公开(公告)号：EP0698788A1

公开(公告)日：1996-02-28

申请号：EP92910164.0

申请日：1992-05-13

申请人： OHMI, Tadahiro

发明人： OHMI, Tadahiro

IPC分类号： G01N30/06 ,  G01N30/00 ,  G01N33/00

CPC分类号： G01N33/0016 ,  G01N7/00 ,  G01N30/06 ,  G01N33/0036 ,  G01N33/0067

摘要： A method and a device for measuring detailed decomposition rate characteristic of special material gas such as silane gas. After inert gas is supplied from a gas purifier (1) (a first gas-supply source) into a reaction pipe (20) to provide a high purity atmosphere in said pipe, the inside of said pipe is baked by heaters (25 to 27). Then, the inside of the reaction pipe (20) is kept in an atmosphere at a specified temperature and special material gas with a specified purity is supplied from a bomb (10) (a second gas-supply source) into the reaction pipe at a fixed flow rate. When the inside of the reaction pipe (20) reaches a specified terminal temperature, a decomposition rate of the special material gas at said temperature is measured by a gas chromatography (12) by, for example, extracting a part of gas in the reaction pipe. Afterward, a flow rate of the special material gas is successively varied and a decomposition rate at every time of variation is measured. Further, an atmosphere inside the reaction pipe (20) is successively set to one at another specified temperature for measuring a decomposition rate at every temperature. With an impurity concentration in the special gas varied, said measurement is repeated.

摘要翻译： 一种方法，以及用于测量特殊材料气体的详细分解速度特性的装置：诸如硅烷气体。 后的惰性气体从一个气体净化器（1）（第一气体供给源）到反应管供给（20），以提供在所述管高纯度的气氛，所述管的内部通过加热器（25〜27烘烤 ）。 然后，将反应管（20）的内部在特定的温度和特殊材料气体与指定的纯度在气氛保持在从炸弹（10）（第二气体供给源）供给到反应管在 固定流速。 当反应管的内部（20）达到规定的终端温度，在所述温度下的特殊材料气体的分解速率由气相色谱法（12）测定，例如，在反应管中提取气体的一部分 ， 此后，特殊材料气体的流速是连续地变化，并在变化的每次分解率进行测定。 此外，向反应管内的气氛（20）被连续地设置为一个在另一个指定的温度下在每一个温度测量分解率。 随着改变的特殊气体中的杂质浓度，所述测量被重复。 $$

公开(公告)号：EP0694198A1

公开(公告)日：1996-01-31

申请号：EP94906385.0

申请日：1994-02-15

申请人： SHIBATA, Tadashi ,  OHMI, Tadahiro

发明人： SHIBATA, Tadashi ,  OHMI, Tadahiro ,  AU, Rita, Dep. of Electr. Faculty of Engineering

IPC分类号： G11C17 ,  G11C11 ,  G11C16 ,  G11C27

CPC分类号： G11C11/5621 ,  G11C8/14 ,  G11C11/5628 ,  G11C11/5692 ,  G11C16/08 ,  G11C27/005 ,  G11C2211/5611

摘要： A semiconductor circuit which realizes a read-only memory cell having zero standby-by power consumption and capable of non-volatile storage of multiple-valued or analog data. This semiconductor device is comprised of at least a single n-channel or p-channel MOS transistor in a source-follower circuit configuration. The input of this source-follower circuit is a floating gate which is capacitively coupled to multiple control gates. The voltages applied to the control gates and the coupling ratios of the control gates determine the potential of the floating gate. When a voltage supply is applied to the drain electrode of the source-follower circuit, the source-electrode potential will nearly equal the floating gate potential.

公开(公告)号：EP0692336A1

公开(公告)日：1996-01-17

申请号：EP94904321.0

申请日：1994-01-14

申请人： OHMI, Tadahiro

发明人： OHMI, Tadahiro

IPC分类号： B23K31/00 ,  B23K9/23 ,  B23K35/00

CPC分类号： B23K9/232 ,  B23K9/23 ,  B23K35/004 ,  B23K35/32 ,  B23K2203/05 ,  C23C8/02

摘要： This invention provides a welding method capable of forming on a weld of the material to be welded and in the vicinity thereof in the step of welding a passivated chromium oxide film an outer surface of which has excellent corrosion resisting, a capability of substantially preventing the adsorption of water onto the outer surface, and a capability of permitting water, even when it is adsorbed onto the surface, to be removed simply with low energy; and a welded structure having the same film. A welding method for forming a passivated chromium oxide film on a weld of each material to be welded, consisting of the steps of forming a chromium-containing film at the end of the material which has on its outer surface a passivated oxide film formed by thermal treatment and containing chromium as the main component, setting face to face with each other the ends of the materials thus coated, and welding these ends, whereby a passivated oxide film containing chromium oxide as the main component which has a high corrosion resistance and which does not substantially provide outgassing can be formed on the outer surface of the weld.

摘要翻译： 本发明提供一种焊接方法，该焊接方法能够在焊接钝化的氧化铬膜的步骤中焊接材料的焊接和其附近形成焊接，所述钝化的氧化铬膜的外表面具有优异的耐腐蚀性，基本上防止吸附的能力 的水，并且即使在吸附到表面上时也允许水被简单地用低能量除去的能力; 以及具有相同膜的焊接结构。 一种用于在每种待焊接材料的焊缝上形成钝化的氧化铬膜的焊接方法，包括在其外表面上形成含铬膜的步骤，所述钝化氧化膜在其外表面上形成有钝化氧化膜 处理并含有铬作为主要成分，将这样涂覆的材料的端部彼此面对面地进行焊接，并且焊接这些端部，由此以含有氧化铬作为主要成分的钝化氧化物膜具有高耐腐蚀性， 基本上不能在焊缝的外表面形成除气。 $$

公开(公告)号：EP0686708A1

公开(公告)日：1995-12-13

申请号：EP94907677.2

申请日：1994-02-24

申请人： OHMI, Tadahiro

发明人： OHMI, Tadahiro ,  SHIBATA, Tadashi ,  UETAKE, Hiroaki, Dept. of Electronics Faculty of ,  MIYASHITA, Kazuhisa, Dept. of Electronics Faculty

IPC分类号： C23C16/50 ,  C23C14/34

CPC分类号： H01J37/32082 ,  C23C14/0036 ,  C23C16/5096 ,  H01J37/32165 ,  H01J37/34 ,  H01J37/3473

摘要： This invention aims at providing a film forming method and a film forming apparatus which are capable of varying the density and composition of a deposition film in the direction of the thickness thereof, and obtaining a film of a stable and high quality. A film forming apparatus consisting of a sealed container having an inlet port for a gas used to cause a chemical vapor growth and sputter a target material, at least two electrodes provided in the container, means for supporting the target material and a substrate on the first and second electrodes out of these electrodes, and two high-frequency power sources having different frequencies and connected to the first and second electrodes; and a film forming method consisting of introducing a gas into the container, applying high-frequency power of different frequencies to the first and second electrodes to generate plasma, and forming a film while controlling DC potential of the target material, whereby a deposition film containing at least one kind of atom out of the atoms constituting the target material and at least one kind of atom out of the atoms contituting the gas mentioned above is formed on the substrate.

摘要翻译： 本发明的目的在于提供能够改变沉积膜在其厚度方向上的密度和组成的成膜方法和成膜装置，并获得稳定和高质量的膜。 一种成膜装置，包括具有用于引起化学气相生长并溅射靶材料的气体的入口的密封容器，设置在容器中的至少两个电极，用于将第一和第二载体上的靶材料和基底支撑的装置 和这些电极中的第二电极，以及具有不同频率并连接到第一和第二电极的两个高频电源; 以及一种成膜方法，包括将气体引入容器中，将不同频率的高频电力施加到第一和第二电极以产生等离子体，并且在控制目标材料的DC电位的同时形成膜，由此形成含有 构成靶材料的原子中的至少一种原子和与上述气体相反的原子中的至少一种原子形成在基板上。

公开(公告)号：EP0666237A1

公开(公告)日：1995-08-09

申请号：EP93921117.3

申请日：1993-10-05

申请人： OHMI, Tadahiro

发明人： OHMI, Tadahiro

IPC分类号： C01B5/00

CPC分类号： C01B5/00

摘要： A water generating method which is capable of providing a large quantity of water-mixed gas having an accurate concentration of water in a wide range from a low level of the order of ppt and ppb to a high level of the order of percentage, and a super-high cleanness, and which is quick to respond and simple to maintain. A method of generating water on reaction between hydrogen and oxygen consisting of the steps of generating a first mixed gas by mixing hydrogen, oxygen and an inert gas, and generating water by introducing the first mixed gas into a reaction tube, which is formed out of a material having a catalytic action capable of turning hydrogen and oxygen into radicals, and heating the interior of the reaction tube so as to cause a reaction between the hydrogen and oxygen contained in the first gas and produce water.

摘要翻译： 一种水生成方法，其能够提供从ppt和ppb级的低水平到百分比量级的高水平的广泛范围内具有准确浓度的水的大量水混合气体，以及 超高清洁度，快速响应和维护简单。 一种在氢气和氧气之间产生水的方法，包括以下步骤：通过混合氢气，惰性气体和惰性气体产生第一混合气体，并通过将第一混合气体引入反应管中而形成水，反应管由 具有能够将氢和氧转化为自由基的催化作用的材料，以及加热反应管的内部以引起第一气体中所含的氢和氧之间的反应并产生水。

公开(公告)号：EP0663459A1

公开(公告)日：1995-07-19

申请号：EP93921076.1

申请日：1993-09-28

申请人： OHMI, Tadahiro

发明人： OHMI, Tadahiro

IPC分类号： H01M12/08 ,  H01M6/24 ,  H01M8/18 ,  C25B1/04 ,  H01M14/00

CPC分类号： H01M8/182 ,  H01M8/0606 ,  Y02E60/366 ,  Y02E60/528

摘要： A generator which generates high electric power at a low cost without substantially using fossil fuel and without contaminating the global environment, and which can be substituted for thermal power generator. A solution prepared by adding a substance, which dissociates in a solvent which does not dissociate by itself, to the same solvent is contained in a container the inner surface of which has corrosion resistance and insulation. The anode having a small work function and the cathode having a large work function are immersed in this solution with them opposed. This generator has a container the inner surface of which has corrosion resistance and insulation, a solution of a mixture of anhydrous hydrogen fluoride and water, held in the container and isolated from the atmospheric air, an anode of a material having corrosion resistance and a small work function, a cathode of a material having corrosion resistance and a large work function, both of the anode and cathode being immersed in the solution and mutually opposed, and a heat application means.

摘要翻译： 发电机以低成本产生高电力而基本上不使用矿物燃料并且不污染全球环境，并且可代替火力发电机。 在其内表面具有耐腐蚀性和绝缘性的容器中包含通过将在不会自身解离的溶剂中解离的物质加入到相同溶剂中而制备的溶液。 具有小功函数的阳极和具有大功函数的阴极在它们相对的情况下浸入该溶液中。 该发生器具有内表面具有耐腐蚀性和绝缘性的容器，容纳在容器中并与大气隔绝的无水氟化氢和水的混合物的溶液，具有耐腐蚀性和小的材料的阳极 功函数，具有耐腐蚀性和大功函数的材料的阴极，阳极和阴极两者浸在溶液中并相互相对，以及热施加装置。

公开(公告)号：EP0661385A1

公开(公告)日：1995-07-05

申请号：EP92917995.0

申请日：1992-08-19

申请人： OHMI, Tadahiro

发明人： OHMI, Tadahiro ,  IMAOKA, Takashi, Department of Electronics Faculty ,  SHIMADA, Hisayuki, Depart. of Electronics Faculty ,  KONISHI, Nobuhiro, Depart. of Electronics Faculty ,  MORITA, Mizuho, Department of Electronics Faculty ,  YAMASHITA, Takeo, Depart. of Electronics Faculty ,  SHIBATA, Tadashi, Depart. of Electronics Faculty ,  WAKAMATSU, Hidetoshi, Dep. of Electronics Faculty ,  WATANABE, Jinzo, Department of Electronics Faculty ,  AOYAMA, Shintaro, Depart. of Electronics Faculty ,  NAKAMURA, Masakazu, Depart. of Electronics Faculty

IPC分类号： C23C8/10 ,  C23C16/48 ,  G01B21/30 ,  G01N23/227 ,  G21K5/00 ,  H01L21/027 ,  H01L21/263 ,  H01L21/265 ,  H01L21/304 ,  H01L21/68

CPC分类号： H01L21/02052 ,  C23C8/10 ,  C23C8/36 ,  C23C14/021 ,  C23C14/022 ,  C23C14/48 ,  C23C14/564 ,  C23C16/02 ,  C23C16/4401 ,  C30B23/02 ,  C30B25/02 ,  C30B29/16 ,  H01L21/02238 ,  H01L21/02255 ,  H01L21/31612

摘要： Vacuum processing equipment capable of preventing particles from sticking to objects to be processed in vacuum vessels. The vacuum equipment comprises a series of vacuum vessels separated by doors, and the pressures in the vessels are reducible respectively. The vessels are so configured that objects to be processed are movable among them, and there is provided light projection means for projecting ultraviolet rays on gases introduced to at least one of the vessels.

摘要翻译： 真空处理设备能够防止颗粒粘附在真空容器中被处理物体。 真空设备包括一系列由门隔开的真空容器，容器中的压力分别可减少。 容器的构造使得待处理物体在其间可移动，并且设置有用于将紫外线投射到引入到至少一个容器的气体的光投射装置。

公开(公告)号：EP0657934A1

公开(公告)日：1995-06-14

申请号：EP93919578.0

申请日：1993-08-26

申请人： SHIBATA, Tadashi ,  OHMI, Tadahiro

发明人： SHIBATA, Tadashi ,  OHMI, Tadahiro

IPC分类号： H01L27/10 ,  H01L21/82 ,  H01L29/78

CPC分类号： H03K19/1736 ,  H01L27/11803

摘要： A semiconductor integrated circuit adaptable to any logic circuits using a common mask with the exception of a mask of metallic wirings so as to drastically improve performance of custom LSIs. The semiconductor integrated circuit comprises a logic circuit having a plurality of input terminals and at least one output terminal. The logic circuit includes a plurality of circuit blocks of the same circuit construction. Each of the circuit blocks has at least two stages of inverter formed by MOS semiconductor devices and at least one layer of a wiring pattern having a different pattern. The output signal of each block is defined by a predetermined function of an input signal.

公开(公告)号：EP0432265B1

公开(公告)日：1995-02-22

申请号：EP89907833.1

申请日：1989-06-29

申请人： OHMI, Tadahiro

发明人： OHMI, Tadahiro ,  KAWAKAMI, Michiya ,  SHIBATA, Tadashi ,  UMEDA, Masaru

IPC分类号： C02F1/00

CPC分类号： B01D61/22 ,  C02F1/006 ,  C02F1/32 ,  C02F1/444 ,  Y10S210/90

摘要： In a ultra-pure water supply piping arrangement apparatus including a circulation water tank (502) for storing primary pure water from a primary pure water production apparatus, a pump (503) for pressure-feeding the primary pure water from the circulation water tank, a return pipe (510) one of the ends of which is connected to a final purifier for purifying the primary pure water from the pump to ultra-pure water, a plurality of connection pipes (513 ∩ 515) to one end of which the other end of the return pipe is connected, branch pipes (516 ∩ 518) connected between the intermediate portions of the connection pipes and a ultra-pure water using apparatus and having branch valves (516 ∩ 518) for adjusting the feed water quantity and a return pipe (512) connected to the other end of each connection pipe and the circulation water tank, the present invention provides a piping arrangement apparatus which includes means for controlling the output of the pump by detecting the pressure of water passing through the return pipe so as to keep the pressure of passing water constant and supply always a predetermined quantity of ultra-pure water to the ultra-pure water using apparatus, which can prevent backflow from the return pipe to the ultra-pure water using apparatus and which can always supply stably the ultra-pure water having ultra-high purity.

公开(公告)号：EP0608421A1

公开(公告)日：1994-08-03

申请号：EP92921332.0

申请日：1992-10-15

申请人： OHMI, Tadahiro

发明人： OHMI, Tadahiro

IPC分类号： B32B9/04 ,  B01J19/02 ,  B65D85/84 ,  C23C28/00 ,  C23C8/80

CPC分类号： F16L58/10 ,  B01J19/02 ,  B01J2219/0236 ,  B01J2219/024 ,  B01J2219/0277 ,  B05D5/083 ,  B05D7/14 ,  B05D7/22 ,  C23C8/80

摘要： A metallic material which is excellent in the resistance to chemical solution capable of composing a chemical solution treating device free of erosion on metallic piping, metallic devices, and metallic parts thereof as well as capable of controlling the flow rate of solution with high precision and free of pollution by chemical solution; and also intends to provide a chemical solution treating device or parts thereof using said metallic materials. The material is characterized by being provided with at least a basic member (101) composed of a metallic material, a metal fluoride layer or metal oxide layer (102) formed on the basic member (101) and fluorocarbon film (103) to cover said metal fluoride layer or metal oxide layer (102).

摘要翻译： 用金属材料，所有这些都具有优异的耐化学溶液能够构成的化学溶液处理游离上金属管道，金属装置和金属部件的侵蚀的装置的物以及能够控制的溶液具有高精确度和自由流率的 通过化学溶液的污染; 因此意图是提供一种化学溶液处理设备或其部分使用所述的金属材料。 该材料是由设置有特征的至少一个金属材料构成的基本部件（101），形成在基本构件上的金属氟化物层或金属氧化物层（102）（101）和碳氟化合物的电影（103）以覆盖所述 金属氟化物层或金属氧化物层（102）。