公开(公告)号：EP1323216A4

公开(公告)日：2006-03-22

申请号：EP01977198

申请日：2001-09-25

申请人： CYMER INC

发明人： MYERS DAVID W ,  BESAUCELE HERVE A ,  ERSHOV ALEXANDER I ,  PARTLO WILLIAM N ,  SANDSTROM RICHARD L ,  DAS PALASH P ,  ANDERSON STUART L ,  FOMENKOV IGOR V ,  UJAZDOWSKI RICHARD C ,  PAN XIAOJIANG J ,  ONKELS ECKEHARD D ,  NESS RICHARD M ,  BROWN DANIEL J W

IPC分类号： H01S3/225 ,  G01J9/00 ,  G03F7/20 ,  H01S3/00 ,  H01S3/03 ,  H01S3/036 ,  H01S3/038 ,  H01S3/04 ,  H01S3/041 ,  H01S3/08 ,  H01S3/0943 ,  H01S3/097 ,  H01S3/0971 ,  H01S3/0975 ,  H01S3/102 ,  H01S3/104 ,  H01S3/105 ,  H01S3/1055 ,  H01S3/11 ,  H01S3/13 ,  H01S3/131 ,  H01S3/134 ,  H01S3/137 ,  H01S3/139 ,  H01S3/22 ,  H01S3/223 ,  H01S3/23

CPC分类号： H01S3/2366 ,  G01J9/00 ,  G03F7/70025 ,  G03F7/70041 ,  G03F7/70333 ,  G03F7/70483 ,  G03F7/70575 ,  G03F7/70933 ,  H01S3/0057 ,  H01S3/02 ,  H01S3/03 ,  H01S3/036 ,  H01S3/038 ,  H01S3/0385 ,  H01S3/0387 ,  H01S3/0404 ,  H01S3/041 ,  H01S3/08004 ,  H01S3/08009 ,  H01S3/08036 ,  H01S3/0943 ,  H01S3/097 ,  H01S3/09702 ,  H01S3/09705 ,  H01S3/0971 ,  H01S3/0975 ,  H01S3/104 ,  H01S3/105 ,  H01S3/1055 ,  H01S3/1305 ,  H01S3/134 ,  H01S3/137 ,  H01S3/139 ,  H01S3/22 ,  H01S3/2207 ,  H01S3/223 ,  H01S3/225 ,  H01S3/2251 ,  H01S3/2256 ,  H01S3/2258 ,  H01S3/2333

摘要： An injection seeded modular gas discharge laser system capable of producing high quality pulsed laser beams at pulse rates of about 4,000 Hz or greater and at pulse energies of about 5 mJ or greater. Two separate discharge chambers (10A, 12A) are provided, one of which is a part of a master oscillator (10) producing a very narrow band seed beam which is amplified in the second discharge chamber (12). The chambers (10A, 12A) can be controlled separately permitting separate optimization of wavelength parameters in the master oscillator (10) and optimization of pulse energy parameters in the amplifying chamber (12A). A preferred embodiment in an ArF excimer laser system configured as a MOPA and specifically designed for use as a light source for integrated circuit lithography. In the preferred MOPA embodiment, each chamber (10A, 12A) comprises a single tangential fan (10A, 10) providing sufficient gas flow (11) to permit operation at pulse rates of 4,000 Hz or greater by clearing debris from the discharge region in less time than the approximately 0.25 milliseconds between pulses. The master oscillator (10) is equipped with a line narrowing package (16, 16A) having a very fast tuning mirror capable of controlling centerline wavelength on a pulse-to-pulse basis at repetition rates of 4,000 Hz or greater to a precision of less than 0.2 pm.

公开(公告)号：EP1438774A4

公开(公告)日：2006-03-08

申请号：EP02797839

申请日：2002-08-28

申请人： CYMER INC

发明人： KNOWLES DAVID S ,  BROWN DANIEL J W ,  BESAUCELE HERVE A ,  MYERS DAVID W ,  ERSHOV ALEXANDER I ,  PARTLO WILLIAM N ,  SANDSTROM RICHARD L ,  DAS PLASH P ,  ANDERSON STUART L ,  FOMENKOV IGOR V ,  UJAZDOWSKI RICHARD C ,  ONKELS ECKEHARD D ,  NESS RICHARD M ,  SMITH SCOTT T ,  HULBURD WILLIAM G ,  OICLES JEFFREY

IPC分类号： H01S1/00 ,  H01S3/225 ,  G01J1/42 ,  G01J9/00 ,  G03F7/20 ,  H01S3/00 ,  H01S3/03 ,  H01S3/036 ,  H01S3/038 ,  H01S3/04 ,  H01S3/041 ,  H01S3/08 ,  H01S3/0943 ,  H01S3/097 ,  H01S3/0971 ,  H01S3/0975 ,  H01S3/102 ,  H01S3/104 ,  H01S3/105 ,  H01S3/1055 ,  H01S3/11 ,  H01S3/13 ,  H01S3/131 ,  H01S3/134 ,  H01S3/137 ,  H01S3/139 ,  H01S3/22 ,  H01S3/223 ,  H01S3/23

CPC分类号： G01J1/4257 ,  G03F7/70025 ,  G03F7/70041 ,  G03F7/70333 ,  G03F7/70483 ,  G03F7/70575 ,  G03F7/70933 ,  H01S3/005 ,  H01S3/0057 ,  H01S3/02 ,  H01S3/03 ,  H01S3/036 ,  H01S3/038 ,  H01S3/0385 ,  H01S3/0387 ,  H01S3/0404 ,  H01S3/041 ,  H01S3/08004 ,  H01S3/08009 ,  H01S3/08036 ,  H01S3/0943 ,  H01S3/097 ,  H01S3/09702 ,  H01S3/09705 ,  H01S3/0971 ,  H01S3/0975 ,  H01S3/104 ,  H01S3/105 ,  H01S3/1055 ,  H01S3/1305 ,  H01S3/134 ,  H01S3/137 ,  H01S3/139 ,  H01S3/22 ,  H01S3/2207 ,  H01S3/223 ,  H01S3/225 ,  H01S3/2251 ,  H01S3/2256 ,  H01S3/2258 ,  H01S3/2333 ,  H01S3/2366

摘要： An injection seeded modular gas discharge laser system (2) capable of producing high quality pulsed beams at pulse rates of about 4,000 Hz or greater and at pulse energies of about 5 mJ or greater. Two separate discharge chambers are provided, one of which is a part of a master oscillator (10) producing a very narrow band seed beam, which is amplified (12) in the second discharge chamber. The chambers can be controlled separately permitting separate optimization of wavelength parameters in the master oscillator and optimization of pulse energy parameters in the amplifying chamber. A preferred embodiment in the ArF excimer laser system configured as a MOPA and specifically designed for use as a light source for integrated circuit lithography. In the preferred MOPA embodiment, each chamber comprises a single tangential fan (10A) providing sufficient gas flow to permit operation at pulse rates of 4,000 Hz or greater by cleaning debris from the discharge region in less time that the approximately 0.25 milliseconds between pulses. The masters oscillation is equipped with a line narrowing package having a very fast tuning mirror capable of controlling centerline wavelength on a pulse-to-pulse basis at repetition rates of 4000 Hz or greater to a precision of less than 0.2 pm.

摘要翻译： 一种注入模块化气体放电激光系统（2），能够以大约4,000Hz或更高的脉冲速率和大约5mJ或更大的脉冲能量产生高质量脉冲束。 提供两个独立的放电室，其中一个是主振荡器（10）的一部分，产生非常窄带的种子束，其在第二放电室中放大（12）。 这些室可以分开控制，允许主振荡器中的波长参数的单独优化和放大室中的脉冲能量参数的优化。 ArF准分子激光器系统中的一个优选实施例被配置为MOPA，并被专门设计用作集成电路光刻的光源。 在优选的MOPA实施例中，每个腔室包括单个切向风扇（10A），其提供足够的气流以允许在脉冲之间大约0.25毫秒的更短时间内通过清洁来自放电区域的碎片以4,000Hz或更高的脉冲速率进行操作。 主振荡装备有线变窄组件，其具有非常快速的调谐镜，其能够以重复率4000Hz或更大的脉冲到脉冲的基础上控制中心线波长，精度小于0.2μm。

公开(公告)号：EP1041689A4

公开(公告)日：2006-03-01

申请号：EP99970514

申请日：1999-10-08

申请人： USHIO ELECTRIC INC

发明人： TADA AKIFUMI ,  SEKI KYOHEI

IPC分类号： H01S3/225 ,  H01S3/08 ,  H01S3/1055 ,  H01S3/139

CPC分类号： H01S3/08009 ,  H01S3/225

摘要： An excimer laser comprises a band-narrowing optical system (6) having an advantage that the oscillation center wavelength hardly varies with temperature and provided with a Littrow-mounted reflection-type diffraction grating (3) and a beam-expanding optical system (5) disposed on the light-incidence side of the reflection-type diffraction grating (5). The beam expanding optical system (5) is composed of one or more beam expanding prism (11, 12) made of fluorite and one or more beam-expanding prism (13) made of synthetic quartz glass. The rate of change of the oscillation center wavelength with respect to temperature change is made small by considering the number, arrangement, and direction of prisms (11, 12, 13).

公开(公告)号：EP1547210A4

公开(公告)日：2006-01-04

申请号：EP03759475

申请日：2003-09-26

申请人： TISUE J GILBERT

发明人： TISUE J GILBERT

IPC分类号： G02B5/18 ,  G02B26/10 ,  H01S3/02 ,  H01S3/08 ,  H01S3/1055 ,  G02B7/00 ,  H01S3/10

CPC分类号： G02B5/1828 ,  G02B26/106 ,  H01S3/025 ,  H01S3/08009 ,  H01S3/1055

摘要： Apparatus and method of providing an easily aligned directly pivotable grating suitable for high power agile wavelength laser tuners. A mounting and adjustment plane (26) is located on a rotational axis (28) and on a grating (27). An external adjustment mechanism and thermal bonding (40) reduce rotational moment and enable high power applications. The implementation is capable of utilizing grating blank materials that resist tapping or drilling. Low cost is achieved by construction in a matrix of ruling blanks (52) thereby complimenting the characteristics of ruling engines.

摘要翻译： 提供适用于高功率敏捷波长激光调谐器的容易对准的直接可枢转光栅的设备和方法。 安装和调整平面（26）位于旋转轴线（28）上和格栅（27）上。 外部调整机构和热结合（40）减少了旋转力矩并且使高功率应用成为可能。 该实施方式能够利用抵抗攻丝或钻孔的光栅坯料。 低成本是通过在统治空白矩阵（52）中建设来实现的，从而补充了统治引擎的特点。

公开(公告)号：EP1407521A4

公开(公告)日：2005-11-23

申请号：EP02744246

申请日：2002-06-05

申请人： CYMER INC

发明人： TITUS CLAY C ,  HULBURD WILLIAM G ,  CYBULSKI RAYMOND F ,  ALGOTS JOHN M ,  LYSIK MICHAEL S

IPC分类号： H01S3/225 ,  G03F7/20 ,  H01S3/03 ,  H01S3/034 ,  H01S3/036 ,  H01S3/04 ,  H01S3/08 ,  H01S3/081 ,  H01S3/086 ,  H01S3/0943 ,  H01S3/1055 ,  H01S3/13 ,  H01S3/134 ,  H01S3/137 ,  H01S3/139 ,  H01S3/10

CPC分类号： H01S3/036 ,  G03F7/70025 ,  G03F7/70575 ,  H01S3/02 ,  H01S3/03 ,  H01S3/034 ,  H01S3/0401 ,  H01S3/08009 ,  H01S3/08059 ,  H01S3/0812 ,  H01S3/086 ,  H01S3/13 ,  H01S3/134 ,  H01S3/1392 ,  H01S3/225 ,  H01S3/2256

摘要： A grating based line narrowing device for line narrowing lasers producing high energy laser beams. A flexure grating mount is provided which virtually eliminates stress on the grating caused by differential thermal expansion between the grating and the housing structure. The grating which is comprised of a very thin aluminum surface on a thick ultra low expansion glass substrate is attached to an aluminum housing structure using a flexure grating mount. At least one flexure joint is provided in the grating mount which permits thermal expansion and contraction of the substrate. In some embodiments the mount comprises a metal plate and the flexure joint is a H-Flex joint (124) with four legs (126) which is machined into the metal plate. In another embodiment two H-Flex joints are provided. In other embodiments, the flexure joint is a dovetail joint permitting one end of the mount to slip relative to the other.

摘要翻译： 一种用于生产高能量激光束的线变窄激光器的基于光栅的线变窄装置。 提供挠曲光栅架，其实质上消除了由光栅与壳体结构之间的不同热膨胀引起的对光栅的应力。 由厚的超低膨胀玻璃基板上的非常薄的铝表面构成的光栅使用柔性光栅架安装到铝外壳结构上。 在光栅架中至少设置一个挠性接头，该挠性接头允许衬底的热膨胀和收缩。 在一些实施例中，安装件包括金属板并且挠曲接头是具有加工到金属板中的四条腿（126）的H-Flex接头（124）。 在另一个实施例中，提供了两个H-Flex接头。 在其他实施例中，挠曲接头是燕尾接头，其允许安装件的一端相对于另一端滑动。

公开(公告)号：EP1155481A4

公开(公告)日：2005-11-09

申请号：EP99961808

申请日：1999-11-23

申请人： CYMER INC

发明人： ERSHOV ALEXANDER I

IPC分类号： G03F7/20 ,  H01S3/02 ,  H01S3/03 ,  H01S3/036 ,  H01S3/08 ,  H01S3/081 ,  H01S3/0971 ,  H01S3/098 ,  H01S3/105 ,  H01S3/1055 ,  H01S3/137 ,  H01S3/139 ,  H01S3/223 ,  H01S3/225 ,  H01S3/22

CPC分类号： H01S3/139 ,  G03F7/70025 ,  G03F7/70041 ,  G03F7/70558 ,  G03F7/70575 ,  H01S3/02 ,  H01S3/03 ,  H01S3/036 ,  H01S3/08004 ,  H01S3/08009 ,  H01S3/08036 ,  H01S3/08059 ,  H01S3/08081 ,  H01S3/0812 ,  H01S3/0971 ,  H01S3/105 ,  H01S3/1055 ,  H01S3/137 ,  H01S3/223 ,  H01S3/225 ,  H01S3/2251

摘要： A durable etalon based laser output coupler for ultraviolet lasers such as an ArF excimer laser or an F2 laser has two prisms (164A, 164B) aligned so that a first surface of one prism is parallel to a first surface of the other prism. The first prism has a second surface forming an angle with a beam from a laser cavity approximately equal to Brewster's angle. The second prism has a second surface forming an angle with the coupler exit beam approximately equal to Brewster's angle. For a wavelength of 193 nm, in an ArF excimer laser, Brewster's angle is about 57 degrees and each of the first and second surfaces define an apex angle of about 34 degrees. In a preferred embodiment, the device is used as an output coupler for line narrowed ArF excimer laser (63) having a diffraction grating based line narrowing module.

公开(公告)号：EP1080522A4

公开(公告)日：2005-10-05

申请号：EP99937141

申请日：1999-05-18

申请人： CYMER INC

发明人： HOFMANN THOMAS ,  HUEBER JEAN-MARC ,  DAS PALASH P ,  ISHIHARA TOSHIHIKO ,  DUFFEY THOMAS P ,  MELCHIOR JOHN T ,  BESAUCELE HERVE A ,  MORTON RICHARD G ,  NESS RICHARD M ,  NEWMAN PETER C ,  PARTLO WILLIAM N ,  ROTHWEIL DANIEL A ,  SANDSTROM RICHARD L

IPC分类号： C23C14/06 ,  C23C14/16 ,  C23C14/22 ,  C23C14/24 ,  G01J9/00 ,  G02B1/10 ,  G02B5/18 ,  G03F7/20 ,  H01S3/02 ,  H01S3/03 ,  H01S3/036 ,  H01S3/08 ,  H01S3/097 ,  H01S3/0971 ,  H01S3/1055 ,  H01S3/134 ,  H01S3/137 ,  H01S3/139 ,  H01S3/223 ,  H01S3/225 ,  H03K3/57 ,  H03K17/80 ,  H01S3/10

CPC分类号： G03F7/70025 ,  C23C14/0694 ,  C23C14/16 ,  C23C14/225 ,  C23C14/24 ,  G01J9/00 ,  G02B1/105 ,  G02B5/1852 ,  G03F7/70041 ,  G03F7/70358 ,  G03F7/70558 ,  G03F7/70575 ,  H01S3/03 ,  H01S3/036 ,  H01S3/08009 ,  H01S3/097 ,  H01S3/0971 ,  H01S3/09713 ,  H01S3/1055 ,  H01S3/134 ,  H01S3/1392 ,  H01S3/223 ,  H01S3/225 ,  H01S3/2251 ,  H01S3/2256 ,  H03K3/57 ,  H03K17/80

摘要： The present invention provides a reliable modular production quality excimer laser capable of producing 10 mJ laser pulses in the range of 1000 Hz to 2000 Hz with a full width half, maximum bandwidth of about 0.6 pm or less. Replaceable modules include a laser chamber, a pulse power system comprised of three modules; an optical resonator comprised of a line narrowing module and an output coupler module; a wavemeter module, an electrical control module, a cooling water module and a gas control module.Important improvements have been provided in the pulse power unit to produce faster rise time and improved pulse energy control. These improvements include an increased capacity high voltage power supply with a voltage bleed-down circuit for precise voltage trimming, an improved commutation module that generates a high voltage pulse from the capacitors charged by the high voltage power supply and amplifies the pulse voltage 23 times with a very fast voltage transformer having a secondary winding consisting of a single four-segment stainless steel rod. A novel design for the compression head saturable inductor greatly reduces the quantity of transformer oil required and virtually eliminates the possibility of oil leakage which in the past has posed a hazard.

公开(公告)号：EP1508188A1

公开(公告)日：2005-02-23

申请号：EP02743044.6

申请日：2002-05-17

申请人： Agilent Technologies, Inc.

发明人： SCHWARZ, Jochen ,  KALLMANN, Ulrich ,  MUELLER, Emmerich ,  NEBENDAHL, Bernd ,  STEFFENS, Wolf ,  HAISCH, Hansjoerg

IPC分类号： H01S3/1055 ,  H01S3/08

CPC分类号： H01S5/141 ,  H01S3/1055 ,  H01S5/143

摘要： The invention relates to a method of tuning a laser, comprising the steps of: providing a laser beam (4) in an external cavity (2) having a dispersion element (10) for selecting at least one mode of the laser, varying the wavelength characteristic of the dispersion element (10).

公开(公告)号：EP0917261B1

公开(公告)日：2001-10-24

申请号：EP98403194.8

申请日：1995-09-13

申请人： PHOTONETICS

发明人： Lefevre, Hervé ,  Martin, Philippe ,  Laloux, Bernard ,  Graindorge, Philippe ,  Disdier, Laurent

IPC分类号： H01S5/10 ,  H01S3/081 ,  H01S3/1055 ,  H01S3/105

CPC分类号： H01S5/143 ,  H01S3/0812 ,  H01S3/105 ,  H01S3/1055 ,  H01S5/02248

公开(公告)号：EP0930679A3

公开(公告)日：2001-01-17

申请号：EP98118667.9

申请日：1998-10-02

申请人： Hewlett-Packard Company

发明人： Sorin, Wayne V. ,  Baney, Douglas M.

IPC分类号： H01S3/1055 ,  H01S3/106 ,  H01S3/085

CPC分类号： H01S3/1055 ,  H01S3/106 ,  H01S5/1215 ,  H01S5/141 ,  H01S5/146

摘要： A broadband wavelength-selectable laser includes a gain medium (22), an optical transmission filter (26), and an optical fiber (28) with a reflective filter such as a series of fiber Bragg gratings (FBGs) (30, 32, 34, 36). The gain medium is preferably a semiconductor laser diode that generates broadband optical energy. The gain medium is optically connected to the optical transmission filter, such as a bandpass filter, a notch filter, or a periodic filter, which converts the broadband optical energy into filtered optical energy having wavelength bands of high transmissivity and wavelength bands of low transmissivity. The optical transmission filter is optically connected to the series of FBGs that reflects different wavelength bands of optical energy. Either the optical transmission filter or the FBGs are tunable over a wavelength range that includes the desired laser wavelengths. Tuning a laser to a selected wavelength requires tuning either the optical transmission filter or the FBG that corresponds to the desired wavelength so that the selected wavelength of optical energy is reflected back toward the gain medium, thereby inducing lasing at the selected wavelength. The single wavelength laser light is suitable for wavelength division multiplexed applications.