摘要:
A vacuum holder for holding articles by suction includes a vacuum chamber divided into a plurality of interconnected sub-chambers each communicating via a control a passageway with a plurality of suction openings extending through an outer holding surface, and a valve member for each control passageway integrally formed with a mounting section mounted to the housing, and an elastic juncture section normally biassing the valve member to open its respective control passageway to permit the application of suction to its plurality of suction openings. Each valve member is displaceable by the suction force applied from its respective vacuum sub-chamber, when its plurality of suction openings are not covered by the article to be held by the holder, to thereby close the control passageway to its respective suction openings.
摘要:
Method and apparatus for the fabrication of a phototool using a direct write film (23). A plotter head (22) is associated with a verification assembly (reader head (25) forms a part of it) that produces a signal in case of faulty product. If desired the signal may actuate an automatic rejection mechanism.
摘要:
Inspection of workpieces traveling along a production line includes on-line inspection of the workpieces at an upstream inspection station to detect possible flaws without interrupting the progression of workpieces along the production line. Possible flaws in the inspected workpieces are imaged, and images of possible flaws are stored in a memory in a way that associates a stored image with the workpiece containing the possible flaw. Off-line, a stored image is retrieved from the memory before the workpiece with which the image is associated reaches a downstream sorting station. The retrieved image is displayed on a monitor for verifying, by visual inspection, whether the possible flaw in the workpiece with which the retrieved image is associated, is valid. Workpieces are diverted at the downstream sorting station in response to verification of flaws.
摘要:
An apparatus for material deposition, comprising a transparent donor substrate having deposited thereon a donor film comprising a metal with a thickness less than 2 µm. The apparatus further comprising a positioning assembly, which is configured to position the donor substrate in proximity to an acceptor substrate comprising a semiconductor material with the donor film facing toward the acceptor substrate and with a gap of at least 0.1 mm between the donor film and the acceptor substrate; and an optical assembly, which is configured to direct pulses of laser radiation, having a pulse duration less than 2 ns, to impinge on the donor substrate so as to cause droplets of the metal to be ejected from the donor layer and land on the acceptor substrate, thereby forming a circuit trace in ohmic contact with the semiconductor material.
摘要:
A method for manufacturing includes coating a substrate (22) with a matrix (28) containing a material to be patterned on the substrate. A pattern is fixed in the matrix by directing a pulsed energy beam to impinge on a locus of the pattern so as to cause adhesion of the material to the substrate along the pattern without fully sintering the material in the pattern. The matrix remaining on the substrate outside the fixed pattern is removed, and after removing the matrix, the material in the pattern is sintered.
摘要:
A method for manufacturing includes coating a substrate (22) with a matrix (28) containing a material to be patterned on the substrate. A pattern is fixed in the matrix by directing a pulsed energy beam to impinge on a locus of the pattern so as to cause adhesion of the material to the substrate along the pattern without fully sintering the material in the pattern. The matrix remaining on the substrate outside the fixed pattern is removed, and after removing the matrix, the material in the pattern is sintered.
摘要:
A method for manufacturing includes coating a substrate (22) with a matrix (28) containing a material to be patterned on the substrate. A pattern (42) is fixed in the matrix by directing an energy beam to impinge on the coated substrate so as to fix the pattern in the matrix without fully sintering the pattern. The matrix remaining on the substrate outside the fixed pattern is removed, and after removing the matrix, the material in the pattern is sintered.
摘要:
A direct imaging system comprises an illumination unit comprising a plurality of light sources, the plurality of light sources (50) configured to emit a plurality of beams (65), an optical system (60) for forming the plurality of beams to be aligned in position or angle, an acoustic optical modulator (70) positioned to receive the plurality of beams (65) aligned in one of position or angle and to consecutively diffract different portions of the plurality of beams (65) as an acoustic wave propagates in an acoustic direction, and a scanning element (80) adapted to scan an exposure plane with the plurality of beams (65) modulated by the acoustic optical modulator (70) at a scanning velocity, wherein the scanning velocity is selected to incoherently unite the different portions of the plurality of beams (65) into a single exposure spot.