxide treated surface, and d) bonding a resin to the treated copper surface. The nano-oxide composition comprises (i) a chlorite; (ii) a caustic; (iii) a phosphate salt; (iv) an organic nitro compound; and (v) a thio compound. The post-dip composition is an alkaline solution that comprises (i) a phosphate salt; (ii) a source of molybdenum ions; and (iii) a thiazole. The process of the invention is useful for improving the bond between copper and a resin, including high Tg resins, halogen-free resins, and high speed/lost resins.

    摘要翻译: 增加铜或铜合金层与聚合物树脂之间粘合力的方法。 该方法包括以下步骤:a)将预浸组合物施加到铜层; b)将纳米氧化物组合物施加到经处理的铜层,c)将浸渍后组合物施加到所述纳米氧化物处理的表面上,以及d)将树脂粘合到经处理的铜表面。 纳米氧化物组合物包含(i)亚氯酸盐; (ii)苛性碱; (iii)磷酸盐; (iv)有机硝基化合物; 和(v)硫代化合物。 浸渍后组合物是碱性溶液,其包含(i)磷酸盐; (ii)钼离子源; 和(iii)噻唑。 本发明的方法可用于改善铜和树脂之间的键合,包括高Tg树脂,无卤素树脂和高速/失去树脂。

    LIGHT INDUCED ELECTROLESS PLATING
    56.
    发明公开
    LIGHT INDUCED ELECTROLESS PLATING 有权
    光控电源无铅电镀

    公开(公告)号:EP2470692A1

    公开(公告)日:2012-07-04

    申请号:EP10812449.6

    申请日:2010-06-04

    发明人: MINSEK, David

    IPC分类号: C25D3/46

    摘要: A method and composition for plating metal contacts on photovoltaic solar cells is described. The cell is immersed in an aqueous bath containing platable metal ions and a chemical reducing agent. The cell is then exposed to light, causing the two sides of the cell to become oppositely charged. The metal ions are plated without requiring an external electrical contact, without backside anodic corrosion and without the need for backside sacrificial material.